JPS61159737A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS61159737A JPS61159737A JP60000162A JP16285A JPS61159737A JP S61159737 A JPS61159737 A JP S61159737A JP 60000162 A JP60000162 A JP 60000162A JP 16285 A JP16285 A JP 16285A JP S61159737 A JPS61159737 A JP S61159737A
- Authority
- JP
- Japan
- Prior art keywords
- mask material
- etching
- layer mask
- silicon
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P50/691—
Landscapes
- Drying Of Semiconductors (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000162A JPS61159737A (ja) | 1985-01-07 | 1985-01-07 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60000162A JPS61159737A (ja) | 1985-01-07 | 1985-01-07 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61159737A true JPS61159737A (ja) | 1986-07-19 |
| JPH0571129B2 JPH0571129B2 (enExample) | 1993-10-06 |
Family
ID=11466340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60000162A Granted JPS61159737A (ja) | 1985-01-07 | 1985-01-07 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61159737A (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0346252A (ja) * | 1989-07-03 | 1991-02-27 | American Teleph & Telegr Co <Att> | 半導体集積回路の製造方法 |
| US6027983A (en) * | 1994-06-02 | 2000-02-22 | Hitachi, Ltd. | Method of manufacturing trench isolate semiconductor integrated circuit device |
| US11982888B2 (en) | 2021-05-27 | 2024-05-14 | Kyocera Corporation | Nonreciprocal waveguide, isolator, optical switch, optical transceiver, data center, and manufacturing method |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20240142402A1 (en) | 2022-10-28 | 2024-05-02 | Arkray, Inc. | Method for analyzing sample comprising hemoglobin a2 by capillary electrophoresis |
-
1985
- 1985-01-07 JP JP60000162A patent/JPS61159737A/ja active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0346252A (ja) * | 1989-07-03 | 1991-02-27 | American Teleph & Telegr Co <Att> | 半導体集積回路の製造方法 |
| US6027983A (en) * | 1994-06-02 | 2000-02-22 | Hitachi, Ltd. | Method of manufacturing trench isolate semiconductor integrated circuit device |
| US6432799B1 (en) | 1994-06-02 | 2002-08-13 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
| US6649487B2 (en) | 1994-06-02 | 2003-11-18 | Hitachi, Ltd. | Method of manufacturing semiconductor integrated circuit device |
| US11982888B2 (en) | 2021-05-27 | 2024-05-14 | Kyocera Corporation | Nonreciprocal waveguide, isolator, optical switch, optical transceiver, data center, and manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0571129B2 (enExample) | 1993-10-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |