FR2573223A1 - Procede de fabrication de coulisseaux a depression - Google Patents
Procede de fabrication de coulisseaux a depression Download PDFInfo
- Publication number
- FR2573223A1 FR2573223A1 FR8516055A FR8516055A FR2573223A1 FR 2573223 A1 FR2573223 A1 FR 2573223A1 FR 8516055 A FR8516055 A FR 8516055A FR 8516055 A FR8516055 A FR 8516055A FR 2573223 A1 FR2573223 A1 FR 2573223A1
- Authority
- FR
- France
- Prior art keywords
- bar
- air cushion
- photosensitive material
- cavities
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 230000008569 process Effects 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 230000005291 magnetic effect Effects 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims description 38
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 9
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 6
- 239000000853 adhesive Substances 0.000 claims description 6
- 230000001070 adhesive effect Effects 0.000 claims description 6
- 239000004830 Super Glue Substances 0.000 claims description 4
- 238000004090 dissolution Methods 0.000 claims description 4
- FGBJXOREULPLGL-UHFFFAOYSA-N ethyl cyanoacrylate Chemical compound CCOC(=O)C(=C)C#N FGBJXOREULPLGL-UHFFFAOYSA-N 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 230000004304 visual acuity Effects 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- 229940032007 methylethyl ketone Drugs 0.000 claims 1
- 238000011161 development Methods 0.000 abstract description 4
- 238000007667 floating Methods 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 8
- 238000000992 sputter etching Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 6
- 238000010884 ion-beam technique Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 4
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 3
- BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000007493 shaping process Methods 0.000 description 3
- 239000006088 Fotoceram Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 238000004026 adhesive bonding Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- 238000007514 turning Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DMYOHQBLOZMDLP-UHFFFAOYSA-N 1-[2-(2-hydroxy-3-piperidin-1-ylpropoxy)phenyl]-3-phenylpropan-1-one Chemical compound C1CCCCN1CC(O)COC1=CC=CC=C1C(=O)CCC1=CC=CC=C1 DMYOHQBLOZMDLP-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N 3-methyl-2-pentanone Chemical compound CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920001079 Thiokol (polymer) Polymers 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 125000004093 cyano group Chemical group *C#N 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 239000011440 grout Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- -1 methyl- Chemical group 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/48—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed
- G11B5/58—Disposition or mounting of heads or head supports relative to record carriers ; arrangements of heads, e.g. for scanning the record carrier to increase the relative speed with provision for moving the head for the purpose of maintaining alignment of the head relative to the record carrier during transducing operation, e.g. to compensate for surface irregularities of the latter or for track following
- G11B5/60—Fluid-dynamic spacing of heads from record-carriers
- G11B5/6005—Specially adapted for spacing from a rotating disc using a fluid cushion
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/10—Structure or manufacture of housings or shields for heads
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
- Magnetic Heads (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/671,062 US4564585A (en) | 1983-11-28 | 1984-11-13 | Process for fabricating negative pressure sliders |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| FR2573223A1 true FR2573223A1 (fr) | 1986-05-16 |
