JPH0235448B2 - - Google Patents
Info
- Publication number
- JPH0235448B2 JPH0235448B2 JP59238565A JP23856584A JPH0235448B2 JP H0235448 B2 JPH0235448 B2 JP H0235448B2 JP 59238565 A JP59238565 A JP 59238565A JP 23856584 A JP23856584 A JP 23856584A JP H0235448 B2 JPH0235448 B2 JP H0235448B2
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist film
- film
- resist
- etched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Weting (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59238565A JPS61117832A (ja) | 1984-11-14 | 1984-11-14 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59238565A JPS61117832A (ja) | 1984-11-14 | 1984-11-14 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS61117832A JPS61117832A (ja) | 1986-06-05 |
JPH0235448B2 true JPH0235448B2 (enrdf_load_stackoverflow) | 1990-08-10 |
Family
ID=17032112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59238565A Granted JPS61117832A (ja) | 1984-11-14 | 1984-11-14 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61117832A (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7246342B2 (en) | 2002-07-26 | 2007-07-17 | Asml Masktools B.V. | Orientation dependent shielding for use with dipole illumination techniques |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5312793A (en) * | 1976-07-23 | 1978-02-04 | Midori Anzen Kogyo | Oxygen generating apparatus |
JPS5558534A (en) * | 1978-10-24 | 1980-05-01 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Manufacture of semiconductor device |
JPS5626450A (en) * | 1979-08-13 | 1981-03-14 | Hitachi Ltd | Manufacture of semiconductor device |
-
1984
- 1984-11-14 JP JP59238565A patent/JPS61117832A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS61117832A (ja) | 1986-06-05 |
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