JPS61120326A - 負圧スライダの製造方法 - Google Patents
負圧スライダの製造方法Info
- Publication number
- JPS61120326A JPS61120326A JP60252586A JP25258685A JPS61120326A JP S61120326 A JPS61120326 A JP S61120326A JP 60252586 A JP60252586 A JP 60252586A JP 25258685 A JP25258685 A JP 25258685A JP S61120326 A JPS61120326 A JP S61120326A
- Authority
- JP
- Japan
- Prior art keywords
- slider
- bar
- air bearing
- photoresist material
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title description 4
- 229920002120 photoresistant polymer Polymers 0.000 claims description 73
- 239000000463 material Substances 0.000 claims description 47
- 238000000034 method Methods 0.000 claims description 35
- 230000005291 magnetic effect Effects 0.000 claims description 22
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 9
- 239000000853 adhesive Substances 0.000 claims description 7
- 230000001070 adhesive effect Effects 0.000 claims description 7
- 238000000151 deposition Methods 0.000 claims description 7
- 238000003754 machining Methods 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 229920001651 Cyanoacrylate Polymers 0.000 claims description 3
- MWCLLHOVUTZFKS-UHFFFAOYSA-N Methyl cyanoacrylate Chemical compound COC(=O)C(=C)C#N MWCLLHOVUTZFKS-UHFFFAOYSA-N 0.000 claims description 3
- 238000004140 cleaning Methods 0.000 claims description 3
- 239000000155 melt Substances 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 238000005520 cutting process Methods 0.000 description 33
- 239000010410 layer Substances 0.000 description 30
- 150000002500 ions Chemical class 0.000 description 24
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 239000011800 void material Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- DMYOHQBLOZMDLP-UHFFFAOYSA-N 1-[2-(2-hydroxy-3-piperidin-1-ylpropoxy)phenyl]-3-phenylpropan-1-one Chemical compound C1CCCCN1CC(O)COC1=CC=CC=C1C(=O)CCC1=CC=CC=C1 DMYOHQBLOZMDLP-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000004830 Super Glue Substances 0.000 description 1
- 229920001079 Thiokol (polymer) Polymers 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- FGBJXOREULPLGL-UHFFFAOYSA-N ethyl cyanoacrylate Chemical compound CCOC(=O)C(=C)C#N FGBJXOREULPLGL-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/10—Structure or manufacture of housings or shields for heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US671062 | 1984-11-13 | ||
| US06/671,062 US4564585A (en) | 1983-11-28 | 1984-11-13 | Process for fabricating negative pressure sliders |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61120326A true JPS61120326A (ja) | 1986-06-07 |
| JPH058488B2 JPH058488B2 (enExample) | 1993-02-02 |
Family
ID=24692998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60252586A Granted JPS61120326A (ja) | 1984-11-13 | 1985-11-11 | 負圧スライダの製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4564585A (enExample) |
| JP (1) | JPS61120326A (enExample) |
| AU (1) | AU574848B2 (enExample) |
| DE (1) | DE3533290A1 (enExample) |
| FR (1) | FR2573223A1 (enExample) |
| GB (1) | GB2166888B (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02312077A (ja) * | 1989-05-29 | 1990-12-27 | Hitachi Ltd | 浮動ヘツドスライダ |
| US5997700A (en) * | 1994-12-20 | 1999-12-07 | Citizen Watch Co., Ltd. | Method of fabricating magnetic head slider |
Families Citing this family (31)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3312146B2 (ja) | 1993-06-25 | 2002-08-05 | 株式会社日立製作所 | 磁気ヘッドおよびその製造方法 |
| US5639323A (en) * | 1995-02-17 | 1997-06-17 | Aiwa Research And Development, Inc. | Method for aligning miniature device components |
| US5516430A (en) * | 1995-03-27 | 1996-05-14 | Read-Rite Corporation | Planarization of air bearing slider surfaces for reactive ion etching or ion milling |
| US6094805A (en) * | 1995-12-28 | 2000-08-01 | Tdk Corporation | Method for manufacturing magnetic head |
| JP2822971B2 (ja) * | 1996-01-17 | 1998-11-11 | ティーディーケイ株式会社 | 磁気ヘッド装置用スライダの製造方法 |
| US5916424A (en) | 1996-04-19 | 1999-06-29 | Micrion Corporation | Thin film magnetic recording heads and systems and methods for manufacturing the same |
| US5853959A (en) * | 1996-08-09 | 1998-12-29 | Seagate Technology, Inc. | Method of fabricating a contoured slider surface feature with a single mask |
| KR100280040B1 (ko) * | 1996-10-15 | 2001-02-01 | 마치오 나카지마 | 자기헤드슬라이더 제조방법 |
| WO1998039770A1 (en) * | 1997-03-04 | 1998-09-11 | Micrion Corporation | Thin-film magnetic recording head manufacture |
| US6004472A (en) * | 1997-05-14 | 1999-12-21 | International Business Machines Corporation | Dual etch step process for making a three etch depth air bearing slider |