Family
ID=24692998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR8516055A Withdrawn FR2573223A1 (fr) | 1984-11-13 | 1985-10-29 | Procede de fabrication de coulisseaux a depression |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4564585A (enExample) |
| JP (1) | JPS61120326A (enExample) |
| AU (1) | AU574848B2 (enExample) |
| DE (1) | DE3533290A1 (enExample) |
| FR (1) | FR2573223A1 (enExample) |
| GB (1) | GB2166888B (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2765952B2 (ja) * | 1989-05-29 | 1998-06-18 | 株式会社日立製作所 | 浮動ヘツドスライダ |
| JP3312146B2 (ja) | 1993-06-25 | 2002-08-05 | 株式会社日立製作所 | 磁気ヘッドおよびその製造方法 |
| US5997700A (en) * | 1994-12-20 | 1999-12-07 | Citizen Watch Co., Ltd. | Method of fabricating magnetic head slider |
| US5639323A (en) * | 1995-02-17 | 1997-06-17 | Aiwa Research And Development, Inc. | Method for aligning miniature device components |
| US5516430A (en) * | 1995-03-27 | 1996-05-14 | Read-Rite Corporation | Planarization of air bearing slider surfaces for reactive ion etching or ion milling |
| US6094805A (en) * | 1995-12-28 | 2000-08-01 | Tdk Corporation | Method for manufacturing magnetic head |
| JP2822971B2 (ja) * | 1996-01-17 | 1998-11-11 | ティーディーケイ株式会社 | 磁気ヘッド装置用スライダの製造方法 |
| US5916424A (en) | 1996-04-19 | 1999-06-29 | Micrion Corporation | Thin film magnetic recording heads and systems and methods for manufacturing the same |
| US5853959A (en) * | 1996-08-09 | 1998-12-29 | Seagate Technology, Inc. | Method of fabricating a contoured slider surface feature with a single mask |
| KR100280040B1 (ko) * | 1996-10-15 | 2001-02-01 | 마치오 나카지마 | 자기헤드슬라이더 제조방법 |
| WO1998039770A1 (en) * | 1997-03-04 | 1998-09-11 | Micrion Corporation | Thin-film magnetic recording head manufacture |
| US6004472A (en) * | 1997-05-14 | 1999-12-21 | International Business Machines Corporation | Dual etch step process for making a three etch depth air bearing slider |
| US6055128A (en) * | 1997-05-14 | 2000-04-25 | International Business Machines Corporation | Dual etch step pad air bearing design with three etch depths |
| US6332962B1 (en) | 1997-06-13 | 2001-12-25 | Micrion Corporation | Thin-film magnetic recording head manufacture using selective imaging |
| US5932113A (en) * | 1997-09-04 | 1999-08-03 | International Business Machines Corporation | Low temperature encapsulation system |
| US6106736A (en) * | 1997-09-04 | 2000-08-22 | International Business Machines Corporation | Planarization process and apparatus for the etch definition of magnetic head air bearing surfaces |
| JPH11283347A (ja) | 1998-03-31 | 1999-10-15 | Tdk Corp | スライダの製造方法およびスライダ |
| US6369900B1 (en) * | 1998-04-16 | 2002-04-09 | Seagate Technology Llc | Glide head with features on its air bearing surface for improved fly height measurement |
| US6360428B1 (en) | 1998-04-16 | 2002-03-26 | Seagate Technology Llc | Glide heads and methods for making glide heads |
| US6899456B2 (en) * | 1998-04-16 | 2005-05-31 | Seagate Technology Llc | Glide head for asperity detection |
| US6428715B1 (en) | 1998-12-22 | 2002-08-06 | International Business Machines Corporation | Method for producing sliders |
| JP3373176B2 (ja) * | 1999-07-09 | 2003-02-04 | ティーディーケイ株式会社 | 薄膜磁気ヘッドの製造方法および薄膜磁気ヘッド |
| US6804878B1 (en) | 1999-12-21 | 2004-10-19 | Hitachi Global Storage Technologies Netherlands B.V. | Method of improving the reliability of magnetic head sensors by ion milling smoothing |
| US20020099098A1 (en) * | 2001-01-22 | 2002-07-25 | Outi Maki-Ikola | Method for treating sexual disorders |
| US7168939B2 (en) * | 2004-02-26 | 2007-01-30 | Hitachi Global Storage Technologies Netherlands Bv | System, method, and apparatus for multilevel UV molding lithography for air bearing surface patterning |
