JPH0414782B2 - - Google Patents

Info

Publication number
JPH0414782B2
JPH0414782B2 JP59109503A JP10950384A JPH0414782B2 JP H0414782 B2 JPH0414782 B2 JP H0414782B2 JP 59109503 A JP59109503 A JP 59109503A JP 10950384 A JP10950384 A JP 10950384A JP H0414782 B2 JPH0414782 B2 JP H0414782B2
Authority
JP
Japan
Prior art keywords
pattern
polymethylsilsesquioxane
silylation
hydroxyl groups
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59109503A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60254132A (ja
Inventor
Shunichi Fukuyama
Yasuhiro Yoneda
Masashi Myagawa
Kota Nishii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59109503A priority Critical patent/JPS60254132A/ja
Priority to KR1019850003764A priority patent/KR900002364B1/ko
Priority to DE8585303811T priority patent/DE3574418D1/de
Priority to EP85303811A priority patent/EP0163538B1/en
Publication of JPS60254132A publication Critical patent/JPS60254132A/ja
Priority to US06/835,741 priority patent/US4657843A/en
Priority to US07/027,089 priority patent/US4863833A/en
Publication of JPH0414782B2 publication Critical patent/JPH0414782B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP59109503A 1984-05-30 1984-05-31 パタ−ン形成材料 Granted JPS60254132A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP59109503A JPS60254132A (ja) 1984-05-31 1984-05-31 パタ−ン形成材料
KR1019850003764A KR900002364B1 (ko) 1984-05-30 1985-05-30 패턴 형성재의 제조방법
DE8585303811T DE3574418D1 (en) 1984-05-30 1985-05-30 Pattern-forming material and its production and use
EP85303811A EP0163538B1 (en) 1984-05-30 1985-05-30 Pattern-forming material and its production and use
US06/835,741 US4657843A (en) 1984-05-30 1986-03-03 Use of polysilsesquioxane without hydroxyl group for forming mask
US07/027,089 US4863833A (en) 1984-05-30 1987-03-16 Pattern-forming material and its production and use

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59109503A JPS60254132A (ja) 1984-05-31 1984-05-31 パタ−ン形成材料

Publications (2)

Publication Number Publication Date
JPS60254132A JPS60254132A (ja) 1985-12-14
JPH0414782B2 true JPH0414782B2 (https=) 1992-03-13

Family

ID=14511912

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59109503A Granted JPS60254132A (ja) 1984-05-30 1984-05-31 パタ−ン形成材料

Country Status (1)

Country Link
JP (1) JPS60254132A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62502071A (ja) * 1985-03-07 1987-08-13 ヒュ−ズ・エアクラフト・カンパニ− イオンビ−ムと電子ビ−ムリソグラフイのためのポリシロキサンレジスト
JPS63193956A (ja) * 1987-02-06 1988-08-11 Nippon Zeon Co Ltd 樹脂溶液組成物
JPH0660282B2 (ja) * 1989-04-12 1994-08-10 信越化学工業株式会社 耐熱性シリコーンゲル組成物
JPH0443361A (ja) * 1990-06-11 1992-02-13 Fujitsu Ltd 有機硅素重合体レジストとその製造方法
US6368400B1 (en) 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6017214B2 (ja) * 1977-01-14 1985-05-01 ジェイエスアール株式会社 可溶性メチルポリシロキサンおよびその製造法
JPS6058592B2 (ja) * 1978-10-06 1985-12-20 株式会社日立製作所 半導体装置
JPS56827A (en) * 1979-06-15 1981-01-07 Japan Synthetic Rubber Co Ltd Production of block copolymer
JPS6046826B2 (ja) * 1979-06-21 1985-10-18 富士通株式会社 半導体装置
JPS5760330A (en) * 1980-09-27 1982-04-12 Fujitsu Ltd Resin composition
JPS5958031A (ja) * 1982-09-28 1984-04-03 Fujitsu Ltd シリコ−ン樹脂及びその製造方法

Also Published As

Publication number Publication date
JPS60254132A (ja) 1985-12-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term