JPS6116520A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6116520A
JPS6116520A JP59138308A JP13830884A JPS6116520A JP S6116520 A JPS6116520 A JP S6116520A JP 59138308 A JP59138308 A JP 59138308A JP 13830884 A JP13830884 A JP 13830884A JP S6116520 A JPS6116520 A JP S6116520A
Authority
JP
Japan
Prior art keywords
resist
pattern
coating
semiconductor device
sides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59138308A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0244138B2 (cg-RX-API-DMAC10.html
Inventor
Toru Okuma
徹 大熊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP59138308A priority Critical patent/JPS6116520A/ja
Publication of JPS6116520A publication Critical patent/JPS6116520A/ja
Publication of JPH0244138B2 publication Critical patent/JPH0244138B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/683—

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59138308A 1984-07-03 1984-07-03 半導体装置の製造方法 Granted JPS6116520A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59138308A JPS6116520A (ja) 1984-07-03 1984-07-03 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59138308A JPS6116520A (ja) 1984-07-03 1984-07-03 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6116520A true JPS6116520A (ja) 1986-01-24
JPH0244138B2 JPH0244138B2 (cg-RX-API-DMAC10.html) 1990-10-02

Family

ID=15218838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59138308A Granted JPS6116520A (ja) 1984-07-03 1984-07-03 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6116520A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0279414A (ja) * 1988-09-14 1990-03-20 Mitsubishi Electric Corp パターンのアライメント方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5478981A (en) * 1977-12-07 1979-06-23 Hitachi Ltd Photo resist coating unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5478981A (en) * 1977-12-07 1979-06-23 Hitachi Ltd Photo resist coating unit

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0279414A (ja) * 1988-09-14 1990-03-20 Mitsubishi Electric Corp パターンのアライメント方法

Also Published As

Publication number Publication date
JPH0244138B2 (cg-RX-API-DMAC10.html) 1990-10-02

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