JPS60247637A - 感光性樹脂組成物 - Google Patents

感光性樹脂組成物

Info

Publication number
JPS60247637A
JPS60247637A JP10423684A JP10423684A JPS60247637A JP S60247637 A JPS60247637 A JP S60247637A JP 10423684 A JP10423684 A JP 10423684A JP 10423684 A JP10423684 A JP 10423684A JP S60247637 A JPS60247637 A JP S60247637A
Authority
JP
Japan
Prior art keywords
water
group
polymer
vinyl acetate
soln
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10423684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0242212B2 (en, 2012
Inventor
Kunihiro Ichimura
國宏 市村
Tsugio Yamaoka
亜夫 山岡
Sadayoshi Kaneda
金田 貞良
Toru Shibuya
徹 渋谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murakami Screen KK
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Murakami Screen KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Murakami Screen KK filed Critical Agency of Industrial Science and Technology
Priority to JP10423684A priority Critical patent/JPS60247637A/ja
Priority to US06/624,963 priority patent/US4564580A/en
Priority to EP84304415A priority patent/EP0130804B1/en
Priority to DE8484304415T priority patent/DE3476703D1/de
Publication of JPS60247637A publication Critical patent/JPS60247637A/ja
Publication of JPH0242212B2 publication Critical patent/JPH0242212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
JP10423684A 1983-06-30 1984-05-23 感光性樹脂組成物 Granted JPS60247637A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP10423684A JPS60247637A (ja) 1984-05-23 1984-05-23 感光性樹脂組成物
US06/624,963 US4564580A (en) 1983-06-30 1984-06-26 Photosensitive resin composition
EP84304415A EP0130804B1 (en) 1983-06-30 1984-06-28 Photosensitive resin composition
DE8484304415T DE3476703D1 (en) 1983-06-30 1984-06-28 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10423684A JPS60247637A (ja) 1984-05-23 1984-05-23 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60247637A true JPS60247637A (ja) 1985-12-07
JPH0242212B2 JPH0242212B2 (en, 2012) 1990-09-21

Family

ID=14375323

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10423684A Granted JPS60247637A (ja) 1983-06-30 1984-05-23 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60247637A (en, 2012)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62123452A (ja) * 1985-11-22 1987-06-04 Fuji Photo Film Co Ltd 感光性組成物
JPS62260142A (ja) * 1986-05-06 1987-11-12 Fuotopori Ouka Kk 感光性樹脂組成物
JPH01113749A (ja) * 1987-10-27 1989-05-02 Shin Etsu Chem Co Ltd スクリーン印刷用感光性樹脂水性液
JPH02284143A (ja) * 1989-04-26 1990-11-21 Fuji Photo Film Co Ltd 感光性組成物
JPH02287546A (ja) * 1989-04-28 1990-11-27 Fuji Photo Film Co Ltd 感光性組成物
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH059407A (ja) * 1990-12-18 1993-01-19 Ciba Geigy Ag 溶媒又は分散剤として水を含む感光性組成物
JPH09160240A (ja) * 1995-12-11 1997-06-20 Toyo Gosei Kogyo Kk ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
JP2005141243A (ja) * 2000-01-31 2005-06-02 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
WO2017094698A1 (ja) * 2015-12-04 2017-06-08 日本酢ビ・ポバール株式会社 懸濁重合用分散助剤およびそれを用いるビニル系重合体の製造方法、並びに塩化ビニル樹脂

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62123452A (ja) * 1985-11-22 1987-06-04 Fuji Photo Film Co Ltd 感光性組成物
JPS62260142A (ja) * 1986-05-06 1987-11-12 Fuotopori Ouka Kk 感光性樹脂組成物
JPH01113749A (ja) * 1987-10-27 1989-05-02 Shin Etsu Chem Co Ltd スクリーン印刷用感光性樹脂水性液
JPH02284143A (ja) * 1989-04-26 1990-11-21 Fuji Photo Film Co Ltd 感光性組成物
JPH02287546A (ja) * 1989-04-28 1990-11-27 Fuji Photo Film Co Ltd 感光性組成物
JPH0425845A (ja) * 1990-05-21 1992-01-29 Fuji Photo Film Co Ltd 感光性平版印刷版
JPH059407A (ja) * 1990-12-18 1993-01-19 Ciba Geigy Ag 溶媒又は分散剤として水を含む感光性組成物
JPH09160240A (ja) * 1995-12-11 1997-06-20 Toyo Gosei Kogyo Kk ポリビニルアルコール系感光性樹脂および感光性樹脂組成物並びにそれを用いたパターン形成方法
JP2005141243A (ja) * 2000-01-31 2005-06-02 Mitsubishi Paper Mills Ltd 感光性組成物および感光性平版印刷版材料
WO2007132532A1 (ja) 2006-05-17 2007-11-22 Murakami Co., Ltd. 感光性樹脂組成物およびこれを用いてなる感光性フィルムならびにスクリーン印刷用ステンシル
US7767381B2 (en) 2006-05-17 2010-08-03 Murakami Co., Ltd. Photosensitive resin composition, and photosensitive film and stencil for screen printing using the photosensitive composition
WO2017094698A1 (ja) * 2015-12-04 2017-06-08 日本酢ビ・ポバール株式会社 懸濁重合用分散助剤およびそれを用いるビニル系重合体の製造方法、並びに塩化ビニル樹脂
CN108290968A (zh) * 2015-12-04 2018-07-17 日本瓦姆&珀巴尔株式会社 悬浮聚合用分散助剂、使用该分散助剂的乙烯系聚合物的制造方法以及氯乙烯树脂
US10731032B2 (en) 2015-12-04 2020-08-04 Japan Vam & Poval Co., Ltd. Dispersion assistant for suspension polymerization, method for producing vinyl-based polymer using the same, and vinyl chloride resin
CN108290968B (zh) * 2015-12-04 2021-07-13 日本瓦姆&珀巴尔株式会社 悬浮聚合用分散助剂、使用该分散助剂的乙烯系聚合物的制造方法以及氯乙烯树脂

Also Published As

Publication number Publication date
JPH0242212B2 (en, 2012) 1990-09-21

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term