JPS59228783A - GaAs半導体装置の製造方法 - Google Patents
GaAs半導体装置の製造方法Info
- Publication number
- JPS59228783A JPS59228783A JP58104426A JP10442683A JPS59228783A JP S59228783 A JPS59228783 A JP S59228783A JP 58104426 A JP58104426 A JP 58104426A JP 10442683 A JP10442683 A JP 10442683A JP S59228783 A JPS59228783 A JP S59228783A
- Authority
- JP
- Japan
- Prior art keywords
- active layer
- gaas
- semiconductor device
- ion implantation
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Hall/Mr Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104426A JPS59228783A (ja) | 1983-06-10 | 1983-06-10 | GaAs半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58104426A JPS59228783A (ja) | 1983-06-10 | 1983-06-10 | GaAs半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59228783A true JPS59228783A (ja) | 1984-12-22 |
| JPH0478034B2 JPH0478034B2 (enExample) | 1992-12-10 |
Family
ID=14380359
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58104426A Granted JPS59228783A (ja) | 1983-06-10 | 1983-06-10 | GaAs半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59228783A (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63237586A (ja) * | 1987-03-26 | 1988-10-04 | Agency Of Ind Science & Technol | 微小ホ−ル素子の製造方法 |
| JPH03240281A (ja) * | 1990-02-19 | 1991-10-25 | Asahi Chem Ind Co Ltd | GaAsホール素子 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5548927A (en) * | 1978-10-04 | 1980-04-08 | Mitsubishi Monsanto Chem Co | Preparation of semiconductor element |
| JPS5732687A (en) * | 1980-08-06 | 1982-02-22 | Toshiba Corp | Manufacture of magnetoelectric transducer |
-
1983
- 1983-06-10 JP JP58104426A patent/JPS59228783A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5548927A (en) * | 1978-10-04 | 1980-04-08 | Mitsubishi Monsanto Chem Co | Preparation of semiconductor element |
| JPS5732687A (en) * | 1980-08-06 | 1982-02-22 | Toshiba Corp | Manufacture of magnetoelectric transducer |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63237586A (ja) * | 1987-03-26 | 1988-10-04 | Agency Of Ind Science & Technol | 微小ホ−ル素子の製造方法 |
| JPH03240281A (ja) * | 1990-02-19 | 1991-10-25 | Asahi Chem Ind Co Ltd | GaAsホール素子 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0478034B2 (enExample) | 1992-12-10 |
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