| US6055128A (en) * | 1997-05-14 | 2000-04-25 | International Business Machines Corporation | Dual etch step pad air bearing design with three etch depths |
| US6332962B1 (en) | 1997-06-13 | 2001-12-25 | Micrion Corporation | Thin-film magnetic recording head manufacture using selective imaging |
| US5932113A (en) * | 1997-09-04 | 1999-08-03 | International Business Machines Corporation | Low temperature encapsulation system |
| US6106736A (en) * | 1997-09-04 | 2000-08-22 | International Business Machines Corporation | Planarization process and apparatus for the etch definition of magnetic head air bearing surfaces |
| JPH11283347A (ja) | 1998-03-31 | 1999-10-15 | Tdk Corp | スライダの製造方法およびスライダ |
| US6369900B1 (en) * | 1998-04-16 | 2002-04-09 | Seagate Technology Llc | Glide head with features on its air bearing surface for improved fly height measurement |
| US6360428B1 (en) | 1998-04-16 | 2002-03-26 | Seagate Technology Llc | Glide heads and methods for making glide heads |
| US6899456B2 (en) * | 1998-04-16 | 2005-05-31 | Seagate Technology Llc | Glide head for asperity detection |
| US6428715B1 (en) | 1998-12-22 | 2002-08-06 | International Business Machines Corporation | Method for producing sliders |
| JP3373176B2 (ja) * | 1999-07-09 | 2003-02-04 | ティーディーケイ株式会社 | 薄膜磁気ヘッドの製造方法および薄膜磁気ヘッド |
| US6804878B1 (en) | 1999-12-21 | 2004-10-19 | Hitachi Global Storage Technologies Netherlands B.V. | Method of improving the reliability of magnetic head sensors by ion milling smoothing |
| US20020099098A1 (en) * | 2001-01-22 | 2002-07-25 | Outi Maki-Ikola | Method for treating sexual disorders |
| US7168939B2 (en) * | 2004-02-26 | 2007-01-30 | Hitachi Global Storage Technologies Netherlands Bv | System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning |
| JP2005285231A (ja) * | 2004-03-30 | 2005-10-13 | Toshiba Corp | 磁気ヘッドスライダの製造方法、並びに磁気ヘッドスライダ及び磁気ディスク装置 |
| US7741003B2 (en) * | 2004-03-30 | 2010-06-22 | Hitachi Global Storage Technologies Netherlands B.V. | Photoresist transfer pads |
| US7396636B2 (en) * | 2004-08-27 | 2008-07-08 | Hitachi Global Storage Technologies Netherlands, B.V. | Segmented resist islands for photolithography on single sliders |
| US7296420B2 (en) * | 2004-12-02 | 2007-11-20 | Hitachi Global Storage Technologies Amsterdam, B.V. | Direct cooling pallet tray for temperature stability for deep ion mill etch process |
| US7481312B2 (en) * | 2004-12-02 | 2009-01-27 | Hitachi Global Storage Technologies Netherlands B.V. | Direct cooling pallet assembly for temperature stability for deep ion mill etch process |
| CN101046968B (zh) * | 2006-03-29 | 2011-12-21 | 新科实业有限公司 | 具有微纹的磁头及其制造方法 |
| US7851138B2 (en) | 2007-07-19 | 2010-12-14 | Hitachi Global Storage Technologies, Netherlands, B.V. | Patterning a surface comprising silicon and carbon |
| US8585915B2 (en) | 2007-10-29 | 2013-11-19 | Micron Technology, Inc. | Methods for fabricating sub-resolution alignment marks on semiconductor structures |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
| US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
| US4358338A (en) * | 1980-05-16 | 1982-11-09 | Varian Associates, Inc. | End point detection method for physical etching process |
| DE3280230D1 (de) * | 1981-05-07 | 1990-09-20 | Honeywell Inc | Verfahren zur herstellung von empfindlichen positiven elektronenstrahlresists. |
| US4375390A (en) * | 1982-03-15 | 1983-03-01 | Anderson Nathaniel C | Thin film techniques for fabricating narrow track ferrite heads |
| DE3433334A1 (de) * | 1983-11-28 | 1985-06-05 | Magnetic Peripherals Inc., Minneapolis, Minn. | Verfahren zur herstellung eines unterdruck-schlittens fuer einen magnetkopf |
-
1984
- 1984-11-13 US US06/671,062 patent/US4564585A/en not_active Expired - Lifetime
-
1985
- 1985-09-18 DE DE19853533290 patent/DE3533290A1/de not_active Withdrawn
- 1985-10-03 GB GB08524431A patent/GB2166888B/en not_active Expired
- 1985-10-09 AU AU48437/85A patent/AU574848B2/en not_active Ceased
- 1985-10-29 FR FR8516055A patent/FR2573223A1/fr not_active Withdrawn
- 1985-11-11 JP JP60252586A patent/JPS61120326A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02312077A (ja) * | 1989-05-29 | 1990-12-27 | Hitachi Ltd | 浮動ヘツドスライダ |
| US5997700A (en) * | 1994-12-20 | 1999-12-07 | Citizen Watch Co., Ltd. | Method of fabricating magnetic head slider |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2166888B (en) | 1988-06-29 |
| DE3533290A1 (de) | 1986-06-12 |
| GB8524431D0 (en) | 1985-11-06 |
| AU574848B2 (en) | 1988-07-14 |
| US4564585A (en) | 1986-01-14 |
| JPH058488B2 (enExample) | 1993-02-02 |
| FR2573223A1 (fr) | 1986-05-16 |
| AU4843785A (en) | 1986-05-22 |
| GB2166888A (en) | 1986-05-14 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |