JPH0513256B2 - - Google Patents

Info

Publication number
JPH0513256B2
JPH0513256B2 JP58065421A JP6542183A JPH0513256B2 JP H0513256 B2 JPH0513256 B2 JP H0513256B2 JP 58065421 A JP58065421 A JP 58065421A JP 6542183 A JP6542183 A JP 6542183A JP H0513256 B2 JPH0513256 B2 JP H0513256B2
Authority
JP
Japan
Prior art keywords
pattern
area
defect
defective
data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58065421A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59192944A (ja
Inventor
Yozo Oochi
Haruo Yoda
Yutaka Sako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58065421A priority Critical patent/JPS59192944A/ja
Publication of JPS59192944A publication Critical patent/JPS59192944A/ja
Publication of JPH0513256B2 publication Critical patent/JPH0513256B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Image Processing (AREA)
  • Closed-Circuit Television Systems (AREA)
  • Weting (AREA)
  • Image Analysis (AREA)
JP58065421A 1983-04-15 1983-04-15 パタ−ン欠陥分類方法 Granted JPS59192944A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065421A JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065421A JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Publications (2)

Publication Number Publication Date
JPS59192944A JPS59192944A (ja) 1984-11-01
JPH0513256B2 true JPH0513256B2 (enExample) 1993-02-22

Family

ID=13286575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065421A Granted JPS59192944A (ja) 1983-04-15 1983-04-15 パタ−ン欠陥分類方法

Country Status (1)

Country Link
JP (1) JPS59192944A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006284447A (ja) * 2005-04-01 2006-10-19 Sony Corp 欠陥検査装置及び欠陥検査方法
JP2007163892A (ja) * 2005-12-14 2007-06-28 Sony Corp 欠陥修正装置及び欠陥修正方法
JP2011071552A (ja) * 2003-07-03 2011-04-07 Kla-Tencor Corp デザイナ・インテント・データを使用するウェハとレチクルの検査の方法およびシステム

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62113436A (ja) * 1985-11-13 1987-05-25 Toshiba Corp 半導体ペレツトの外観検査方法
JP2684191B2 (ja) * 1988-07-11 1997-12-03 三井造船株式会社 コンクリート構造物の点検診断システム
JPH0792094A (ja) * 1993-09-21 1995-04-07 Toshiba Corp パターン欠陥検査装置
US5544256A (en) * 1993-10-22 1996-08-06 International Business Machines Corporation Automated defect classification system
JPH10247245A (ja) * 1997-03-05 1998-09-14 Toshiba Corp パターン欠陥検査装置
JP2001134763A (ja) * 1999-11-09 2001-05-18 Hitachi Ltd 撮像画像に基づく欠陥の分類方法、および、その結果の表示方法
JP2006098151A (ja) 2004-09-29 2006-04-13 Dainippon Screen Mfg Co Ltd パターン検査装置およびパターン検査方法
JP5614243B2 (ja) * 2010-10-29 2014-10-29 信越半導体株式会社 シリコンエピタキシャルウェーハの評価方法
JP2014016239A (ja) * 2012-07-09 2014-01-30 Tokyo Electron Ltd Ｘ線検査方法及びｘ線検査装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011071552A (ja) * 2003-07-03 2011-04-07 Kla-Tencor Corp デザイナ・インテント・データを使用するウェハとレチクルの検査の方法およびシステム
JP2006284447A (ja) * 2005-04-01 2006-10-19 Sony Corp 欠陥検査装置及び欠陥検査方法
JP2007163892A (ja) * 2005-12-14 2007-06-28 Sony Corp 欠陥修正装置及び欠陥修正方法

Also Published As

Publication number Publication date
JPS59192944A (ja) 1984-11-01

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