JPS59192944A - パタ−ン欠陥分類方法 - Google Patents

パタ−ン欠陥分類方法

Info

Publication number
JPS59192944A
JPS59192944A JP58065421A JP6542183A JPS59192944A JP S59192944 A JPS59192944 A JP S59192944A JP 58065421 A JP58065421 A JP 58065421A JP 6542183 A JP6542183 A JP 6542183A JP S59192944 A JPS59192944 A JP S59192944A
Authority
JP
Japan
Prior art keywords
pattern
area
defect
data
defective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58065421A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0513256B2 (enExample
Inventor
Yozo Ouchi
大内　洋三
Haruo Yoda
晴夫 依田
Yutaka Sako
裕 酒匂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58065421A priority Critical patent/JPS59192944A/ja
Publication of JPS59192944A publication Critical patent/JPS59192944A/ja
Publication of JPH0513256B2 publication Critical patent/JPH0513256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Weting (AREA)
  • Image Analysis (AREA)
JP58065421A 1983-04-15 1983-04-15 パタ−ン欠陥分類方法 Granted JPS59192944A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065421A JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065421A JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Publications (2)

Publication Number Publication Date
JPS59192944A true JPS59192944A (ja) 1984-11-01
JPH0513256B2 JPH0513256B2 (enExample) 1993-02-22

Family

ID=13286575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065421A Granted JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Country Status (1)

Country Link
JP (1) JPS59192944A (enExample)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62113436A (ja) * 1985-11-13 1987-05-25 Toshiba Corp 半導体ペレツトの外観検査方法
JPH02263273A (ja) * 1988-07-11 1990-10-26 Mitsui Eng & Shipbuild Co Ltd 鉄筋コンクリート床版の点検システム
JPH0792094A (ja) * 1993-09-21 1995-04-07 Toshiba Corp パターン欠陥検査装置
US5544256A (en) * 1993-10-22 1996-08-06 International Business Machines Corporation Automated defect classification system
US5995219A (en) * 1997-03-05 1999-11-30 Kabushiki Kaisha Toshiba Pattern defect inspection apparatus
JP2001134763A (ja) * 1999-11-09 2001-05-18 Hitachi Ltd 撮像画像に基づく欠陥の分類方法、および、その結果の表示方法
US7689029B2 (en) 2004-09-29 2010-03-30 Dainippon Screen Mfg. Co., Ltd. Apparatus and method for inspecting pattern
JP2012099563A (ja) * 2010-10-29 2012-05-24 Shin Etsu Handotai Co Ltd ウェーハの評価方法及びサセプタの評価方法
WO2014010421A1 (ja) * 2012-07-09 2014-01-16 東京エレクトロン株式会社 Ｘ線検査方法及びｘ線検査装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9002497B2 (en) * 2003-07-03 2015-04-07 Kla-Tencor Technologies Corp. Methods and systems for inspection of wafers and reticles using designer intent data
JP4617970B2 (ja) * 2005-04-01 2011-01-26 ソニー株式会社 欠陥検査装置及び欠陥検査方法
JP4956984B2 (ja) * 2005-12-14 2012-06-20 ソニー株式会社 欠陥修正装置及び欠陥修正方法

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62113436A (ja) * 1985-11-13 1987-05-25 Toshiba Corp 半導体ペレツトの外観検査方法
JPH02263273A (ja) * 1988-07-11 1990-10-26 Mitsui Eng & Shipbuild Co Ltd 鉄筋コンクリート床版の点検システム
JPH0792094A (ja) * 1993-09-21 1995-04-07 Toshiba Corp パターン欠陥検査装置
US5544256A (en) * 1993-10-22 1996-08-06 International Business Machines Corporation Automated defect classification system
US5995219A (en) * 1997-03-05 1999-11-30 Kabushiki Kaisha Toshiba Pattern defect inspection apparatus
JP2001134763A (ja) * 1999-11-09 2001-05-18 Hitachi Ltd 撮像画像に基づく欠陥の分類方法、および、その結果の表示方法
US7689029B2 (en) 2004-09-29 2010-03-30 Dainippon Screen Mfg. Co., Ltd. Apparatus and method for inspecting pattern
JP2012099563A (ja) * 2010-10-29 2012-05-24 Shin Etsu Handotai Co Ltd ウェーハの評価方法及びサセプタの評価方法
WO2014010421A1 (ja) * 2012-07-09 2014-01-16 東京エレクトロン株式会社 Ｘ線検査方法及びｘ線検査装置

Also Published As

Publication number Publication date
JPH0513256B2 (enExample) 1993-02-22

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