JPS60239736A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS60239736A
JPS60239736A JP9625684A JP9625684A JPS60239736A JP S60239736 A JPS60239736 A JP S60239736A JP 9625684 A JP9625684 A JP 9625684A JP 9625684 A JP9625684 A JP 9625684A JP S60239736 A JPS60239736 A JP S60239736A
Authority
JP
Japan
Prior art keywords
group
photosensitive
acid
compounds
free radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9625684A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0444737B2 (enrdf_load_stackoverflow
Inventor
Teruo Nagano
長野 照男
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP9625684A priority Critical patent/JPS60239736A/ja
Priority to DE19853517440 priority patent/DE3517440A1/de
Publication of JPS60239736A publication Critical patent/JPS60239736A/ja
Publication of JPH0444737B2 publication Critical patent/JPH0444737B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D161/00Coating compositions based on condensation polymers of aldehydes or ketones; Coating compositions based on derivatives of such polymers
    • C09D161/04Condensation polymers of aldehydes or ketones with phenols only
    • C09D161/06Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D251/00Heterocyclic compounds containing 1,3,5-triazine rings
    • C07D251/02Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings
    • C07D251/12Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members
    • C07D251/14Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom
    • C07D251/24Heterocyclic compounds containing 1,3,5-triazine rings not condensed with other rings having three double bonds between ring members or between ring members and non-ring members with hydrogen or carbon atoms directly attached to at least one ring carbon atom to three ring carbon atoms
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295Photolytic halogen compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9625684A 1984-05-14 1984-05-14 感光性組成物 Granted JPS60239736A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP9625684A JPS60239736A (ja) 1984-05-14 1984-05-14 感光性組成物
DE19853517440 DE3517440A1 (de) 1984-05-14 1985-05-14 Lichtempfindliche zusammensetzung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9625684A JPS60239736A (ja) 1984-05-14 1984-05-14 感光性組成物

Publications (2)

Publication Number Publication Date
JPS60239736A true JPS60239736A (ja) 1985-11-28
JPH0444737B2 JPH0444737B2 (enrdf_load_stackoverflow) 1992-07-22

Family

ID=14160114

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9625684A Granted JPS60239736A (ja) 1984-05-14 1984-05-14 感光性組成物

Country Status (2)

Country Link
JP (1) JPS60239736A (enrdf_load_stackoverflow)
DE (1) DE3517440A1 (enrdf_load_stackoverflow)

Cited By (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61151644A (ja) * 1984-12-26 1986-07-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62115150A (ja) * 1985-07-02 1987-05-26 Fuji Photo Film Co Ltd 感光性組成物
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP0784233A1 (en) 1996-01-10 1997-07-16 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
US5885746A (en) * 1994-12-29 1999-03-23 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
US5908734A (en) * 1996-07-09 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Image formation method with a post exposure heating step
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
EP1602982A2 (en) 2004-05-31 2005-12-07 Fuji Photo Film Co., Ltd. method of producing a lithographic printing plate and planographic printing method
EP1614537A1 (en) 2004-07-07 2006-01-11 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
EP1619023A2 (en) 2004-07-20 2006-01-25 Fuji Photo Film Co., Ltd. Image forming material
EP1621338A1 (en) 2004-07-27 2006-02-01 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
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US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
US5116977A (en) * 1988-09-07 1992-05-26 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
US5153323A (en) * 1988-09-07 1992-10-06 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a photoinitiator moiety
US4985562A (en) * 1988-09-07 1991-01-15 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
US5387682A (en) * 1988-09-07 1995-02-07 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
US5187045A (en) * 1988-09-07 1993-02-16 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety
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Cited By (115)

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Publication number Priority date Publication date Assignee Title
JPS61151644A (ja) * 1984-12-26 1986-07-10 Fuji Photo Film Co Ltd 感光性組成物
JPS62115150A (ja) * 1985-07-02 1987-05-26 Fuji Photo Film Co Ltd 感光性組成物
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
US5885746A (en) * 1994-12-29 1999-03-23 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
EP0747768A2 (en) 1995-06-05 1996-12-11 Fuji Photo Film Co., Ltd. Chemically amplified positive resist composition
EP0784233A1 (en) 1996-01-10 1997-07-16 Mitsubishi Chemical Corporation Photosensitive composition and lithographic printing plate
US5908734A (en) * 1996-07-09 1999-06-01 Tokyo Ohka Kogyo Co., Ltd. Image formation method with a post exposure heating step
EP2477073A1 (en) 2002-02-13 2012-07-18 Fujifilm Corporation Resist composition for electron beam, EUV or X-ray
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EP1602982A2 (en) 2004-05-31 2005-12-07 Fuji Photo Film Co., Ltd. method of producing a lithographic printing plate and planographic printing method
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EP1619023A2 (en) 2004-07-20 2006-01-25 Fuji Photo Film Co., Ltd. Image forming material
EP1621338A1 (en) 2004-07-27 2006-02-01 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor and lithographic printing method
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