JPS61167494A - シリコンウエ−ハ−研磨排水の処理方法 - Google Patents

シリコンウエ−ハ−研磨排水の処理方法

Info

Publication number
JPS61167494A
JPS61167494A JP684885A JP684885A JPS61167494A JP S61167494 A JPS61167494 A JP S61167494A JP 684885 A JP684885 A JP 684885A JP 684885 A JP684885 A JP 684885A JP S61167494 A JPS61167494 A JP S61167494A
Authority
JP
Japan
Prior art keywords
water
treatment
waste water
silicon wafer
ultrafilter membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP684885A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0439398B2 (https=
Inventor
Takayoshi Ito
伊藤　孝良
Takayuki Kanamori
金森　孝行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP684885A priority Critical patent/JPS61167494A/ja
Publication of JPS61167494A publication Critical patent/JPS61167494A/ja
Publication of JPH0439398B2 publication Critical patent/JPH0439398B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Separation Using Semi-Permeable Membranes (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
JP684885A 1985-01-18 1985-01-18 シリコンウエ−ハ−研磨排水の処理方法 Granted JPS61167494A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP684885A JPS61167494A (ja) 1985-01-18 1985-01-18 シリコンウエ−ハ−研磨排水の処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP684885A JPS61167494A (ja) 1985-01-18 1985-01-18 シリコンウエ−ハ−研磨排水の処理方法

Publications (2)

Publication Number Publication Date
JPS61167494A true JPS61167494A (ja) 1986-07-29
JPH0439398B2 JPH0439398B2 (https=) 1992-06-29

Family

ID=11649655

Family Applications (1)

Application Number Title Priority Date Filing Date
JP684885A Granted JPS61167494A (ja) 1985-01-18 1985-01-18 シリコンウエ−ハ−研磨排水の処理方法

Country Status (1)

Country Link
JP (1) JPS61167494A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01135580A (ja) * 1987-11-24 1989-05-29 Japan Organo Co Ltd 半導体ウエハーの製造工程より排出される排水の処理方法
JP2006095478A (ja) * 2004-09-30 2006-04-13 Nippon Steel Corp 硫黄化合物を含む廃水の処理方法
JP2008000750A (ja) * 2007-08-16 2008-01-10 Japan Organo Co Ltd Ｃｍｐ工程排水処理装置
JP2010501349A (ja) * 2006-08-25 2010-01-21 アプライド マテリアルズ インコーポレイテッド 基板研磨液のユースポイント処理のための方法及びシステム
CN104609668A (zh) * 2015-01-23 2015-05-13 先达恩那社水处理工程（天津）有限公司 芯片生产线的废水处理方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266881A (en) * 1975-10-28 1977-06-02 Ebara Infilco Co Ltd Process for separation by membrane
JPS5474285A (en) * 1977-11-25 1979-06-14 Sasakura Eng Co Ltd Reverse osmotic pressure apparatus control method
JPS5687402A (en) * 1979-12-14 1981-07-16 Ebara Infilco Co Ltd Membrane separation method
JPS5980387A (ja) * 1982-10-27 1984-05-09 Toray Eng Co Ltd 半透性複合膜による電子部品洗浄廃水の逆浸透処理方法
JPS59189987A (ja) * 1983-04-11 1984-10-27 Nec Corp シリコンウエ−ハ−研摩排水の循環利用方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5266881A (en) * 1975-10-28 1977-06-02 Ebara Infilco Co Ltd Process for separation by membrane
JPS5474285A (en) * 1977-11-25 1979-06-14 Sasakura Eng Co Ltd Reverse osmotic pressure apparatus control method
JPS5687402A (en) * 1979-12-14 1981-07-16 Ebara Infilco Co Ltd Membrane separation method
JPS5980387A (ja) * 1982-10-27 1984-05-09 Toray Eng Co Ltd 半透性複合膜による電子部品洗浄廃水の逆浸透処理方法
JPS59189987A (ja) * 1983-04-11 1984-10-27 Nec Corp シリコンウエ−ハ−研摩排水の循環利用方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01135580A (ja) * 1987-11-24 1989-05-29 Japan Organo Co Ltd 半導体ウエハーの製造工程より排出される排水の処理方法
JP2006095478A (ja) * 2004-09-30 2006-04-13 Nippon Steel Corp 硫黄化合物を含む廃水の処理方法
JP2010501349A (ja) * 2006-08-25 2010-01-21 アプライド マテリアルズ インコーポレイテッド 基板研磨液のユースポイント処理のための方法及びシステム
JP2008000750A (ja) * 2007-08-16 2008-01-10 Japan Organo Co Ltd Ｃｍｐ工程排水処理装置
CN104609668A (zh) * 2015-01-23 2015-05-13 先达恩那社水处理工程（天津）有限公司 芯片生产线的废水处理方法

Also Published As

Publication number Publication date
JPH0439398B2 (https=) 1992-06-29

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