JPS60156000A - 軟ｘ線投射装置 - Google Patents

軟ｘ線投射装置

Info

Publication number
JPS60156000A
JPS60156000A JP1247784A JP1247784A JPS60156000A JP S60156000 A JPS60156000 A JP S60156000A JP 1247784 A JP1247784 A JP 1247784A JP 1247784 A JP1247784 A JP 1247784A JP S60156000 A JPS60156000 A JP S60156000A
Authority
JP
Japan
Prior art keywords
mirror
soft
rays
radius
synchrotron radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1247784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0527080B2 (enExample
Inventor
谷野　浩史
紘一郎 鳳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP1247784A priority Critical patent/JPS60156000A/ja
Publication of JPS60156000A publication Critical patent/JPS60156000A/ja
Publication of JPH0527080B2 publication Critical patent/JPH0527080B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Particle Accelerators (AREA)
JP1247784A 1984-01-26 1984-01-26 軟ｘ線投射装置 Granted JPS60156000A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1247784A JPS60156000A (ja) 1984-01-26 1984-01-26 軟ｘ線投射装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1247784A JPS60156000A (ja) 1984-01-26 1984-01-26 軟ｘ線投射装置

Publications (2)

Publication Number Publication Date
JPS60156000A true JPS60156000A (ja) 1985-08-16
JPH0527080B2 JPH0527080B2 (enExample) 1993-04-20

Family

ID=11806460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1247784A Granted JPS60156000A (ja) 1984-01-26 1984-01-26 軟ｘ線投射装置

Country Status (1)

Country Link
JP (1) JPS60156000A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244400A (ja) * 1988-03-25 1989-09-28 Canon Inc 露光装置
JPH02248900A (ja) * 1989-03-22 1990-10-04 Canon Inc Ｘ線露光装置
US5031199A (en) * 1990-06-05 1991-07-09 Wisconsin Alumni Research Foundation X-ray lithography beamline method and apparatus
US5371774A (en) * 1993-06-24 1994-12-06 Wisconsin Alumni Research Foundation X-ray lithography beamline imaging system

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118999A (ja) * 1981-12-31 1983-07-15 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ２次元的領域に一様な照射を行う装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58118999A (ja) * 1981-12-31 1983-07-15 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション ２次元的領域に一様な照射を行う装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01244400A (ja) * 1988-03-25 1989-09-28 Canon Inc 露光装置
JPH02248900A (ja) * 1989-03-22 1990-10-04 Canon Inc Ｘ線露光装置
US5031199A (en) * 1990-06-05 1991-07-09 Wisconsin Alumni Research Foundation X-ray lithography beamline method and apparatus
US5371774A (en) * 1993-06-24 1994-12-06 Wisconsin Alumni Research Foundation X-ray lithography beamline imaging system

Also Published As

Publication number Publication date
JPH0527080B2 (enExample) 1993-04-20

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term