JPH058488B2 - - Google Patents

Info

Publication number
JPH058488B2
JPH058488B2 JP60252586A JP25258685A JPH058488B2 JP H058488 B2 JPH058488 B2 JP H058488B2 JP 60252586 A JP60252586 A JP 60252586A JP 25258685 A JP25258685 A JP 25258685A JP H058488 B2 JPH058488 B2 JP H058488B2
Authority
JP
Japan
Prior art keywords
slider
bar
air bearing
mask
photoresist material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP60252586A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61120326A (ja
Inventor
Sutanrii Burasuku Hooru
Deiin Jinmaaman Rarii
Karudaaron Aasaa
Rerando Ronguwaasu Reroi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seagate Technology LLC
Original Assignee
Seagate Technology LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seagate Technology LLC filed Critical Seagate Technology LLC
Publication of JPS61120326A publication Critical patent/JPS61120326A/ja
Publication of JPH058488B2 publication Critical patent/JPH058488B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
    • G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
    • G11B5/60—Fluid-dynamic spacing of heads from record-carriers
    • G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/10—Structure or manufacture of housings or shields for heads
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
  • Magnetic Heads (AREA)
JP60252586A 1984-11-13 1985-11-11 負圧スライダの製造方法 Granted JPS61120326A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US671062 1984-11-13
US06/671,062 US4564585A (en) 1983-11-28 1984-11-13 Process for fabricating negative pressure sliders

Publications (2)

Publication Number Publication Date
JPS61120326A JPS61120326A (ja) 1986-06-07
JPH058488B2 true JPH058488B2 (enExample) 1993-02-02

Family

ID=24692998

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60252586A Granted JPS61120326A (ja) 1984-11-13 1985-11-11 負圧スライダの製造方法

Country Status (6)

Country Link
US (1) US4564585A (enExample)
JP (1) JPS61120326A (enExample)
AU (1) AU574848B2 (enExample)
DE (1) DE3533290A1 (enExample)
FR (1) FR2573223A1 (enExample)
GB (1) GB2166888B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6198601B1 (en) 1993-06-25 2001-03-06 Hitachi, Ltd. Thin film magnetic head having non-linear tapered rails
US6212033B1 (en) 1998-03-31 2001-04-03 Tdk Corporation Slider and method for manufacturing the same

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2765952B2 (ja) * 1989-05-29 1998-06-18 株式会社日立製作所 浮動ヘツドスライダ
US5997700A (en) * 1994-12-20 1999-12-07 Citizen Watch Co., Ltd. Method of fabricating magnetic head slider
US5639323A (en) * 1995-02-17 1997-06-17 Aiwa Research And Development, Inc. Method for aligning miniature device components
US5516430A (en) * 1995-03-27 1996-05-14 Read-Rite Corporation Planarization of air bearing slider surfaces for reactive ion etching or ion milling
US6094805A (en) * 1995-12-28 2000-08-01 Tdk Corporation Method for manufacturing magnetic head
JP2822971B2 (ja) * 1996-01-17 1998-11-11 ティーディーケイ株式会社 磁気ヘッド装置用スライダの製造方法
US5916424A (en) 1996-04-19 1999-06-29 Micrion Corporation Thin film magnetic recording heads and systems and methods for manufacturing the same
US5853959A (en) * 1996-08-09 1998-12-29 Seagate Technology, Inc. Method of fabricating a contoured slider surface feature with a single mask
KR100280040B1 (ko) * 1996-10-15 2001-02-01 마치오 나카지마 자기헤드슬라이더 제조방법
WO1998039770A1 (en) * 1997-03-04 1998-09-11 Micrion Corporation Thin-film magnetic recording head manufacture
US6004472A (en) * 1997-05-14 1999-12-21 International Business Machines Corporation Dual etch step process for making a three etch depth air bearing slider
US6055128A (en) * 1997-05-14 2000-04-25 International Business Machines Corporation Dual etch step pad air bearing design with three etch depths
US6332962B1 (en) 1997-06-13 2001-12-25 Micrion Corporation Thin-film magnetic recording head manufacture using selective imaging
US5932113A (en) * 1997-09-04 1999-08-03 International Business Machines Corporation Low temperature encapsulation system
US6106736A (en) * 1997-09-04 2000-08-22 International Business Machines Corporation Planarization process and apparatus for the etch definition of magnetic head air bearing surfaces
US6369900B1 (en) * 1998-04-16 2002-04-09 Seagate Technology Llc Glide head with features on its air bearing surface for improved fly height measurement
US6360428B1 (en) 1998-04-16 2002-03-26 Seagate Technology Llc Glide heads and methods for making glide heads
US6899456B2 (en) * 1998-04-16 2005-05-31 Seagate Technology Llc Glide head for asperity detection
US6428715B1 (en) 1998-12-22 2002-08-06 International Business Machines Corporation Method for producing sliders
JP3373176B2 (ja) * 1999-07-09 2003-02-04 ティーディーケイ株式会社 薄膜磁気ヘッドの製造方法および薄膜磁気ヘッド
US6804878B1 (en) 1999-12-21 2004-10-19 Hitachi Global Storage Technologies Netherlands B.V. Method of improving the reliability of magnetic head sensors by ion milling smoothing
US20020099098A1 (en) * 2001-01-22 2002-07-25 Outi Maki-Ikola Method for treating sexual disorders
US7168939B2 (en) * 2004-02-26 2007-01-30 Hitachi Global Storage Technologies Netherlands Bv System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning
JP2005285231A (ja) * 2004-03-30 2005-10-13 Toshiba Corp 磁気ヘッドスライダの製造方法、並びに磁気ヘッドスライダ及び磁気ディスク装置
US7741003B2 (en) * 2004-03-30 2010-06-22 Hitachi Global Storage Technologies Netherlands B.V. Photoresist transfer pads
US7396636B2 (en) * 2004-08-27 2008-07-08 Hitachi Global Storage Technologies Netherlands, B.V. Segmented resist islands for photolithography on single sliders
US7296420B2 (en) * 2004-12-02 2007-11-20 Hitachi Global Storage Technologies Amsterdam, B.V. Direct cooling pallet tray for temperature stability for deep ion mill etch process
US7481312B2 (en) * 2004-12-02 2009-01-27 Hitachi Global Storage Technologies Netherlands B.V. Direct cooling pallet assembly for temperature stability for deep ion mill etch process
CN101046968B (zh) * 2006-03-29 2011-12-21 新科实业有限公司 具有微纹的磁头及其制造方法
US7851138B2 (en) 2007-07-19 2010-12-14 Hitachi Global Storage Technologies, Netherlands, B.V. Patterning a surface comprising silicon and carbon
US8585915B2 (en) 2007-10-29 2013-11-19 Micron Technology, Inc. Methods for fabricating sub-resolution alignment marks on semiconductor structures

