JPS61116837A - 回折格子によるギヤツプ・位置合せ制御法 - Google Patents

回折格子によるギヤツプ・位置合せ制御法

Info

Publication number
JPS61116837A
JPS61116837A JP59237532A JP23753284A JPS61116837A JP S61116837 A JPS61116837 A JP S61116837A JP 59237532 A JP59237532 A JP 59237532A JP 23753284 A JP23753284 A JP 23753284A JP S61116837 A JPS61116837 A JP S61116837A
Authority
JP
Japan
Prior art keywords
gap
diffraction grating
pitch
mask
positional deviation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59237532A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0582729B2 (enExample
Inventor
Atsunobu Une
宇根　篤▲のぶ▼
Makoto Inoshiro
猪城　真
Nobuyuki Takeuchi
竹内　信行
Yasuhiro Torii
鳥居　康弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP59237532A priority Critical patent/JPS61116837A/ja
Publication of JPS61116837A publication Critical patent/JPS61116837A/ja
Publication of JPH0582729B2 publication Critical patent/JPH0582729B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59237532A 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法 Granted JPS61116837A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59237532A JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59237532A JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Publications (2)

Publication Number Publication Date
JPS61116837A true JPS61116837A (ja) 1986-06-04
JPH0582729B2 JPH0582729B2 (enExample) 1993-11-22

Family

ID=17016727

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59237532A Granted JPS61116837A (ja) 1984-11-13 1984-11-13 回折格子によるギヤツプ・位置合せ制御法

Country Status (1)

Country Link
JP (1) JPS61116837A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3719538A1 (de) * 1986-06-11 1987-12-17 Toshiba Kawasaki Kk Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse
DE3719539A1 (de) * 1986-06-11 1987-12-17 Toshiba Kawasaki Kk Verfahren zum ausrichten eines ersten und eines zweiten objekts relativ zueinander und vorrichtung zur durchfuehrung des verfahrens
DE4106987A1 (de) * 1990-03-05 1991-09-12 Toshiba Kawasaki Kk Verfahren und vorrichtung zum einstellen des spaltabstands zwischen zwei objekten auf eine vorbestimmte groesse
JPH09508463A (ja) * 1994-01-24 1997-08-26 エスヴィージー リトグラフィー システムズ インコーポレイテッド 格子−格子干渉型位置合わせ装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3719538A1 (de) * 1986-06-11 1987-12-17 Toshiba Kawasaki Kk Verfahren und vorrichtung zum einstellen eines spalts zwischen zwei objekten auf eine vorbestimmte groesse
DE3719539A1 (de) * 1986-06-11 1987-12-17 Toshiba Kawasaki Kk Verfahren zum ausrichten eines ersten und eines zweiten objekts relativ zueinander und vorrichtung zur durchfuehrung des verfahrens
US4838693A (en) * 1986-06-11 1989-06-13 Kabushiki Kaisha Toshiba Method and apparatus for setting a gap between first and second objects to a predetermined distance
US4848911A (en) * 1986-06-11 1989-07-18 Kabushiki Kaisha Toshiba Method for aligning first and second objects, relative to each other, and apparatus for practicing this method
DE4106987A1 (de) * 1990-03-05 1991-09-12 Toshiba Kawasaki Kk Verfahren und vorrichtung zum einstellen des spaltabstands zwischen zwei objekten auf eine vorbestimmte groesse
JPH09508463A (ja) * 1994-01-24 1997-08-26 エスヴィージー リトグラフィー システムズ インコーポレイテッド 格子−格子干渉型位置合わせ装置

Also Published As

Publication number Publication date
JPH0582729B2 (enExample) 1993-11-22

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term