JPS59114824A - 半導体装置の平坦化方法 - Google Patents

半導体装置の平坦化方法

Info

Publication number
JPS59114824A
JPS59114824A JP57223058A JP22305882A JPS59114824A JP S59114824 A JPS59114824 A JP S59114824A JP 57223058 A JP57223058 A JP 57223058A JP 22305882 A JP22305882 A JP 22305882A JP S59114824 A JPS59114824 A JP S59114824A
Authority
JP
Japan
Prior art keywords
insulating film
photoresist
film
semiconductor
unevenness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57223058A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0322690B2 (OSRAM
Inventor
Katsunori Mihashi
克典 三橋
Ryohei Kawabata
川端　良平
Hiroaki Shimizu
宏明 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP57223058A priority Critical patent/JPS59114824A/ja
Publication of JPS59114824A publication Critical patent/JPS59114824A/ja
Publication of JPH0322690B2 publication Critical patent/JPH0322690B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP57223058A 1982-12-21 1982-12-21 半導体装置の平坦化方法 Granted JPS59114824A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57223058A JPS59114824A (ja) 1982-12-21 1982-12-21 半導体装置の平坦化方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57223058A JPS59114824A (ja) 1982-12-21 1982-12-21 半導体装置の平坦化方法

Publications (2)

Publication Number Publication Date
JPS59114824A true JPS59114824A (ja) 1984-07-03
JPH0322690B2 JPH0322690B2 (OSRAM) 1991-03-27

Family

ID=16792169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57223058A Granted JPS59114824A (ja) 1982-12-21 1982-12-21 半導体装置の平坦化方法

Country Status (1)

Country Link
JP (1) JPS59114824A (OSRAM)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170720A (ja) * 1984-09-14 1986-04-11 Hitachi Ltd パタ−ン形成方法
JPS61180241A (ja) * 1985-02-06 1986-08-12 Hitachi Ltd パタ−ン形成方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143035A (en) * 1979-04-24 1980-11-08 Nec Corp Manufacture of pattern
JPS5617042A (en) * 1979-07-23 1981-02-18 Fujitsu Ltd Manufacture of semiconductor device
JPS57149733A (en) * 1981-03-11 1982-09-16 Hitachi Ltd Dry etching method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55143035A (en) * 1979-04-24 1980-11-08 Nec Corp Manufacture of pattern
JPS5617042A (en) * 1979-07-23 1981-02-18 Fujitsu Ltd Manufacture of semiconductor device
JPS57149733A (en) * 1981-03-11 1982-09-16 Hitachi Ltd Dry etching method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6170720A (ja) * 1984-09-14 1986-04-11 Hitachi Ltd パタ−ン形成方法
JPS61180241A (ja) * 1985-02-06 1986-08-12 Hitachi Ltd パタ−ン形成方法

Also Published As

Publication number Publication date
JPH0322690B2 (OSRAM) 1991-03-27

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