JPS61137318A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS61137318A
JPS61137318A JP59259751A JP25975184A JPS61137318A JP S61137318 A JPS61137318 A JP S61137318A JP 59259751 A JP59259751 A JP 59259751A JP 25975184 A JP25975184 A JP 25975184A JP S61137318 A JPS61137318 A JP S61137318A
Authority
JP
Japan
Prior art keywords
glass
mask
semiconductor device
glass film
electrode metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59259751A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0550851B2 (cg-RX-API-DMAC7.html
Inventor
Tadao Takano
高野　忠夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Rectifier Corp Japan Ltd
Original Assignee
International Rectifier Corp Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Rectifier Corp Japan Ltd filed Critical International Rectifier Corp Japan Ltd
Priority to JP59259751A priority Critical patent/JPS61137318A/ja
Publication of JPS61137318A publication Critical patent/JPS61137318A/ja
Publication of JPH0550851B2 publication Critical patent/JPH0550851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Formation Of Insulating Films (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59259751A 1984-12-08 1984-12-08 半導体装置の製造方法 Granted JPS61137318A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59259751A JPS61137318A (ja) 1984-12-08 1984-12-08 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59259751A JPS61137318A (ja) 1984-12-08 1984-12-08 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS61137318A true JPS61137318A (ja) 1986-06-25
JPH0550851B2 JPH0550851B2 (cg-RX-API-DMAC7.html) 1993-07-30

Family

ID=17338443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59259751A Granted JPS61137318A (ja) 1984-12-08 1984-12-08 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS61137318A (cg-RX-API-DMAC7.html)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54121732A (en) * 1978-03-15 1979-09-21 Nippon Telegr & Teleph Corp <Ntt> Pattern transfer method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54121732A (en) * 1978-03-15 1979-09-21 Nippon Telegr & Teleph Corp <Ntt> Pattern transfer method

Also Published As

Publication number Publication date
JPH0550851B2 (cg-RX-API-DMAC7.html) 1993-07-30

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees