JPS59102419A - 濾過用材料及びその製造方法 - Google Patents
濾過用材料及びその製造方法Info
- Publication number
- JPS59102419A JPS59102419A JP21223482A JP21223482A JPS59102419A JP S59102419 A JPS59102419 A JP S59102419A JP 21223482 A JP21223482 A JP 21223482A JP 21223482 A JP21223482 A JP 21223482A JP S59102419 A JPS59102419 A JP S59102419A
- Authority
- JP
- Japan
- Prior art keywords
- pore size
- average pore
- layer
- polymerization product
- ceramic layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 24
- 238000001914 filtration Methods 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 5
- 239000011148 porous material Substances 0.000 claims abstract description 25
- 239000000919 ceramic Substances 0.000 claims abstract description 20
- 238000006116 polymerization reaction Methods 0.000 claims abstract description 18
- 150000002894 organic compounds Chemical class 0.000 claims abstract description 10
- 239000011261 inert gas Substances 0.000 claims abstract description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 6
- 238000001223 reverse osmosis Methods 0.000 abstract description 4
- 238000000108 ultra-filtration Methods 0.000 abstract description 4
- KFDVPJUYSDEJTH-UHFFFAOYSA-N 4-ethenylpyridine Chemical compound C=CC1=CC=NC=C1 KFDVPJUYSDEJTH-UHFFFAOYSA-N 0.000 abstract description 3
- 239000012528 membrane Substances 0.000 description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 1
- -1 20HO1 and A1013 Chemical class 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 108010020346 Polyglutamic Acid Proteins 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910006213 ZrOCl2 Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010612 desalination reaction Methods 0.000 description 1
- 238000000502 dialysis Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010842 industrial wastewater Substances 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 244000005700 microbiome Species 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002643 polyglutamic acid Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 1
- 229920002717 polyvinylpyridine Polymers 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- XZPVPNZTYPUODG-UHFFFAOYSA-M sodium;chloride;dihydrate Chemical compound O.O.[Na+].[Cl-] XZPVPNZTYPUODG-UHFFFAOYSA-M 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- IPCAPQRVQMIMAN-UHFFFAOYSA-L zirconyl chloride Chemical compound Cl[Zr](Cl)=O IPCAPQRVQMIMAN-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Separation Using Semi-Permeable Membranes (AREA)
- Filtering Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21223482A JPS59102419A (ja) | 1982-12-03 | 1982-12-03 | 濾過用材料及びその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21223482A JPS59102419A (ja) | 1982-12-03 | 1982-12-03 | 濾過用材料及びその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59102419A true JPS59102419A (ja) | 1984-06-13 |
| JPH037414B2 JPH037414B2 (enExample) | 1991-02-01 |
Family
ID=16619177
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21223482A Granted JPS59102419A (ja) | 1982-12-03 | 1982-12-03 | 濾過用材料及びその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59102419A (enExample) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3523068A1 (de) * | 1985-04-25 | 1987-01-08 | Altenburger Electronic Gmbh | Verfahren zur herstellung eines filters mit poren von vorbestimmter und etwa gleicher mikrogroesse |
| US5196380A (en) * | 1991-06-06 | 1993-03-23 | Arizona Board Of Reagents | Reactive membrane for filtration and purification of gases of impurities |
| US5635148A (en) * | 1991-06-06 | 1997-06-03 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Reactive membrane for filtration and purification of gases of impurities and method utilizing the same |
| US5829139A (en) * | 1995-05-03 | 1998-11-03 | Pall Corporation | Method for forming a reactive medium |
| US7465692B1 (en) | 2000-03-16 | 2008-12-16 | Pall Corporation | Reactive media, methods of use and assemblies for purifying |
| WO2012169507A1 (ja) * | 2011-06-10 | 2012-12-13 | 富士フイルム株式会社 | プラズマ重合性組成物、これを用いたプラズマ重合膜、構造体及び表面改質方法 |
-
1982
- 1982-12-03 JP JP21223482A patent/JPS59102419A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3523068A1 (de) * | 1985-04-25 | 1987-01-08 | Altenburger Electronic Gmbh | Verfahren zur herstellung eines filters mit poren von vorbestimmter und etwa gleicher mikrogroesse |
| US5196380A (en) * | 1991-06-06 | 1993-03-23 | Arizona Board Of Reagents | Reactive membrane for filtration and purification of gases of impurities |
| US5635148A (en) * | 1991-06-06 | 1997-06-03 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Reactive membrane for filtration and purification of gases of impurities and method utilizing the same |
| US5637544A (en) * | 1991-06-06 | 1997-06-10 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Reactive membrane for filtration and purification of gases of impurities and method utilizing the same |
| US5829139A (en) * | 1995-05-03 | 1998-11-03 | Pall Corporation | Method for forming a reactive medium |
| US6066591A (en) * | 1995-05-03 | 2000-05-23 | Pall Corporation | Reactive medium for purifying fluids |
| US7465692B1 (en) | 2000-03-16 | 2008-12-16 | Pall Corporation | Reactive media, methods of use and assemblies for purifying |
| WO2012169507A1 (ja) * | 2011-06-10 | 2012-12-13 | 富士フイルム株式会社 | プラズマ重合性組成物、これを用いたプラズマ重合膜、構造体及び表面改質方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH037414B2 (enExample) | 1991-02-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS6399246A (ja) | 膜状素材 | |
| JPH0457372B2 (enExample) | ||
| JPS59102419A (ja) | 濾過用材料及びその製造方法 | |
| JPH08318141A (ja) | 液体混合物分離膜 | |
| US4199448A (en) | Reverse osmosis membrane of high urea rejection properties | |
| US5045357A (en) | Process for preparing a membranous gas separator | |
| JPS58166018A (ja) | ポリメチルペンテン膜の連続式製造方法 | |
| JPS6355973B2 (enExample) | ||
| JP2002066280A (ja) | ガス分離フィルタおよびその製造方法 | |
| JPS61209005A (ja) | 分離膜及びその製造方法 | |
| JPH09313903A (ja) | ゼオライト分離膜の製造方法 | |
| CN106606931A (zh) | 高稳定性海水淡化膜及其制法和应用 | |
| JP2521883B2 (ja) | プラズマ処理炭酸ガス分離膜の製法 | |
| JPH08257302A (ja) | Ｚｓｍ−５型ゼオライト膜の製造法及び液体混合物分離膜 | |
| JPS5962324A (ja) | ろ過材及びその製造方法 | |
| CN1068973A (zh) | 改性微孔膜用于膜蒸馏及相关膜过程 | |
| JPS59216603A (ja) | ガス分離用複合膜 | |
| JPS59115738A (ja) | ガス選択透過性膜およびその製造方法 | |
| JPS586208A (ja) | ガス選択透過性複合膜の製造方法 | |
| JPS5840102A (ja) | 混合液の分離方法 | |
| JP2003071258A (ja) | 多孔質基板 | |
| JP3218101B2 (ja) | 有機物分離用半透膜およびその製造方法 | |
| JP3195875B2 (ja) | セラミックス製分離膜 | |
| JPS59206008A (ja) | 新規な濾過材及びその製造方法 | |
| JPS61141914A (ja) | 気体分離膜 |