JPS6043843A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6043843A
JPS6043843A JP58151322A JP15132283A JPS6043843A JP S6043843 A JPS6043843 A JP S6043843A JP 58151322 A JP58151322 A JP 58151322A JP 15132283 A JP15132283 A JP 15132283A JP S6043843 A JPS6043843 A JP S6043843A
Authority
JP
Japan
Prior art keywords
film
semiconductor device
groove
isolating region
psg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58151322A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033948B2 (cg-RX-API-DMAC10.html
Inventor
Keimei Mikoshiba
御子柴　啓明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP58151322A priority Critical patent/JPS6043843A/ja
Publication of JPS6043843A publication Critical patent/JPS6043843A/ja
Publication of JPH033948B2 publication Critical patent/JPH033948B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0145—
    • H10W10/17—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP58151322A 1983-08-19 1983-08-19 半導体装置の製造方法 Granted JPS6043843A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58151322A JPS6043843A (ja) 1983-08-19 1983-08-19 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58151322A JPS6043843A (ja) 1983-08-19 1983-08-19 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6043843A true JPS6043843A (ja) 1985-03-08
JPH033948B2 JPH033948B2 (cg-RX-API-DMAC10.html) 1991-01-21

Family

ID=15516086

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58151322A Granted JPS6043843A (ja) 1983-08-19 1983-08-19 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6043843A (cg-RX-API-DMAC10.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4952524A (en) * 1989-05-05 1990-08-28 At&T Bell Laboratories Semiconductor device manufacture including trench formation
JPH0382053A (ja) * 1989-08-24 1991-04-08 Nec Corp 半導体装置
US5148247A (en) * 1988-01-21 1992-09-15 Fujitsu Limited Semiconductor device having trench isolation

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712533A (en) * 1980-06-26 1982-01-22 Fujitsu Ltd Manufacture of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5712533A (en) * 1980-06-26 1982-01-22 Fujitsu Ltd Manufacture of semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5148247A (en) * 1988-01-21 1992-09-15 Fujitsu Limited Semiconductor device having trench isolation
US4952524A (en) * 1989-05-05 1990-08-28 At&T Bell Laboratories Semiconductor device manufacture including trench formation
JPH02304947A (ja) * 1989-05-05 1990-12-18 American Teleph & Telegr Co <Att> 半導体デバイスの製造方法
JPH0382053A (ja) * 1989-08-24 1991-04-08 Nec Corp 半導体装置

Also Published As

Publication number Publication date
JPH033948B2 (cg-RX-API-DMAC10.html) 1991-01-21

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