JPS61117832A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS61117832A
JPS61117832A JP59238565A JP23856584A JPS61117832A JP S61117832 A JPS61117832 A JP S61117832A JP 59238565 A JP59238565 A JP 59238565A JP 23856584 A JP23856584 A JP 23856584A JP S61117832 A JPS61117832 A JP S61117832A
Authority
JP
Japan
Prior art keywords
pattern
etched
film
photolithography
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59238565A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0235448B2 (enrdf_load_stackoverflow
Inventor
Yoshio Ito
由夫 伊東
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP59238565A priority Critical patent/JPS61117832A/ja
Publication of JPS61117832A publication Critical patent/JPS61117832A/ja
Publication of JPH0235448B2 publication Critical patent/JPH0235448B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Weting (AREA)
JP59238565A 1984-11-14 1984-11-14 半導体装置の製造方法 Granted JPS61117832A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59238565A JPS61117832A (ja) 1984-11-14 1984-11-14 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59238565A JPS61117832A (ja) 1984-11-14 1984-11-14 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS61117832A true JPS61117832A (ja) 1986-06-05
JPH0235448B2 JPH0235448B2 (enrdf_load_stackoverflow) 1990-08-10

Family

ID=17032112

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59238565A Granted JPS61117832A (ja) 1984-11-14 1984-11-14 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS61117832A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7725872B2 (en) 2002-07-26 2010-05-25 Asml Masktools, B.V. Orientation dependent shielding for use with dipole illumination techniques

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5312793A (en) * 1976-07-23 1978-02-04 Midori Anzen Kogyo Oxygen generating apparatus
JPS5558534A (en) * 1978-10-24 1980-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor device
JPS5626450A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5312793A (en) * 1976-07-23 1978-02-04 Midori Anzen Kogyo Oxygen generating apparatus
JPS5558534A (en) * 1978-10-24 1980-05-01 Chiyou Lsi Gijutsu Kenkyu Kumiai Manufacture of semiconductor device
JPS5626450A (en) * 1979-08-13 1981-03-14 Hitachi Ltd Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7725872B2 (en) 2002-07-26 2010-05-25 Asml Masktools, B.V. Orientation dependent shielding for use with dipole illumination techniques

Also Published As

Publication number Publication date
JPH0235448B2 (enrdf_load_stackoverflow) 1990-08-10

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