JPS59146047A - ネガ型レジストのパターン形成方法 - Google Patents

ネガ型レジストのパターン形成方法

Info

Publication number
JPS59146047A
JPS59146047A JP58019582A JP1958283A JPS59146047A JP S59146047 A JPS59146047 A JP S59146047A JP 58019582 A JP58019582 A JP 58019582A JP 1958283 A JP1958283 A JP 1958283A JP S59146047 A JPS59146047 A JP S59146047A
Authority
JP
Japan
Prior art keywords
lmr
acetate
negative resist
dry etching
ester
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58019582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334052B2 (enExample
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58019582A priority Critical patent/JPS59146047A/ja
Priority to US06/574,363 priority patent/US4600684A/en
Publication of JPS59146047A publication Critical patent/JPS59146047A/ja
Publication of JPH0334052B2 publication Critical patent/JPH0334052B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • A—HUMAN NECESSITIES
    • A21—BAKING; EDIBLE DOUGHS
    • A21D—TREATMENT OF FLOUR OR DOUGH FOR BAKING, e.g. BY ADDITION OF MATERIALS; BAKING; BAKERY PRODUCTS
    • A21D13/00—Finished or partly finished bakery products
    • A21D13/10—Multi-layered products
    • A21D13/16—Multi-layered pastry, e.g. puff pastry; Danish pastry or laminated dough
    • A21D13/19—Multi-layered pastry, e.g. puff pastry; Danish pastry or laminated dough with fillings

Landscapes

  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Food Science & Technology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58019582A 1983-02-10 1983-02-10 ネガ型レジストのパターン形成方法 Granted JPS59146047A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58019582A JPS59146047A (ja) 1983-02-10 1983-02-10 ネガ型レジストのパターン形成方法
US06/574,363 US4600684A (en) 1983-02-10 1984-01-27 Process for forming a negative resist using high energy beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58019582A JPS59146047A (ja) 1983-02-10 1983-02-10 ネガ型レジストのパターン形成方法

Publications (2)

Publication Number Publication Date
JPS59146047A true JPS59146047A (ja) 1984-08-21
JPH0334052B2 JPH0334052B2 (enExample) 1991-05-21

Family

ID=12003251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58019582A Granted JPS59146047A (ja) 1983-02-10 1983-02-10 ネガ型レジストのパターン形成方法

Country Status (1)

Country Link
JP (1) JPS59146047A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS548304A (en) * 1977-06-20 1979-01-22 Toyo Tire & Rubber Co Ltd Radial tire
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS548304A (en) * 1977-06-20 1979-01-22 Toyo Tire & Rubber Co Ltd Radial tire
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6045243A (ja) * 1983-08-23 1985-03-11 Oki Electric Ind Co Ltd レジストパタ−ンの形成方法

Also Published As

Publication number Publication date
JPH0334052B2 (enExample) 1991-05-21

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