JPS6038830A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6038830A
JPS6038830A JP58146299A JP14629983A JPS6038830A JP S6038830 A JPS6038830 A JP S6038830A JP 58146299 A JP58146299 A JP 58146299A JP 14629983 A JP14629983 A JP 14629983A JP S6038830 A JPS6038830 A JP S6038830A
Authority
JP
Japan
Prior art keywords
film
forming
semiconductor device
single crystal
silicon layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58146299A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0451977B2 (enExample
Inventor
Tetsuro Yanai
矢内　鉄朗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58146299A priority Critical patent/JPS6038830A/ja
Publication of JPS6038830A publication Critical patent/JPS6038830A/ja
Publication of JPH0451977B2 publication Critical patent/JPH0451977B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10W10/0121—
    • H10W10/13—

Landscapes

  • Element Separation (AREA)
  • Recrystallisation Techniques (AREA)
JP58146299A 1983-08-12 1983-08-12 半導体装置の製造方法 Granted JPS6038830A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58146299A JPS6038830A (ja) 1983-08-12 1983-08-12 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58146299A JPS6038830A (ja) 1983-08-12 1983-08-12 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6038830A true JPS6038830A (ja) 1985-02-28
JPH0451977B2 JPH0451977B2 (enExample) 1992-08-20

Family

ID=15404534

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58146299A Granted JPS6038830A (ja) 1983-08-12 1983-08-12 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6038830A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02288248A (ja) * 1989-04-06 1990-11-28 Internatl Business Mach Corp <Ibm> Ｓｏｉ構造体及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831552A (ja) * 1981-08-18 1983-02-24 Seiko Epson Corp 半導体装置の製造方法
JPS5861641A (ja) * 1981-10-09 1983-04-12 Hitachi Ltd 半導体装置の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5831552A (ja) * 1981-08-18 1983-02-24 Seiko Epson Corp 半導体装置の製造方法
JPS5861641A (ja) * 1981-10-09 1983-04-12 Hitachi Ltd 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02288248A (ja) * 1989-04-06 1990-11-28 Internatl Business Mach Corp <Ibm> Ｓｏｉ構造体及びその製造方法

Also Published As

Publication number Publication date
JPH0451977B2 (enExample) 1992-08-20

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