JPS60174865A - 薄膜形成用アルミニウム基材の表面処理方法 - Google Patents
薄膜形成用アルミニウム基材の表面処理方法Info
- Publication number
- JPS60174865A JPS60174865A JP2784184A JP2784184A JPS60174865A JP S60174865 A JPS60174865 A JP S60174865A JP 2784184 A JP2784184 A JP 2784184A JP 2784184 A JP2784184 A JP 2784184A JP S60174865 A JPS60174865 A JP S60174865A
- Authority
- JP
- Japan
- Prior art keywords
- base material
- aluminum base
- thin film
- film
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 25
- 239000010409 thin film Substances 0.000 title claims abstract description 21
- 239000000463 material Substances 0.000 title claims description 39
- 229910052782 aluminium Inorganic materials 0.000 title claims description 38
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 title claims description 38
- 238000004381 surface treatment Methods 0.000 title claims description 6
- 230000015572 biosynthetic process Effects 0.000 title description 5
- 239000010408 film Substances 0.000 claims abstract description 46
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000001301 oxygen Substances 0.000 claims abstract description 12
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 14
- 230000007547 defect Effects 0.000 abstract description 13
- 238000005520 cutting process Methods 0.000 abstract description 8
- 238000000227 grinding Methods 0.000 abstract description 7
- 238000010894 electron beam technology Methods 0.000 abstract description 2
- 230000002349 favourable effect Effects 0.000 abstract 1
- 239000000126 substance Substances 0.000 description 8
- 108091008695 photoreceptors Proteins 0.000 description 7
- 239000000356 contaminant Substances 0.000 description 6
- 238000005755 formation reaction Methods 0.000 description 6
- 239000011261 inert gas Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005096 rolling process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 229910018110 Se—Te Inorganic materials 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000001125 extrusion Methods 0.000 description 4
- 239000003921 oil Substances 0.000 description 4
- 229910001370 Se alloy Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 235000012907 honey Nutrition 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 229910001593 boehmite Inorganic materials 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 239000010731 rolling oil Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000010730 cutting oil Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 235000012438 extruded product Nutrition 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/10—Oxidising
- C23C8/12—Oxidising using elemental oxygen or ozone
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Formation Of Insulating Films (AREA)
- Photoreceptors In Electrophotography (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2784184A JPS60174865A (ja) | 1984-02-15 | 1984-02-15 | 薄膜形成用アルミニウム基材の表面処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2784184A JPS60174865A (ja) | 1984-02-15 | 1984-02-15 | 薄膜形成用アルミニウム基材の表面処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60174865A true JPS60174865A (ja) | 1985-09-09 |
| JPH0461070B2 JPH0461070B2 (enrdf_load_stackoverflow) | 1992-09-29 |
Family
ID=12232139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2784184A Granted JPS60174865A (ja) | 1984-02-15 | 1984-02-15 | 薄膜形成用アルミニウム基材の表面処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60174865A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6452088A (en) * | 1987-08-24 | 1989-02-28 | Tokyo Electron Ltd | Method for surface-treating aluminum and aluminum alloy body |
| JPH0222664A (ja) * | 1988-07-11 | 1990-01-25 | Fuji Electric Co Ltd | 電子写真感光体の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57147644A (en) * | 1981-03-10 | 1982-09-11 | Ricoh Co Ltd | Photoreceptor for electrophotography |
| JPS5811944A (ja) * | 1981-07-16 | 1983-01-22 | Ricoh Co Ltd | 電子写真用感光体の製造方法 |
| JPS5815239A (ja) * | 1981-07-21 | 1983-01-28 | Ricoh Co Ltd | 半導体素子 |
| JPS5877712A (ja) * | 1981-11-04 | 1983-05-11 | 昭和アルミニウム株式会社 | 真空用アルミニウム製中空押出形材の製造法 |
-
1984
- 1984-02-15 JP JP2784184A patent/JPS60174865A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57147644A (en) * | 1981-03-10 | 1982-09-11 | Ricoh Co Ltd | Photoreceptor for electrophotography |
| JPS5811944A (ja) * | 1981-07-16 | 1983-01-22 | Ricoh Co Ltd | 電子写真用感光体の製造方法 |
| JPS5815239A (ja) * | 1981-07-21 | 1983-01-28 | Ricoh Co Ltd | 半導体素子 |
| JPS5877712A (ja) * | 1981-11-04 | 1983-05-11 | 昭和アルミニウム株式会社 | 真空用アルミニウム製中空押出形材の製造法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6452088A (en) * | 1987-08-24 | 1989-02-28 | Tokyo Electron Ltd | Method for surface-treating aluminum and aluminum alloy body |
| JPH0222664A (ja) * | 1988-07-11 | 1990-01-25 | Fuji Electric Co Ltd | 電子写真感光体の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0461070B2 (enrdf_load_stackoverflow) | 1992-09-29 |
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