JPS6120629B2 - - Google Patents

Info

Publication number
JPS6120629B2
JPS6120629B2 JP7716179A JP7716179A JPS6120629B2 JP S6120629 B2 JPS6120629 B2 JP S6120629B2 JP 7716179 A JP7716179 A JP 7716179A JP 7716179 A JP7716179 A JP 7716179A JP S6120629 B2 JPS6120629 B2 JP S6120629B2
Authority
JP
Japan
Prior art keywords
plating solution
ions
tank
plating
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7716179A
Other languages
English (en)
Japanese (ja)
Other versions
JPS563666A (en
Inventor
Hitoshi Oka
Hiroshi Kikuchi
Ataru Yokono
Haruo Suzuki
Toyofusa Yoshimura
Akira Matsuo
Osamu Myazawa
Isamu Tanaka
Tokio Isogai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP7716179A priority Critical patent/JPS563666A/ja
Priority to US06/160,201 priority patent/US4324629A/en
Priority to DE3022962A priority patent/DE3022962C2/de
Priority to NLAANVRAGE8003553,A priority patent/NL188683C/xx
Publication of JPS563666A publication Critical patent/JPS563666A/ja
Publication of JPS6120629B2 publication Critical patent/JPS6120629B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Chemically Coating (AREA)
JP7716179A 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution Granted JPS563666A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP7716179A JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution
US06/160,201 US4324629A (en) 1979-06-19 1980-06-17 Process for regenerating chemical copper plating solution
DE3022962A DE3022962C2 (de) 1979-06-19 1980-06-19 Verfahren zum Regenerieren einer chemischen Verkupferungslösung
NLAANVRAGE8003553,A NL188683C (nl) 1979-06-19 1980-06-19 Werkwijze voor het regenereren van een bad voor het chemisch verkoperen.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7716179A JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution

Publications (2)

Publication Number Publication Date
JPS563666A JPS563666A (en) 1981-01-14
JPS6120629B2 true JPS6120629B2 (enrdf_load_stackoverflow) 1986-05-23

Family

ID=13626059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7716179A Granted JPS563666A (en) 1979-06-19 1979-06-19 Method and apparatus for regenerating chemical copper plating solution

Country Status (1)

Country Link
JP (1) JPS563666A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0015737B1 (en) * 1979-03-05 1983-05-11 Electrochem International, Inc. Process for the regeneration of electroless plating baths
JPS57200549A (en) * 1981-06-05 1982-12-08 Hitachi Ltd Continuous regeneration of chemical copper plating liquid
JPS57197764U (enrdf_load_stackoverflow) * 1981-06-09 1982-12-15
JPS5811775A (ja) * 1981-07-13 1983-01-22 Matsushita Electric Ind Co Ltd 銅の化学メッキ廃液の再生方法
JPS61235567A (ja) * 1985-04-10 1986-10-20 Chuo Seisakusho:Kk めっき液の濾過装置
EP1726683B1 (de) 2005-05-25 2008-04-09 Enthone Inc. Verfahren und Vorrichtung zur Einstellung der Ionenkonzentration in Elektrolyten

Also Published As

Publication number Publication date
JPS563666A (en) 1981-01-14

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