JPS5893354A - 半導体装置の製造法 - Google Patents

半導体装置の製造法

Info

Publication number
JPS5893354A
JPS5893354A JP19470381A JP19470381A JPS5893354A JP S5893354 A JPS5893354 A JP S5893354A JP 19470381 A JP19470381 A JP 19470381A JP 19470381 A JP19470381 A JP 19470381A JP S5893354 A JPS5893354 A JP S5893354A
Authority
JP
Japan
Prior art keywords
etching
insulating film
sputtering
ions
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19470381A
Other languages
English (en)
Japanese (ja)
Other versions
JPH033382B2 (enrdf_load_stackoverflow
Inventor
Katsuhiro Tsukamoto
塚本　克博
Hideo Kotani
小谷　秀夫
Hisao Yakushiji
薬師寺　久雄
Hiroji Harada
原田　「ひろ」嗣
Katsuhiro Hirata
勝弘 平田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP19470381A priority Critical patent/JPS5893354A/ja
Publication of JPS5893354A publication Critical patent/JPS5893354A/ja
Publication of JPH033382B2 publication Critical patent/JPH033382B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP19470381A 1981-11-30 1981-11-30 半導体装置の製造法 Granted JPS5893354A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19470381A JPS5893354A (ja) 1981-11-30 1981-11-30 半導体装置の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19470381A JPS5893354A (ja) 1981-11-30 1981-11-30 半導体装置の製造法

Publications (2)

Publication Number Publication Date
JPS5893354A true JPS5893354A (ja) 1983-06-03
JPH033382B2 JPH033382B2 (enrdf_load_stackoverflow) 1991-01-18

Family

ID=16328853

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19470381A Granted JPS5893354A (ja) 1981-11-30 1981-11-30 半導体装置の製造法

Country Status (1)

Country Link
JP (1) JPS5893354A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5872064A (en) * 1996-02-29 1999-02-16 Intel Corporation DSAD process for deposition of inter layer dielectric

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5328530A (en) * 1976-08-30 1978-03-16 Hitachi Ltd Method of etching surfaces of solids
JPS5359741A (en) * 1976-11-10 1978-05-29 Nat Jutaku Kenzai Powder painting device
JPS5559741A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Preparation of semiconductor device
JPS55130147A (en) * 1973-06-29 1980-10-08 Ibm Multilayer wired integrated circuit
JPS56148826A (en) * 1980-04-21 1981-11-18 Fujitsu Ltd Manufacture of semiconductor device
JPS5797649A (en) * 1980-12-11 1982-06-17 Nec Corp Manufacture of semiconductor device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55130147A (en) * 1973-06-29 1980-10-08 Ibm Multilayer wired integrated circuit
JPS5328530A (en) * 1976-08-30 1978-03-16 Hitachi Ltd Method of etching surfaces of solids
JPS5359741A (en) * 1976-11-10 1978-05-29 Nat Jutaku Kenzai Powder painting device
JPS5559741A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Preparation of semiconductor device
JPS56148826A (en) * 1980-04-21 1981-11-18 Fujitsu Ltd Manufacture of semiconductor device
JPS5797649A (en) * 1980-12-11 1982-06-17 Nec Corp Manufacture of semiconductor device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5872064A (en) * 1996-02-29 1999-02-16 Intel Corporation DSAD process for deposition of inter layer dielectric
US5872401A (en) * 1996-02-29 1999-02-16 Intel Corporation Deposition of an inter layer dielectric formed on semiconductor wafer by sub atmospheric CVD

Also Published As

Publication number Publication date
JPH033382B2 (enrdf_load_stackoverflow) 1991-01-18

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