JPS60208854A - 半導体立体回路素子の製造方法 - Google Patents

半導体立体回路素子の製造方法

Info

Publication number
JPS60208854A
JPS60208854A JP59065161A JP6516184A JPS60208854A JP S60208854 A JPS60208854 A JP S60208854A JP 59065161 A JP59065161 A JP 59065161A JP 6516184 A JP6516184 A JP 6516184A JP S60208854 A JPS60208854 A JP S60208854A
Authority
JP
Japan
Prior art keywords
film
single crystal
spinel
thermal strain
dimensional circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59065161A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0133944B2 (enrdf_load_stackoverflow
Inventor
Takao Hashimoto
孝男 橋本
Isao Nakano
中野　勇男
Hiroyuki Aoe
青江　弘行
Takashi Nakakado
中門　孝
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP59065161A priority Critical patent/JPS60208854A/ja
Publication of JPS60208854A publication Critical patent/JPS60208854A/ja
Publication of JPH0133944B2 publication Critical patent/JPH0133944B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • H10D86/03—Manufacture or treatment wherein the substrate comprises sapphire, e.g. silicon-on-sapphire [SOS]
JP59065161A 1984-04-03 1984-04-03 半導体立体回路素子の製造方法 Granted JPS60208854A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59065161A JPS60208854A (ja) 1984-04-03 1984-04-03 半導体立体回路素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59065161A JPS60208854A (ja) 1984-04-03 1984-04-03 半導体立体回路素子の製造方法

Publications (2)

Publication Number Publication Date
JPS60208854A true JPS60208854A (ja) 1985-10-21
JPH0133944B2 JPH0133944B2 (enrdf_load_stackoverflow) 1989-07-17

Family

ID=13278877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59065161A Granted JPS60208854A (ja) 1984-04-03 1984-04-03 半導体立体回路素子の製造方法

Country Status (1)

Country Link
JP (1) JPS60208854A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165576A (enrdf_load_stackoverflow) * 1974-12-04 1976-06-07 Hitachi Ltd
JPS5821854A (ja) * 1981-07-31 1983-02-08 Sanyo Electric Co Ltd 半導体回路素子

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5165576A (enrdf_load_stackoverflow) * 1974-12-04 1976-06-07 Hitachi Ltd
JPS5821854A (ja) * 1981-07-31 1983-02-08 Sanyo Electric Co Ltd 半導体回路素子

Also Published As

Publication number Publication date
JPH0133944B2 (enrdf_load_stackoverflow) 1989-07-17

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