JPS5998525A - 分割焼付け装置のアライメント方法 - Google Patents

分割焼付け装置のアライメント方法

Info

Publication number
JPS5998525A
JPS5998525A JP57207207A JP20720782A JPS5998525A JP S5998525 A JPS5998525 A JP S5998525A JP 57207207 A JP57207207 A JP 57207207A JP 20720782 A JP20720782 A JP 20720782A JP S5998525 A JPS5998525 A JP S5998525A
Authority
JP
Japan
Prior art keywords
mask
microscope
wafer
optical path
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57207207A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0114697B2 (enExample
Inventor
Kazuo Takahashi
一雄 高橋
Hiroshi Sato
宏 佐藤
Masao Kosugi
小杉　雅夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP57207207A priority Critical patent/JPS5998525A/ja
Priority to US06/552,313 priority patent/US4617469A/en
Priority to GB08331280A priority patent/GB2131167B/en
Priority to DE3342719A priority patent/DE3342719C2/de
Priority to FR838318835A priority patent/FR2536873B1/fr
Publication of JPS5998525A publication Critical patent/JPS5998525A/ja
Publication of JPH0114697B2 publication Critical patent/JPH0114697B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
  • Projection-Type Copiers In General (AREA)
JP57207207A 1982-11-26 1982-11-26 分割焼付け装置のアライメント方法 Granted JPS5998525A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP57207207A JPS5998525A (ja) 1982-11-26 1982-11-26 分割焼付け装置のアライメント方法
US06/552,313 US4617469A (en) 1982-11-26 1983-11-16 Exposure apparatus with detecting means insertable into an exposure path
GB08331280A GB2131167B (en) 1982-11-26 1983-11-23 Alignment of mask and semiconductor wafer in exposure apparatus
DE3342719A DE3342719C2 (de) 1982-11-26 1983-11-25 Positionierungseinrichung in einem Projektionsbelichter
FR838318835A FR2536873B1 (fr) 1982-11-26 1983-11-25 Appareil et procede d'exposition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57207207A JPS5998525A (ja) 1982-11-26 1982-11-26 分割焼付け装置のアライメント方法

Publications (2)

Publication Number Publication Date
JPS5998525A true JPS5998525A (ja) 1984-06-06
JPH0114697B2 JPH0114697B2 (enExample) 1989-03-14

Family

ID=16536004

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57207207A Granted JPS5998525A (ja) 1982-11-26 1982-11-26 分割焼付け装置のアライメント方法

Country Status (5)

Country Link
US (1) US4617469A (enExample)
JP (1) JPS5998525A (enExample)
DE (1) DE3342719C2 (enExample)
FR (1) FR2536873B1 (enExample)
GB (1) GB2131167B (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61247025A (ja) * 1985-04-25 1986-11-04 Canon Inc 表示パネル製造方法
CN104391432A (zh) * 2014-12-18 2015-03-04 中国电子科技集团公司第四十七研究所 扫描式光刻方法
CN111060015A (zh) * 2019-12-10 2020-04-24 太原昂迈威电子科技有限公司 一种堆垛机运动垂直方向的小幅度位移检测装置

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2151350A (en) * 1983-11-25 1985-07-17 Vs Eng Ltd Sensing arrangement
US4785192A (en) * 1984-06-21 1988-11-15 American Telephone And Telegraph Company, At&T Bell Laboratories Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
EP0182251B1 (en) * 1984-11-13 1989-10-18 Hitachi, Ltd. Alignment method for reduction projection type aligner
US4780615A (en) * 1985-02-01 1988-10-25 Canon Kabushiki Kaisha Alignment system for use in pattern transfer apparatus
US5202774A (en) * 1989-07-14 1993-04-13 Konica Corporation Image reading apparatus
US5200800A (en) * 1990-05-01 1993-04-06 Canon Kabushiki Kaisha Position detecting method and apparatus
JPH04215417A (ja) * 1990-12-14 1992-08-06 Fujitsu Ltd 露光方法
JP3278277B2 (ja) * 1994-01-26 2002-04-30 キヤノン株式会社 投影露光装置及びこれを用いたデバイス製造方法
JP3057998B2 (ja) * 1994-02-16 2000-07-04 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP3082652B2 (ja) * 1994-12-27 2000-08-28 キヤノン株式会社 照明装置及びそれを用いたデバイスの製造方法
JP3412981B2 (ja) * 1995-08-29 2003-06-03 キヤノン株式会社 投影露光装置および投影露光方法
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
EP0806266A3 (en) * 1996-05-09 1998-12-09 Canon Kabushiki Kaisha Polishing method and polishing apparatus using the same
JPH1015807A (ja) * 1996-07-01 1998-01-20 Canon Inc 研磨システム
JPH1041225A (ja) * 1996-07-24 1998-02-13 Canon Inc 照明装置及びそれを用いた投影露光装置
JP3376961B2 (ja) * 1999-06-08 2003-02-17 ウシオ電機株式会社 マスクを移動させて位置合わせを行う露光装置
JP3791600B2 (ja) * 2002-01-11 2006-06-28 リコープリンティングシステムズ株式会社 電子写真装置
US6911025B2 (en) * 2002-01-25 2005-06-28 Jms Co., Ltd. Connector system for sterile connection

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS583227A (ja) * 1981-06-29 1983-01-10 Fujitsu Ltd チップアライメント方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4052603A (en) * 1974-12-23 1977-10-04 International Business Machines Corporation Object positioning process and apparatus
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
JPS5952535B2 (ja) * 1977-01-21 1984-12-20 キヤノン株式会社 光学装置
US4172664A (en) * 1977-12-30 1979-10-30 International Business Machines Corporation High precision pattern registration and overlay measurement system and process
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren
JPS55162227A (en) * 1979-06-04 1980-12-17 Hitachi Ltd Microprojection exposure device
JPS56110234A (en) * 1980-02-06 1981-09-01 Canon Inc Projection printing device
US4362389A (en) * 1980-02-19 1982-12-07 Hitachi, Ltd. Method and apparatus for projection type mask alignment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138134A (en) * 1981-02-20 1982-08-26 Nippon Kogaku Kk <Nikon> Positioning device
JPS57142612A (en) * 1981-02-27 1982-09-03 Nippon Kogaku Kk <Nikon> Alignment optical system of projection type exposure device
JPS583227A (ja) * 1981-06-29 1983-01-10 Fujitsu Ltd チップアライメント方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61247025A (ja) * 1985-04-25 1986-11-04 Canon Inc 表示パネル製造方法
CN104391432A (zh) * 2014-12-18 2015-03-04 中国电子科技集团公司第四十七研究所 扫描式光刻方法
CN111060015A (zh) * 2019-12-10 2020-04-24 太原昂迈威电子科技有限公司 一种堆垛机运动垂直方向的小幅度位移检测装置

Also Published As

Publication number Publication date
GB2131167B (en) 1986-06-11
DE3342719A1 (de) 1984-05-30
JPH0114697B2 (enExample) 1989-03-14
FR2536873B1 (fr) 1991-10-18
US4617469A (en) 1986-10-14
DE3342719C2 (de) 1993-12-16
GB2131167A (en) 1984-06-13
GB8331280D0 (en) 1983-12-29
FR2536873A1 (fr) 1984-06-01

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