JPS6130018B2 - - Google Patents
Info
- Publication number
- JPS6130018B2 JPS6130018B2 JP390382A JP390382A JPS6130018B2 JP S6130018 B2 JPS6130018 B2 JP S6130018B2 JP 390382 A JP390382 A JP 390382A JP 390382 A JP390382 A JP 390382A JP S6130018 B2 JPS6130018 B2 JP S6130018B2
- Authority
- JP
- Japan
- Prior art keywords
- amorphous
- temperature
- crystal
- heat treatment
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 62
- 239000000463 material Substances 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 26
- 230000006911 nucleation Effects 0.000 claims description 23
- 238000010899 nucleation Methods 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 16
- 238000005468 ion implantation Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 230000001737 promoting effect Effects 0.000 claims description 2
- 239000000470 constituent Substances 0.000 claims 2
- 239000010408 film Substances 0.000 description 34
- 150000002500 ions Chemical class 0.000 description 15
- 239000012071 phase Substances 0.000 description 11
- 239000002245 particle Substances 0.000 description 8
- 238000000137 annealing Methods 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000002513 implantation Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- 229910020641 Co Zr Inorganic materials 0.000 description 1
- 229910020520 Co—Zr Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003903A JPS58122036A (ja) | 1982-01-12 | 1982-01-12 | 多結晶体膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57003903A JPS58122036A (ja) | 1982-01-12 | 1982-01-12 | 多結晶体膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58122036A JPS58122036A (ja) | 1983-07-20 |
| JPS6130018B2 true JPS6130018B2 (cg-RX-API-DMAC10.html) | 1986-07-10 |
Family
ID=11570148
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57003903A Granted JPS58122036A (ja) | 1982-01-12 | 1982-01-12 | 多結晶体膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58122036A (cg-RX-API-DMAC10.html) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2516908B2 (ja) * | 1985-10-28 | 1996-07-24 | 松下電器産業株式会社 | 磁性ヘッドとその製造方法 |
| JPH0732123B2 (ja) * | 1985-11-20 | 1995-04-10 | 日本電気株式会社 | 半導体装置用基板の製造方法 |
| JP2746606B2 (ja) * | 1987-09-18 | 1998-05-06 | ゼロックス コーポレーション | 大粒子多結晶質膜の製造方法 |
| KR100518922B1 (ko) * | 1996-01-30 | 2006-01-27 | 세이코 엡슨 가부시키가이샤 | 결정성막의형성방법및박막전자기기의제조방법 |
-
1982
- 1982-01-12 JP JP57003903A patent/JPS58122036A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58122036A (ja) | 1983-07-20 |
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