JPS60254132A - パタ−ン形成材料 - Google Patents

パタ−ン形成材料

Info

Publication number
JPS60254132A
JPS60254132A JP59109503A JP10950384A JPS60254132A JP S60254132 A JPS60254132 A JP S60254132A JP 59109503 A JP59109503 A JP 59109503A JP 10950384 A JP10950384 A JP 10950384A JP S60254132 A JPS60254132 A JP S60254132A
Authority
JP
Japan
Prior art keywords
formula
pattern
hydroxyl groups
forming material
silylating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59109503A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0414782B2 (https=
Inventor
Shunichi Fukuyama
俊一 福山
Yasuhiro Yoneda
泰博 米田
Masashi Miyagawa
昌士 宮川
Kota Nishii
耕太 西井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59109503A priority Critical patent/JPS60254132A/ja
Priority to KR1019850003764A priority patent/KR900002364B1/ko
Priority to DE8585303811T priority patent/DE3574418D1/de
Priority to EP85303811A priority patent/EP0163538B1/en
Publication of JPS60254132A publication Critical patent/JPS60254132A/ja
Priority to US06/835,741 priority patent/US4657843A/en
Priority to US07/027,089 priority patent/US4863833A/en
Publication of JPH0414782B2 publication Critical patent/JPH0414782B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59109503A 1984-05-30 1984-05-31 パタ−ン形成材料 Granted JPS60254132A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP59109503A JPS60254132A (ja) 1984-05-31 1984-05-31 パタ−ン形成材料
KR1019850003764A KR900002364B1 (ko) 1984-05-30 1985-05-30 패턴 형성재의 제조방법
DE8585303811T DE3574418D1 (en) 1984-05-30 1985-05-30 Pattern-forming material and its production and use
EP85303811A EP0163538B1 (en) 1984-05-30 1985-05-30 Pattern-forming material and its production and use
US06/835,741 US4657843A (en) 1984-05-30 1986-03-03 Use of polysilsesquioxane without hydroxyl group for forming mask
US07/027,089 US4863833A (en) 1984-05-30 1987-03-16 Pattern-forming material and its production and use

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59109503A JPS60254132A (ja) 1984-05-31 1984-05-31 パタ−ン形成材料

Publications (2)

Publication Number Publication Date
JPS60254132A true JPS60254132A (ja) 1985-12-14
JPH0414782B2 JPH0414782B2 (https=) 1992-03-13

Family

ID=14511912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59109503A Granted JPS60254132A (ja) 1984-05-30 1984-05-31 パタ−ン形成材料

Country Status (1)

Country Link
JP (1) JPS60254132A (https=)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62502071A (ja) * 1985-03-07 1987-08-13 ヒュ−ズ・エアクラフト・カンパニ− イオンビ−ムと電子ビ−ムリソグラフイのためのポリシロキサンレジスト
JPS63193956A (ja) * 1987-02-06 1988-08-11 Nippon Zeon Co Ltd 樹脂溶液組成物
JPH02269771A (ja) * 1989-04-12 1990-11-05 Shin Etsu Chem Co Ltd 耐熱性シリコーンゲル組成物
JPH0443361A (ja) * 1990-06-11 1992-02-13 Fujitsu Ltd 有機硅素重合体レジストとその製造方法
US6914114B2 (en) 2000-07-17 2005-07-05 Honeywell International Inc. Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5388099A (en) * 1977-01-14 1978-08-03 Japan Synthetic Rubber Co Ltd Methylpolysiloxane
JPS5550645A (en) * 1978-10-06 1980-04-12 Hitachi Ltd Semiconductor device
JPS56827A (en) * 1979-06-15 1981-01-07 Japan Synthetic Rubber Co Ltd Production of block copolymer
JPS5649540A (en) * 1979-06-21 1981-05-06 Fujitsu Ltd Semiconductor device
JPS5760330A (en) * 1980-09-27 1982-04-12 Fujitsu Ltd Resin composition
JPS5958031A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd シリコ−ン樹脂及びその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5388099A (en) * 1977-01-14 1978-08-03 Japan Synthetic Rubber Co Ltd Methylpolysiloxane
JPS5550645A (en) * 1978-10-06 1980-04-12 Hitachi Ltd Semiconductor device
JPS56827A (en) * 1979-06-15 1981-01-07 Japan Synthetic Rubber Co Ltd Production of block copolymer
JPS5649540A (en) * 1979-06-21 1981-05-06 Fujitsu Ltd Semiconductor device
JPS5760330A (en) * 1980-09-27 1982-04-12 Fujitsu Ltd Resin composition
JPS5958031A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd シリコ−ン樹脂及びその製造方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62502071A (ja) * 1985-03-07 1987-08-13 ヒュ−ズ・エアクラフト・カンパニ− イオンビ−ムと電子ビ−ムリソグラフイのためのポリシロキサンレジスト
JPS63193956A (ja) * 1987-02-06 1988-08-11 Nippon Zeon Co Ltd 樹脂溶液組成物
JPH02269771A (ja) * 1989-04-12 1990-11-05 Shin Etsu Chem Co Ltd 耐熱性シリコーンゲル組成物
JPH0443361A (ja) * 1990-06-11 1992-02-13 Fujitsu Ltd 有機硅素重合体レジストとその製造方法
US6914114B2 (en) 2000-07-17 2005-07-05 Honeywell International Inc. Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Also Published As

Publication number Publication date
JPH0414782B2 (https=) 1992-03-13

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Legal Events

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