JPS59108945A - Ｘ線回析装置 - Google Patents

Ｘ線回析装置

Info

Publication number
JPS59108945A
JPS59108945A JP58220469A JP22046983A JPS59108945A JP S59108945 A JPS59108945 A JP S59108945A JP 58220469 A JP58220469 A JP 58220469A JP 22046983 A JP22046983 A JP 22046983A JP S59108945 A JPS59108945 A JP S59108945A
Authority
JP
Japan
Prior art keywords
crystal
ray
monochromator
pair
parallel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58220469A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0430541B2 (enExample
Inventor
ウイレム・ヤン・バルテルス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPS59108945A publication Critical patent/JPS59108945A/ja
Publication of JPH0430541B2 publication Critical patent/JPH0430541B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
    • G01N23/2076—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions for spectrometry, i.e. using an analysing crystal, e.g. for measuring X-ray fluorescence spectrum of a sample with wavelength-dispersion, i.e. WDXFS

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP58220469A 1982-11-25 1983-11-22 Ｘ線回析装置 Granted JPS59108945A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
NL8204584A NL8204584A (nl) 1982-11-25 1982-11-25 Roentgen analyse apparaat met een vier-kristal monochromator.
NL8204584 1982-11-25

Publications (2)

Publication Number Publication Date
JPS59108945A true JPS59108945A (ja) 1984-06-23
JPH0430541B2 JPH0430541B2 (enExample) 1992-05-22

Family

ID=19840648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58220469A Granted JPS59108945A (ja) 1982-11-25 1983-11-22 Ｘ線回析装置

Country Status (5)

Country Link
US (1) US4567605A (enExample)
EP (1) EP0110469B1 (enExample)
JP (1) JPS59108945A (enExample)
DE (1) DE3379115D1 (enExample)
NL (1) NL8204584A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0196542A (ja) * 1987-10-09 1989-04-14 Hitachi Ltd 結晶構造解析法
JPH0485300U (enExample) * 1990-11-30 1992-07-24
JP2002168997A (ja) * 2000-11-30 2002-06-14 New Industry Research Organization Ｘ線マイクロビーム生成装置
US6574306B2 (en) 2000-05-31 2003-06-03 Rigaku Corporation Channel-cut monochromator

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193936A (ja) * 1984-10-13 1986-05-12 Furukawa Electric Co Ltd:The 放射線による被測定物の組成分析方法
US4821301A (en) * 1986-02-28 1989-04-11 Duke University X-ray reflection method and apparatus for chemical analysis of thin surface layers
ATE89097T1 (de) * 1986-08-15 1993-05-15 Commw Scient Ind Res Org Instrumente zur konditionierung von roentgenoder neutronenstrahlen.
GB8926998D0 (en) * 1989-11-29 1990-01-17 Fisons Plc Analysis crystal
US5173930A (en) * 1991-11-22 1992-12-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration X-ray monochromator
BE1007349A3 (nl) * 1993-07-19 1995-05-23 Philips Electronics Nv Asymmetrische 4-kristalmonochromator.
US5524040A (en) * 1993-12-17 1996-06-04 The United States Of America As Represented By The United States Department Of Energy High energy resolution, high angular acceptance crystal monochromator
DE4407278A1 (de) * 1994-03-04 1995-09-07 Siemens Ag Röntgen-Analysegerät
DE69525027T2 (de) * 1994-06-25 2002-09-05 Koninklijke Philips Electronics N.V., Eindhoven Analyse einer materialprobe
DE19833524B4 (de) 1998-07-25 2004-09-23 Bruker Axs Gmbh Röntgen-Analysegerät mit Gradienten-Vielfachschicht-Spiegel
ES2160546B1 (es) * 2000-03-07 2003-04-16 Univ Madrid Autonoma Utilizacion de estructuras cuasicristalinas en aplicaciones opticas de rayos - x
JP2007010483A (ja) * 2005-06-30 2007-01-18 Rigaku Corp Ｘ線ビーム処理装置及びｘ線分析装置
JP4773899B2 (ja) * 2006-06-29 2011-09-14 株式会社リガク Ｘ線分光測定方法およびｘ線分光装置
US9269468B2 (en) * 2012-04-30 2016-02-23 Jordan Valley Semiconductors Ltd. X-ray beam conditioning
JP6260125B2 (ja) * 2013-07-08 2018-01-17 富士通株式会社 分析装置、分析方法、成膜装置及び成膜方法
CN103940837A (zh) * 2014-04-01 2014-07-23 中国科学院物理研究所 一种SiC晶体单色器
JP2019191169A (ja) 2018-04-23 2019-10-31 ブルカー ジェイヴィ イスラエル リミテッドＢｒｕｋｅｒ Ｊｖ Ｉｓｒａｅｌ Ｌｔｄ． 小角ｘ線散乱測定用のｘ線源光学系
KR102710484B1 (ko) 2018-07-05 2024-09-27 브루커 테크놀로지스 리미티드 소각 ｘ선 산란 계측
US11781999B2 (en) 2021-09-05 2023-10-10 Bruker Technologies Ltd. Spot-size control in reflection-based and scatterometry-based X-ray metrology systems
US12249059B2 (en) 2022-03-31 2025-03-11 Bruker Technologies Ltd. Navigation accuracy using camera coupled with detector assembly

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4524957Y1 (enExample) * 1965-12-09 1970-09-30
JPS5599050A (en) * 1979-01-23 1980-07-28 Nippon X Sen Kk Xxray spectroscope
JPS57156600A (en) * 1981-03-20 1982-09-27 Rigaku Denki Co Ltd X-ray monochromater

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3518427A (en) * 1968-06-05 1970-06-30 Atomic Energy Commission Universal planar x-ray resonator
SU817553A1 (ru) * 1979-06-29 1981-03-30 Институт Кристаллографии Им.А.В.Шуб-Никова Ah Cccp Рентгеновский спектрометр дл СиНХРОТРОННОгО иСТОчНиКА излучЕНи

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4524957Y1 (enExample) * 1965-12-09 1970-09-30
JPS5599050A (en) * 1979-01-23 1980-07-28 Nippon X Sen Kk Xxray spectroscope
JPS57156600A (en) * 1981-03-20 1982-09-27 Rigaku Denki Co Ltd X-ray monochromater

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0196542A (ja) * 1987-10-09 1989-04-14 Hitachi Ltd 結晶構造解析法
JPH0485300U (enExample) * 1990-11-30 1992-07-24
US6574306B2 (en) 2000-05-31 2003-06-03 Rigaku Corporation Channel-cut monochromator
JP2002168997A (ja) * 2000-11-30 2002-06-14 New Industry Research Organization Ｘ線マイクロビーム生成装置

Also Published As

Publication number Publication date
EP0110469A3 (en) 1985-04-10
US4567605A (en) 1986-01-28
EP0110469B1 (en) 1989-02-01
JPH0430541B2 (enExample) 1992-05-22
DE3379115D1 (en) 1989-03-09
EP0110469A2 (en) 1984-06-13
NL8204584A (nl) 1984-06-18

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