JPS60130183A - ジヨセフソン集積回路作製用レジストステンシルマスク - Google Patents
ジヨセフソン集積回路作製用レジストステンシルマスクInfo
- Publication number
- JPS60130183A JPS60130183A JP58237813A JP23781383A JPS60130183A JP S60130183 A JPS60130183 A JP S60130183A JP 58237813 A JP58237813 A JP 58237813A JP 23781383 A JP23781383 A JP 23781383A JP S60130183 A JPS60130183 A JP S60130183A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- film
- thickness
- minutes
- stencil mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title description 7
- 238000000034 method Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 9
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 abstract description 4
- 230000008961 swelling Effects 0.000 abstract description 3
- 238000007598 dipping method Methods 0.000 abstract 1
- 238000004299 exfoliation Methods 0.000 abstract 1
- 230000002265 prevention Effects 0.000 abstract 1
- 230000002035 prolonged effect Effects 0.000 abstract 1
- 239000011229 interlayer Substances 0.000 description 8
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000035515 penetration Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 2
- 239000007772 electrode material Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Chemical compound O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- -1 oxygen ions Chemical class 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 206010011224 Cough Diseases 0.000 description 1
- 229910019704 Nb2O Inorganic materials 0.000 description 1
- 229910000978 Pb alloy Inorganic materials 0.000 description 1
- 229910020174 Pb-In Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000005201 scrubbing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58237813A JPS60130183A (ja) | 1983-12-19 | 1983-12-19 | ジヨセフソン集積回路作製用レジストステンシルマスク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58237813A JPS60130183A (ja) | 1983-12-19 | 1983-12-19 | ジヨセフソン集積回路作製用レジストステンシルマスク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60130183A true JPS60130183A (ja) | 1985-07-11 |
| JPH0526358B2 JPH0526358B2 (enrdf_load_stackoverflow) | 1993-04-15 |
Family
ID=17020784
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58237813A Granted JPS60130183A (ja) | 1983-12-19 | 1983-12-19 | ジヨセフソン集積回路作製用レジストステンシルマスク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60130183A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014535158A (ja) * | 2011-09-30 | 2014-12-25 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 基板上に付着した活性有機層を構造化する方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57136321A (en) * | 1981-02-18 | 1982-08-23 | Hitachi Ltd | Manufacture of resist stencil mask for lift-off |
| JPS57204123A (en) * | 1981-06-10 | 1982-12-14 | Hitachi Ltd | Forming method for resist stencil mask |
-
1983
- 1983-12-19 JP JP58237813A patent/JPS60130183A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57136321A (en) * | 1981-02-18 | 1982-08-23 | Hitachi Ltd | Manufacture of resist stencil mask for lift-off |
| JPS57204123A (en) * | 1981-06-10 | 1982-12-14 | Hitachi Ltd | Forming method for resist stencil mask |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014535158A (ja) * | 2011-09-30 | 2014-12-25 | コミッサリア ア レネルジー アトミーク エ オ ゼネルジ ザルタナテイヴ | 基板上に付着した活性有機層を構造化する方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0526358B2 (enrdf_load_stackoverflow) | 1993-04-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |