JPS60224224A - マスクアライメント方法 - Google Patents

マスクアライメント方法

Info

Publication number
JPS60224224A
JPS60224224A JP59079507A JP7950784A JPS60224224A JP S60224224 A JPS60224224 A JP S60224224A JP 59079507 A JP59079507 A JP 59079507A JP 7950784 A JP7950784 A JP 7950784A JP S60224224 A JPS60224224 A JP S60224224A
Authority
JP
Japan
Prior art keywords
mask
systems
alignment
semiconductor substrate
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59079507A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556645B2 (enrdf_load_stackoverflow
Inventor
Katsumi Suzuki
克美 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP59079507A priority Critical patent/JPS60224224A/ja
Publication of JPS60224224A publication Critical patent/JPS60224224A/ja
Publication of JPH0556645B2 publication Critical patent/JPH0556645B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59079507A 1984-04-20 1984-04-20 マスクアライメント方法 Granted JPS60224224A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59079507A JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59079507A JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Publications (2)

Publication Number Publication Date
JPS60224224A true JPS60224224A (ja) 1985-11-08
JPH0556645B2 JPH0556645B2 (enrdf_load_stackoverflow) 1993-08-20

Family

ID=13691855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59079507A Granted JPS60224224A (ja) 1984-04-20 1984-04-20 マスクアライメント方法

Country Status (1)

Country Link
JP (1) JPS60224224A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166026A (ja) * 1984-12-19 1986-07-26 Fujitsu Ltd 位置合わせ方法
US5939132A (en) * 1992-09-11 1999-08-17 Matsushita Electric Industrial Co., Ltd. Alignment chips positioned in the peripheral part of the semiconductor substrate and method of manufacturing thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53132271A (en) * 1977-04-20 1978-11-17 Thomson Csf Thin semiconductor plate* method of positioning pattern projected to said plate in projector* and projector

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166026A (ja) * 1984-12-19 1986-07-26 Fujitsu Ltd 位置合わせ方法
US5939132A (en) * 1992-09-11 1999-08-17 Matsushita Electric Industrial Co., Ltd. Alignment chips positioned in the peripheral part of the semiconductor substrate and method of manufacturing thereof

Also Published As

Publication number Publication date
JPH0556645B2 (enrdf_load_stackoverflow) 1993-08-20

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