JPS6037550A - ポジ型感光性耐熱材料 - Google Patents

ポジ型感光性耐熱材料

Info

Publication number
JPS6037550A
JPS6037550A JP14610783A JP14610783A JPS6037550A JP S6037550 A JPS6037550 A JP S6037550A JP 14610783 A JP14610783 A JP 14610783A JP 14610783 A JP14610783 A JP 14610783A JP S6037550 A JPS6037550 A JP S6037550A
Authority
JP
Japan
Prior art keywords
polymer
formula
photosensitive material
relief pattern
residue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14610783A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0159571B2 (cs
Inventor
Shigeru Kubota
繁 久保田
Norimoto Moriwaki
森脇　紀元
Torahiko Ando
虎彦 安藤
Shohei Eto
江藤　昌平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14610783A priority Critical patent/JPS6037550A/ja
Publication of JPS6037550A publication Critical patent/JPS6037550A/ja
Publication of JPH0159571B2 publication Critical patent/JPH0159571B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
JP14610783A 1983-08-09 1983-08-09 ポジ型感光性耐熱材料 Granted JPS6037550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14610783A JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14610783A JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS6037550A true JPS6037550A (ja) 1985-02-26
JPH0159571B2 JPH0159571B2 (cs) 1989-12-18

Family

ID=15400303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14610783A Granted JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS6037550A (cs)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63191831A (ja) * 1986-09-04 1988-08-09 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物およびその製造法
JPH01232037A (ja) * 1988-03-11 1989-09-18 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物の薄膜を含む複合物品
US5043248A (en) * 1986-09-04 1991-08-27 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Photosensitive amhilphilic high polymers and process for producing them
US6232032B1 (en) 1998-05-29 2001-05-15 Hitachi Chemical Dupont Microsystems L.L.C. Photosensitive polymer composition, method for forming relief patterns, and electronic parts
US6541178B2 (en) 1999-12-29 2003-04-01 Samsung Electronics Co., Ltd. Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same
US6600006B2 (en) 2000-12-29 2003-07-29 Samsung Electronics Co., Ltd. Positive-type photosensitive polyimide precursor and composition comprising the same
WO2005069075A1 (ja) 2004-01-14 2005-07-28 Hitachi Chemical Dupont Microsystems Ltd. 感光性重合体組成物、パターンの製造法及び電子部品
US7157204B2 (en) 2002-11-07 2007-01-02 Samsung Electronics Co., Ltd. Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide
JP2008103660A (ja) * 2006-09-19 2008-05-01 Hitachi Chemical Dupont Microsystems Ltd 樹脂膜形成方法、レリーフパターンの製造方法及び電子部品
US8758976B2 (en) 2008-03-07 2014-06-24 Lg Chem Ltd. Positive photosensitive polyimide composition

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW442688B (en) 1998-07-15 2001-06-23 Hitachi Ltd Reflective liquid crystal display device and its manufacture
JP2024118847A (ja) 2023-02-21 2024-09-02 富士フイルムビジネスイノベーション株式会社 印刷システム、印刷方法、印刷物の製造方法及び制御装置

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63191831A (ja) * 1986-09-04 1988-08-09 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物およびその製造法
US5043248A (en) * 1986-09-04 1991-08-27 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Photosensitive amhilphilic high polymers and process for producing them
JPH01232037A (ja) * 1988-03-11 1989-09-18 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物の薄膜を含む複合物品
US6232032B1 (en) 1998-05-29 2001-05-15 Hitachi Chemical Dupont Microsystems L.L.C. Photosensitive polymer composition, method for forming relief patterns, and electronic parts
US6365306B2 (en) 1998-05-29 2002-04-02 Hitachi Chemical Dupont Microsystems L.L.C. Photosensitive polymer composition, method for forming relief patterns, and electronic parts
US6541178B2 (en) 1999-12-29 2003-04-01 Samsung Electronics Co., Ltd. Ion-type photoacid generator containing naphthol and photosensitive polyimide composition prepared by using the same
US6600006B2 (en) 2000-12-29 2003-07-29 Samsung Electronics Co., Ltd. Positive-type photosensitive polyimide precursor and composition comprising the same
US7157204B2 (en) 2002-11-07 2007-01-02 Samsung Electronics Co., Ltd. Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide
WO2005069075A1 (ja) 2004-01-14 2005-07-28 Hitachi Chemical Dupont Microsystems Ltd. 感光性重合体組成物、パターンの製造法及び電子部品
US8231959B2 (en) 2004-01-14 2012-07-31 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive polymer composition, method of producing pattern and electronic parts
US8852726B2 (en) 2004-01-14 2014-10-07 Hitachi Chemical Dupont Microsystems Ltd. Photosensitive polymer composition, method of producing pattern and electronic parts
JP2008103660A (ja) * 2006-09-19 2008-05-01 Hitachi Chemical Dupont Microsystems Ltd 樹脂膜形成方法、レリーフパターンの製造方法及び電子部品
US8758976B2 (en) 2008-03-07 2014-06-24 Lg Chem Ltd. Positive photosensitive polyimide composition

Also Published As

Publication number Publication date
JPH0159571B2 (cs) 1989-12-18

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