JPS5961104A - 多層軟磁性膜の製造方法 - Google Patents
多層軟磁性膜の製造方法Info
- Publication number
- JPS5961104A JPS5961104A JP17146182A JP17146182A JPS5961104A JP S5961104 A JPS5961104 A JP S5961104A JP 17146182 A JP17146182 A JP 17146182A JP 17146182 A JP17146182 A JP 17146182A JP S5961104 A JPS5961104 A JP S5961104A
- Authority
- JP
- Japan
- Prior art keywords
- soft magnetic
- thin film
- magnetic thin
- magnetic film
- multilayer soft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title description 5
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 claims description 22
- 239000010408 film Substances 0.000 claims description 7
- 230000001590 oxidative effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
- H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
- H01F41/305—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling
- H01F41/307—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices applying the spacer or adjusting its interface, e.g. in order to enable particular effect different from exchange coupling insulating or semiconductive spacer
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Thin Magnetic Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17146182A JPS5961104A (ja) | 1982-09-30 | 1982-09-30 | 多層軟磁性膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17146182A JPS5961104A (ja) | 1982-09-30 | 1982-09-30 | 多層軟磁性膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5961104A true JPS5961104A (ja) | 1984-04-07 |
| JPH056333B2 JPH056333B2 (OSRAM) | 1993-01-26 |
Family
ID=15923533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17146182A Granted JPS5961104A (ja) | 1982-09-30 | 1982-09-30 | 多層軟磁性膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5961104A (OSRAM) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196510A (ja) * | 1984-10-17 | 1986-05-15 | Hitachi Ltd | 高透磁率多層磁性体膜 |
| US4752344A (en) * | 1986-12-22 | 1988-06-21 | International Business Machines Corporation | Magnetic layer and method of manufacture |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5669809A (en) * | 1979-11-09 | 1981-06-11 | Tdk Corp | Magnetic material and its manufacture |
| JPS5733432A (en) * | 1980-08-01 | 1982-02-23 | Sekisui Chem Co Ltd | Magnetic recording medium and its production |
| JPS5853021A (ja) * | 1981-09-24 | 1983-03-29 | Victor Co Of Japan Ltd | 多層磁性薄膜 |
-
1982
- 1982-09-30 JP JP17146182A patent/JPS5961104A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5669809A (en) * | 1979-11-09 | 1981-06-11 | Tdk Corp | Magnetic material and its manufacture |
| JPS5733432A (en) * | 1980-08-01 | 1982-02-23 | Sekisui Chem Co Ltd | Magnetic recording medium and its production |
| JPS5853021A (ja) * | 1981-09-24 | 1983-03-29 | Victor Co Of Japan Ltd | 多層磁性薄膜 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196510A (ja) * | 1984-10-17 | 1986-05-15 | Hitachi Ltd | 高透磁率多層磁性体膜 |
| US4752344A (en) * | 1986-12-22 | 1988-06-21 | International Business Machines Corporation | Magnetic layer and method of manufacture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH056333B2 (OSRAM) | 1993-01-26 |
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