JPS6070742A - マスタ・スライス型半導体装置 - Google Patents
マスタ・スライス型半導体装置Info
- Publication number
- JPS6070742A JPS6070742A JP58178591A JP17859183A JPS6070742A JP S6070742 A JPS6070742 A JP S6070742A JP 58178591 A JP58178591 A JP 58178591A JP 17859183 A JP17859183 A JP 17859183A JP S6070742 A JPS6070742 A JP S6070742A
- Authority
- JP
- Japan
- Prior art keywords
- input
- output circuit
- circuit area
- output
- bonding pads
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/90—Masterslice integrated circuits
- H10D84/998—Input and output buffer/driver structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05554—Shape in top view being square
Landscapes
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58178591A JPS6070742A (ja) | 1983-09-27 | 1983-09-27 | マスタ・スライス型半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58178591A JPS6070742A (ja) | 1983-09-27 | 1983-09-27 | マスタ・スライス型半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6070742A true JPS6070742A (ja) | 1985-04-22 |
| JPH0542823B2 JPH0542823B2 (cs) | 1993-06-29 |
Family
ID=16051136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58178591A Granted JPS6070742A (ja) | 1983-09-27 | 1983-09-27 | マスタ・スライス型半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6070742A (cs) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02180049A (ja) * | 1989-01-04 | 1990-07-12 | Nec Corp | 半導体装置 |
| JPH0327529A (ja) * | 1990-02-23 | 1991-02-05 | Seiko Epson Corp | 半導体集積回路装置 |
| US5216280A (en) * | 1989-12-02 | 1993-06-01 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device having pads at periphery of semiconductor chip |
| EP0826243A4 (en) * | 1995-05-12 | 2000-07-19 | Sarnoff Corp | PROTECTION AGAINST ELECTROSTATIC DISCHARGE FOR A MACROCELL FIELD |
| WO2006035787A1 (ja) * | 2004-09-28 | 2006-04-06 | Kabushiki Kaisha Toshiba | 半導体装置 |
| KR20210045403A (ko) * | 2018-08-21 | 2021-04-26 | 텍사스 인스트루먼츠 인코포레이티드 | 패드 제한 구성 가능 로직 디바이스 |
-
1983
- 1983-09-27 JP JP58178591A patent/JPS6070742A/ja active Granted
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02180049A (ja) * | 1989-01-04 | 1990-07-12 | Nec Corp | 半導体装置 |
| US5216280A (en) * | 1989-12-02 | 1993-06-01 | Kabushiki Kaisha Toshiba | Semiconductor integrated circuit device having pads at periphery of semiconductor chip |
| JPH0327529A (ja) * | 1990-02-23 | 1991-02-05 | Seiko Epson Corp | 半導体集積回路装置 |
| EP0826243A4 (en) * | 1995-05-12 | 2000-07-19 | Sarnoff Corp | PROTECTION AGAINST ELECTROSTATIC DISCHARGE FOR A MACROCELL FIELD |
| WO2006035787A1 (ja) * | 2004-09-28 | 2006-04-06 | Kabushiki Kaisha Toshiba | 半導体装置 |
| JP2006100436A (ja) * | 2004-09-28 | 2006-04-13 | Toshiba Corp | 半導体装置 |
| US7550838B2 (en) | 2004-09-28 | 2009-06-23 | Kabushiki Kaisha Toshiba | Semiconductor device |
| KR20210045403A (ko) * | 2018-08-21 | 2021-04-26 | 텍사스 인스트루먼츠 인코포레이티드 | 패드 제한 구성 가능 로직 디바이스 |
| CN112840452A (zh) * | 2018-08-21 | 2021-05-25 | 德克萨斯仪器股份有限公司 | 焊盘受限的可配置逻辑器件 |
| JP2021534592A (ja) * | 2018-08-21 | 2021-12-09 | テキサス インスツルメンツ インコーポレイテッド | パッド制限構成可能論理デバイス |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0542823B2 (cs) | 1993-06-29 |
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