JPS6090810A - フルオロシランガスの製造方法 - Google Patents
フルオロシランガスの製造方法Info
- Publication number
- JPS6090810A JPS6090810A JP19515583A JP19515583A JPS6090810A JP S6090810 A JPS6090810 A JP S6090810A JP 19515583 A JP19515583 A JP 19515583A JP 19515583 A JP19515583 A JP 19515583A JP S6090810 A JPS6090810 A JP S6090810A
- Authority
- JP
- Japan
- Prior art keywords
- fluorosilane
- gas
- impurities
- activated carbon
- chlorine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19515583A JPS6090810A (ja) | 1983-10-20 | 1983-10-20 | フルオロシランガスの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19515583A JPS6090810A (ja) | 1983-10-20 | 1983-10-20 | フルオロシランガスの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6090810A true JPS6090810A (ja) | 1985-05-22 |
JPS6241166B2 JPS6241166B2 (enrdf_load_stackoverflow) | 1987-09-01 |
Family
ID=16336342
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19515583A Granted JPS6090810A (ja) | 1983-10-20 | 1983-10-20 | フルオロシランガスの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6090810A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4900530A (en) * | 1986-07-23 | 1990-02-13 | Enichem Agricoltura S.P.A. | Process for the production of silicon tetrafluoride |
US5232602A (en) * | 1992-07-01 | 1993-08-03 | Hemlock Semiconductor Corporation | Phosphorous removal from tetrachlorosilane |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57156317A (en) * | 1981-03-18 | 1982-09-27 | Central Glass Co Ltd | Purification of silicon tetrafluoride |
-
1983
- 1983-10-20 JP JP19515583A patent/JPS6090810A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57156317A (en) * | 1981-03-18 | 1982-09-27 | Central Glass Co Ltd | Purification of silicon tetrafluoride |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4900530A (en) * | 1986-07-23 | 1990-02-13 | Enichem Agricoltura S.P.A. | Process for the production of silicon tetrafluoride |
US5232602A (en) * | 1992-07-01 | 1993-08-03 | Hemlock Semiconductor Corporation | Phosphorous removal from tetrachlorosilane |
Also Published As
Publication number | Publication date |
---|---|
JPS6241166B2 (enrdf_load_stackoverflow) | 1987-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5051117A (en) | Process for removing gaseous contaminating compounds from carrier gases containing halosilane compounds | |
US2971607A (en) | Method for purifying silance | |
KR101159674B1 (ko) | 모노실란의 정제방법 | |
KR20070116258A (ko) | 트리플루오르화질소의 정제 | |
JP5157441B2 (ja) | 六塩化二ケイ素の精製方法 | |
JP2004149351A (ja) | クロロシラン及びその精製方法 | |
JP3727470B2 (ja) | 炭素含有量の少ない多結晶シリコンの製造方法 | |
CN101935020B (zh) | 甲烷氯化物副产氯化氢的提纯方法 | |
JP2570409B2 (ja) | クロロポリシランの精製方法 | |
JPS6090810A (ja) | フルオロシランガスの製造方法 | |
JP3516716B2 (ja) | トリフルオロメタンの精製法 | |
JPH0352406B2 (enrdf_load_stackoverflow) | ||
JPH10316691A (ja) | クロロシランからのリン除去法 | |
JPS641405B2 (enrdf_load_stackoverflow) | ||
JPS635324B2 (enrdf_load_stackoverflow) | ||
JPH01103901A (ja) | 水素の精製方法 | |
JP2003126647A (ja) | 特殊ガスの除害方法及び装置 | |
JP2002173495A (ja) | 高純度有機シラン類及びその精製法 | |
JPH07330316A (ja) | 三弗化窒素ガスの精製方法 | |
JPS6319443B2 (enrdf_load_stackoverflow) | ||
JPH0436090B2 (enrdf_load_stackoverflow) | ||
JP4437733B2 (ja) | トリメチルシランの精製方法 | |
JPS6270217A (ja) | モノシランの精製方法 | |
JPS62143812A (ja) | 四弗化ケイ素の精製法 | |
JPH0480848B2 (enrdf_load_stackoverflow) |