| JP2005285231A (ja) * | 2004-03-30 | 2005-10-13 | Toshiba Corp | 磁気ヘッドスライダの製造方法、並びに磁気ヘッドスライダ及び磁気ディスク装置 |
| US7741003B2 (en) * | 2004-03-30 | 2010-06-22 | Hitachi Global Storage Technologies Netherlands B.V. | Photoresist transfer pads |
| US7396636B2 (en) * | 2004-08-27 | 2008-07-08 | Hitachi Global Storage Technologies Netherlands, B.V. | Segmented resist islands for photolithography on single sliders |
| US7296420B2 (en) * | 2004-12-02 | 2007-11-20 | Hitachi Global Storage Technologies Amsterdam, B.V. | Direct cooling pallet tray for temperature stability for deep ion mill etch process |
| US7481312B2 (en) * | 2004-12-02 | 2009-01-27 | Hitachi Global Storage Technologies Netherlands B.V. | Direct cooling pallet assembly for temperature stability for deep ion mill etch process |
| CN101046968B (zh) * | 2006-03-29 | 2011-12-21 | 新科实业有限公司 | 具有微纹的磁头及其制造方法 |
| US7851138B2 (en) | 2007-07-19 | 2010-12-14 | Hitachi Global Storage Technologies, Netherlands, B.V. | Patterning a surface comprising silicon and carbon |
| US8585915B2 (en) | 2007-10-29 | 2013-11-19 | Micron Technology, Inc. | Methods for fabricating sub-resolution alignment marks on semiconductor structures |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
| GB2150317A (en) * | 1983-11-28 | 1985-06-26 | Magnetic Peripherals Inc | Process for producing negative pressure sliders using a photoresist |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3994793A (en) * | 1975-05-22 | 1976-11-30 | International Business Machines Corporation | Reactive ion etching of aluminum |
| US4358338A (en) * | 1980-05-16 | 1982-11-09 | Varian Associates, Inc. | End point detection method for physical etching process |
| DE3280230D1 (de) * | 1981-05-07 | 1990-09-20 | Honeywell Inc | Verfahren zur herstellung von empfindlichen positiven elektronenstrahlresists. |
| US4375390A (en) * | 1982-03-15 | 1983-03-01 | Anderson Nathaniel C | Thin film techniques for fabricating narrow track ferrite heads |
-
1984
- 1984-11-13 US US06/671,062 patent/US4564585A/en not_active Expired - Lifetime
-
1985
- 1985-09-18 DE DE19853533290 patent/DE3533290A1/de not_active Withdrawn
- 1985-10-03 GB GB08524431A patent/GB2166888B/en not_active Expired
- 1985-10-09 AU AU48437/85A patent/AU574848B2/en not_active Ceased
- 1985-10-29 FR FR8516055A patent/FR2573223A1/fr not_active Withdrawn
- 1985-11-11 JP JP60252586A patent/JPS61120326A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4052603A (en) * | 1974-12-23 | 1977-10-04 | International Business Machines Corporation | Object positioning process and apparatus |
| GB2150317A (en) * | 1983-11-28 | 1985-06-26 | Magnetic Peripherals Inc | Process for producing negative pressure sliders using a photoresist |
Non-Patent Citations (3)
| Title |
|---|
| IBM TECHNICAL DISCLOSURE BULLETIN, vol. 23, no. 8, janvier 1981, pages 3889-3890, New York, US; G.W. BROCK et al.: "Producing accurate track pitch and width in multielement planar ferrite substrates having deposited turns" * |
| IBM TECHNICAL DISCLOSURE BULLETIN, vol. 24, no. 2, juillet 1981, page 995, New York, US; J.E. HITCHNER et al.: "Fabrication of ferrite magnetic head" * |
| SOLID STATE TECHNOLOGY, avril 1976, pages 68-73, Washington, US; G. GL\ERSEN: "Masking for ion beam etching" * |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2166888B (en) | 1988-06-29 |
| DE3533290A1 (de) | 1986-06-12 |
| GB8524431D0 (en) | 1985-11-06 |
| AU574848B2 (en) | 1988-07-14 |
| US4564585A (en) | 1986-01-14 |
| JPH058488B2 (enExample) | 1993-02-02 |
| AU4843785A (en) | 1986-05-22 |
| GB2166888A (en) | 1986-05-14 |
| JPS61120326A (ja) | 1986-06-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| TP | Transmission of property | ||
| ST | Notification of lapse |