JPS5893261A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS5893261A
JPS5893261A JP19217781A JP19217781A JPS5893261A JP S5893261 A JPS5893261 A JP S5893261A JP 19217781 A JP19217781 A JP 19217781A JP 19217781 A JP19217781 A JP 19217781A JP S5893261 A JPS5893261 A JP S5893261A
Authority
JP
Japan
Prior art keywords
film
semiconductor device
insulating film
pattern
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19217781A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0570301B2 (enrdf_load_html_response
Inventor
Iwao Tokawa
東川　巌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP19217781A priority Critical patent/JPS5893261A/ja
Publication of JPS5893261A publication Critical patent/JPS5893261A/ja
Publication of JPH0570301B2 publication Critical patent/JPH0570301B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Weting (AREA)
  • Electrodes Of Semiconductors (AREA)
JP19217781A 1981-11-30 1981-11-30 半導体装置の製造方法 Granted JPS5893261A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19217781A JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19217781A JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS5893261A true JPS5893261A (ja) 1983-06-02
JPH0570301B2 JPH0570301B2 (enrdf_load_html_response) 1993-10-04

Family

ID=16286956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19217781A Granted JPS5893261A (ja) 1981-11-30 1981-11-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS5893261A (enrdf_load_html_response)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107727A (ja) * 1984-10-29 1986-05-26 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション 半導体装置に金属コンタクト・スタツドを形成する方法
JPS61133648A (ja) * 1984-11-29 1986-06-20 テキサス　インスツルメンツ　インコーポレイテツド 半導体装置の製造方法
JPH01137649A (ja) * 1987-10-31 1989-05-30 Samsung Semiconductor & Teleommun Co Ltd 半導体装置の平坦化方法
JPH04159755A (ja) * 1990-10-23 1992-06-02 Nec Kyushu Ltd 半導体装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845185A (enrdf_load_html_response) * 1971-10-11 1973-06-28
JPS49132987A (enrdf_load_html_response) * 1973-04-25 1974-12-20
JPS5236975A (en) * 1975-09-18 1977-03-22 Fujitsu Ltd Process for production of semiconductor device
JPS56122162A (en) * 1980-03-03 1981-09-25 Toshiba Corp Semiconductor device and manufacture thereof
JPS56126943A (en) * 1980-03-12 1981-10-05 Fujitsu Ltd Production of semiconductor device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4845185A (enrdf_load_html_response) * 1971-10-11 1973-06-28
JPS49132987A (enrdf_load_html_response) * 1973-04-25 1974-12-20
JPS5236975A (en) * 1975-09-18 1977-03-22 Fujitsu Ltd Process for production of semiconductor device
JPS56122162A (en) * 1980-03-03 1981-09-25 Toshiba Corp Semiconductor device and manufacture thereof
JPS56126943A (en) * 1980-03-12 1981-10-05 Fujitsu Ltd Production of semiconductor device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61107727A (ja) * 1984-10-29 1986-05-26 インタ−ナショナル・ビジネス・マシ−ンズ・コ−ポレ−ション 半導体装置に金属コンタクト・スタツドを形成する方法
JPS61133648A (ja) * 1984-11-29 1986-06-20 テキサス　インスツルメンツ　インコーポレイテツド 半導体装置の製造方法
JPH01137649A (ja) * 1987-10-31 1989-05-30 Samsung Semiconductor & Teleommun Co Ltd 半導体装置の平坦化方法
JPH04159755A (ja) * 1990-10-23 1992-06-02 Nec Kyushu Ltd 半導体装置

Also Published As

Publication number Publication date
JPH0570301B2 (enrdf_load_html_response) 1993-10-04

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