JPS5913324A - 縮小投影露光装置 - Google Patents

縮小投影露光装置

Info

Publication number
JPS5913324A
JPS5913324A JP57122026A JP12202682A JPS5913324A JP S5913324 A JPS5913324 A JP S5913324A JP 57122026 A JP57122026 A JP 57122026A JP 12202682 A JP12202682 A JP 12202682A JP S5913324 A JPS5913324 A JP S5913324A
Authority
JP
Japan
Prior art keywords
patterns
reticle
projection exposure
pattern
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57122026A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430175B2 (enrdf_load_stackoverflow
Inventor
Hideji Sugiyama
秀司 杉山
Hisamasa Tsuyuki
露木　寿正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57122026A priority Critical patent/JPS5913324A/ja
Publication of JPS5913324A publication Critical patent/JPS5913324A/ja
Publication of JPH0430175B2 publication Critical patent/JPH0430175B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57122026A 1982-07-15 1982-07-15 縮小投影露光装置 Granted JPS5913324A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57122026A JPS5913324A (ja) 1982-07-15 1982-07-15 縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57122026A JPS5913324A (ja) 1982-07-15 1982-07-15 縮小投影露光装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP3131647A Division JPH05234845A (ja) 1991-05-08 1991-05-08 縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS5913324A true JPS5913324A (ja) 1984-01-24
JPH0430175B2 JPH0430175B2 (enrdf_load_stackoverflow) 1992-05-21

Family

ID=14825746

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57122026A Granted JPS5913324A (ja) 1982-07-15 1982-07-15 縮小投影露光装置

Country Status (1)

Country Link
JP (1) JPS5913324A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法
US4941745A (en) * 1987-12-30 1990-07-17 Hitachi, Ltd. Projection aligner for fabricating semiconductor device having projection optics
JPH03185807A (ja) * 1989-12-15 1991-08-13 Canon Inc 半導体製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6313329A (ja) * 1986-07-04 1988-01-20 Canon Inc 露光方法
US4941745A (en) * 1987-12-30 1990-07-17 Hitachi, Ltd. Projection aligner for fabricating semiconductor device having projection optics
JPH03185807A (ja) * 1989-12-15 1991-08-13 Canon Inc 半導体製造方法

Also Published As

Publication number Publication date
JPH0430175B2 (enrdf_load_stackoverflow) 1992-05-21

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