JPS5952859A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS5952859A
JPS5952859A JP57163486A JP16348682A JPS5952859A JP S5952859 A JPS5952859 A JP S5952859A JP 57163486 A JP57163486 A JP 57163486A JP 16348682 A JP16348682 A JP 16348682A JP S5952859 A JPS5952859 A JP S5952859A
Authority
JP
Japan
Prior art keywords
integrated circuit
silicon substrate
insulating films
layers
conductor patterns
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP57163486A
Other languages
English (en)
Inventor
Katsuhiko Yabe
矢部 勝彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP57163486A priority Critical patent/JPS5952859A/ja
Publication of JPS5952859A publication Critical patent/JPS5952859A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06513Bump or bump-like direct electrical connections between devices, e.g. flip-chip connection, solder bumps
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06527Special adaptation of electrical connections, e.g. rewiring, engineering changes, pressure contacts, layout

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 本発明け、半導体装置、特にインビーダンス漿合のため
の終端抵抗を必要とする集積回路に関する。
近年、(子計算機の発達により、高速演痺回路に要求さ
れるfrt算速朋の向上、および高密度化の要請が増大
している。痛速演算を実現するため、集積回路として、
エミッタ結合論、畦素子を1史う場合、インピーダンス
整合のfめの終・喘抵抗を必要とする。一方、集積回路
を商そ度に実装するための多層回路六(板としては、従
来プリント41反、多層セラミック基板が使われている
が、該基板に終端抵抗を付与した場合、配線領域の1減
少及び集積回路等の素子の実装領域の減少をきたし、高
l?i度実装が不可能である。
本発明の目的は多数の抵抗をuiえながら、配線領域の
減少などを沼〈ことなく集積回路素子を高慴度で実装し
てなる半導体装置を提供するにある。
本発明の半導体装置は、表層部に不細物を拡散した・1
数の抵抗部を有するシリコン基板と、この基板上に形成
、された多層の配線路を有する多1所の絶縁1漠と、前
記多層の絶縁1関の十に配置され前記多層のI記I腺路
を4して前記シリコン基板の抵(元部と接続された多数
の集積回路とをばむ構成を有する。
つぎに本発明を実施列により説明する。
第1図は本発明の−′実施例の部5±1所間図である。
第1図において、P4シリコン基板l内に、PN接合分
離で分離されたnu領域2,2.・・・に、PIp不純
不純波故により抵抗層3,3.・・・が形成され、抵抗
ノl113は、3ノーの絶縁膜4す7.9の間の導体パ
ターン6.8とは、スルーホール導体5を通して接続さ
れている。一方、エミッタ結合論理素子を用いた集積回
路14の外部端子17は、導体パターン6.8とつなが
っている基板上の外部端子12と、半田13により接続
されている。なお、2層の導体パターン6.8は集積回
路14の間の信号のやりとりのための回路も形成してい
る。
このように、本発明の半導体装置では、エミッタ結合論
34素子を使った集積回路および終端抵抗を有し、これ
ら終端抵抗のための特別な配線領域の減少をもたらすこ
となく、シリコン基単結晶基板上に前記集積回路の高−
1ti度実装がなされている入い9効果が得られている
【図面の簡単な説明】
第1図は本発明の一実施例の部分断面図である。 l・・・・・・シリコン単結晶基板、2・・・・・・n
型分離頑」或、 3・・・・・・抵抗’*、4,7.9
・・・・・・3ノ曽1色・Idl摸、5・・・・・・ス
ルーホール内導体、6t8・・・・・・&l 14パタ
ーン、12・・・・・・基板上の外部端子、13・・・
・・・半田、14・・・・・・楽++*回路、17・・
・・・・集積回路外部端子。

Claims (1)

    【特許請求の範囲】
  1. 一 表層部に不純物を拡散した複数の抵抗部を有するシ
    リコン基板と、この基板上に形成された多lilの絶縁
    膜に形成された多1−の配線路と、前記多ノーの絶縁膜
    の上に載置され前記多層の配線路を通して前記ノリコン
    基板の抵抗部と關続されている集積回路とをぎむことを
    特徴とする半導体装置。
JP57163486A 1982-09-20 1982-09-20 半導体装置 Pending JPS5952859A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57163486A JPS5952859A (ja) 1982-09-20 1982-09-20 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57163486A JPS5952859A (ja) 1982-09-20 1982-09-20 半導体装置

Publications (1)

Publication Number Publication Date
JPS5952859A true JPS5952859A (ja) 1984-03-27

Family

ID=15774777

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57163486A Pending JPS5952859A (ja) 1982-09-20 1982-09-20 半導体装置

Country Status (1)

Country Link
JP (1) JPS5952859A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5726500A (en) * 1994-04-08 1998-03-10 Thomson-Csf Semiconductor hybrid component
US6229216B1 (en) * 1999-01-11 2001-05-08 Intel Corporation Silicon interposer and multi-chip-module (MCM) with through substrate vias
EP1447849A3 (en) * 1997-03-10 2005-07-20 Seiko Epson Corporation Semiconductor device and circuit board having the same mounted thereon

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5178176A (ja) * 1974-12-20 1976-07-07 Ibm

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5178176A (ja) * 1974-12-20 1976-07-07 Ibm

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5726500A (en) * 1994-04-08 1998-03-10 Thomson-Csf Semiconductor hybrid component
EP1447849A3 (en) * 1997-03-10 2005-07-20 Seiko Epson Corporation Semiconductor device and circuit board having the same mounted thereon
EP1427016A3 (en) * 1997-03-10 2005-07-20 Seiko Epson Corporation Semiconductor device and circuit board mounted with the same
US6989605B2 (en) 1997-03-10 2006-01-24 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US7119445B2 (en) 1997-03-10 2006-10-10 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US7436071B2 (en) 1997-03-10 2008-10-14 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US7598619B2 (en) 1997-03-10 2009-10-06 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US7932612B2 (en) 1997-03-10 2011-04-26 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US8134237B2 (en) 1997-03-10 2012-03-13 Seiko Epson Corporation Electronic component and semiconductor device, method of fabricating the same, circuit board mounted with the same, and electronic appliance comprising the circuit board
US6229216B1 (en) * 1999-01-11 2001-05-08 Intel Corporation Silicon interposer and multi-chip-module (MCM) with through substrate vias
US6562653B1 (en) 1999-01-11 2003-05-13 Intel Corporation Silicon interposer and multi-chip-module (MCM) with through substrate vias

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