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus
US3994793A (en) * 1975-05-22 1976-11-30 International Business Machines Corporation Reactive ion etching of aluminum
US4358338A (en) * 1980-05-16 1982-11-09 Varian Associates, Inc. End point detection method for physical etching process
DE3280230D1 (de) * 1981-05-07 1990-09-20 Honeywell Inc Verfahren zur herstellung von empfindlichen positiven elektronenstrahlresists.
US4375390A (en) * 1982-03-15 1983-03-01 Anderson Nathaniel C Thin film techniques for fabricating narrow track ferrite heads
DE3433334A1 (de) * 1983-11-28 1985-06-05 Magnetic Peripherals Inc., Minneapolis, Minn. Verfahren zur herstellung eines unterdruck-schlittens fuer einen magnetkopf

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6198601B1 (en) 1993-06-25 2001-03-06 Hitachi, Ltd. Thin film magnetic head having non-linear tapered rails
US6212033B1 (en) 1998-03-31 2001-04-03 Tdk Corporation Slider and method for manufacturing the same

Also Published As

Publication number Publication date
GB2166888B (en) 1988-06-29
DE3533290A1 (de) 1986-06-12
GB8524431D0 (en) 1985-11-06
AU574848B2 (en) 1988-07-14
US4564585A (en) 1986-01-14
FR2573223A1 (fr) 1986-05-16
AU4843785A (en) 1986-05-22
GB2166888A (en) 1986-05-14
JPS61120326A (ja) 1986-06-07

Similar Documents

Publication Publication Date Title
US4564585A (en) Process for fabricating negative pressure sliders
US6806035B1 (en) Wafer serialization manufacturing process for read/write heads using photolithography and selective reactive ion etching
US4877480A (en) Lithographic technique using laser for fabrication of electronic components and the like
KR100846003B1 (ko) 자기 기록 매체의 자화 패턴 형성 방법, 자기 기록 매체및 자기 기록 장치, 및 포토마스크
JP2010146655A (ja) 光アシスト磁気記録用ヘッド及びその製造方法
JP3159906B2 (ja) 液晶表示素子の製造方法
EP0404340B1 (en) Lithographic technique using laser scanning for fabrication of electronic components and the like
US20150333476A1 (en) Solderable pad fabrication for microelectronic components
US6534159B1 (en) Side alignment mark
EP0256938B1 (en) Lithographic technique using laser for fabrication of electronic components and the like
GB2150317A (en) Process for producing negative pressure sliders using a photoresist
JP2001202649A (ja) 光学レンズ、光学装置およびこれらの製造方法
JP3301655B2 (ja) 薄膜磁気ヘッドのスライダ加工方法
JPH0453012A (ja) 薄膜磁気ヘッドの製造方法
US12411403B2 (en) Method of making a hard disk drive write pole using a tri-tone attenuated phase shift mask
JP4316573B2 (ja) 消磁マスク用媒体及び垂直記録媒体磁気転写／消磁方法
JP2003098650A (ja) フォトマスク、その製造方法及び磁化パターン形成方法
JP3015546B2 (ja) レジスト塗布方法
JPH0887716A (ja) 薄膜パターンの形成方法及びそれを用いた薄膜磁気ヘッドの製造方法
JP2765030B2 (ja) 磁気記録媒体の製造方法
JPH07122020A (ja) 薄膜磁気ヘッドとその製造方法
JP2756744B2 (ja) 薄膜磁気ヘッドおよびその製造方法
JP2003107668A (ja) フォトマスク、その製造方法及び磁化パターン形成方法
JPH06259814A (ja) 露光マスクおよび光記録媒体
JPH076341A (ja) 薄膜磁気ヘッド用スライダの製造方法

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees