JPS6120514B2 - - Google Patents
Info
- Publication number
- JPS6120514B2 JPS6120514B2 JP54010200A JP1020079A JPS6120514B2 JP S6120514 B2 JPS6120514 B2 JP S6120514B2 JP 54010200 A JP54010200 A JP 54010200A JP 1020079 A JP1020079 A JP 1020079A JP S6120514 B2 JPS6120514 B2 JP S6120514B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon carbide
- silicon
- layer
- substrate
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1020079A JPS55104999A (en) | 1979-01-29 | 1979-01-29 | Production of silicon carbide crystal layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1020079A JPS55104999A (en) | 1979-01-29 | 1979-01-29 | Production of silicon carbide crystal layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55104999A JPS55104999A (en) | 1980-08-11 |
| JPS6120514B2 true JPS6120514B2 (enExample) | 1986-05-22 |
Family
ID=11743625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1020079A Granted JPS55104999A (en) | 1979-01-29 | 1979-01-29 | Production of silicon carbide crystal layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55104999A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180111U (enExample) * | 1985-04-27 | 1986-11-10 | ||
| JPS61206614U (enExample) * | 1985-06-14 | 1986-12-27 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58162035A (ja) * | 1982-03-23 | 1983-09-26 | Hoxan Corp | 多結晶シリコンウエハの製造方法 |
| JPS59203799A (ja) * | 1983-04-28 | 1984-11-17 | Sharp Corp | 炭化珪素単結晶基板の製造方法 |
| JPS60140756A (ja) * | 1983-12-27 | 1985-07-25 | Sharp Corp | 炭化珪素バイポ−ラトランジスタの製造方法 |
| DE4234508C2 (de) * | 1992-10-13 | 1994-12-22 | Cs Halbleiter Solartech | Verfahren zur Herstellung eines Wafers mit einer monokristallinen Siliciumcarbidschicht |
| FR2833619A1 (fr) * | 2001-12-17 | 2003-06-20 | Commissariat Energie Atomique | Procede de fabrication de substrats semi-conducteurs cristallins |
| JP5120758B2 (ja) * | 2008-10-08 | 2013-01-16 | 東海カーボン株式会社 | 炭化珪素単結晶の製造方法 |
-
1979
- 1979-01-29 JP JP1020079A patent/JPS55104999A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61180111U (enExample) * | 1985-04-27 | 1986-11-10 | ||
| JPS61206614U (enExample) * | 1985-06-14 | 1986-12-27 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55104999A (en) | 1980-08-11 |
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