JPS5889943A - プラズマcvd法 - Google Patents

プラズマcvd法

Info

Publication number
JPS5889943A
JPS5889943A JP56189663A JP18966381A JPS5889943A JP S5889943 A JPS5889943 A JP S5889943A JP 56189663 A JP56189663 A JP 56189663A JP 18966381 A JP18966381 A JP 18966381A JP S5889943 A JPS5889943 A JP S5889943A
Authority
JP
Japan
Prior art keywords
film
cylindrical
raw material
plasma cvd
material gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56189663A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6353854B2 (enrdf_load_stackoverflow
Inventor
Osamu Kamiya
神谷 攻
Yasutomo Fujiyama
藤山 靖朋
Kyosuke Ogawa
小川 恭介
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP56189663A priority Critical patent/JPS5889943A/ja
Publication of JPS5889943A publication Critical patent/JPS5889943A/ja
Publication of JPS6353854B2 publication Critical patent/JPS6353854B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
JP56189663A 1981-11-26 1981-11-26 プラズマcvd法 Granted JPS5889943A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56189663A JPS5889943A (ja) 1981-11-26 1981-11-26 プラズマcvd法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56189663A JPS5889943A (ja) 1981-11-26 1981-11-26 プラズマcvd法

Publications (2)

Publication Number Publication Date
JPS5889943A true JPS5889943A (ja) 1983-05-28
JPS6353854B2 JPS6353854B2 (enrdf_load_stackoverflow) 1988-10-25

Family

ID=16245085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56189663A Granted JPS5889943A (ja) 1981-11-26 1981-11-26 プラズマcvd法

Country Status (1)

Country Link
JP (1) JPS5889943A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013074A (ja) * 1983-07-05 1985-01-23 Canon Inc プラズマcvd装置
JPS6024378A (ja) * 1983-07-19 1985-02-07 Kyocera Corp 量産型グロ−放電分解装置
JPS6029470A (ja) * 1983-07-27 1985-02-14 Kyocera Corp 量産型グロ−放電分解装置
JPS6036664A (ja) * 1983-09-26 1985-02-25 Kyocera Corp 量産型グロー放電分解装置
JPS6088955A (ja) * 1983-10-21 1985-05-18 Stanley Electric Co Ltd プラズマcvd装置
JPS60114573A (ja) * 1983-11-22 1985-06-21 Semiconductor Energy Lab Co Ltd 窒化珪素被膜作製方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6013074A (ja) * 1983-07-05 1985-01-23 Canon Inc プラズマcvd装置
JPS6024378A (ja) * 1983-07-19 1985-02-07 Kyocera Corp 量産型グロ−放電分解装置
JPS6029470A (ja) * 1983-07-27 1985-02-14 Kyocera Corp 量産型グロ−放電分解装置
JPS6036664A (ja) * 1983-09-26 1985-02-25 Kyocera Corp 量産型グロー放電分解装置
JPS6088955A (ja) * 1983-10-21 1985-05-18 Stanley Electric Co Ltd プラズマcvd装置
JPS60114573A (ja) * 1983-11-22 1985-06-21 Semiconductor Energy Lab Co Ltd 窒化珪素被膜作製方法

Also Published As

Publication number Publication date
JPS6353854B2 (enrdf_load_stackoverflow) 1988-10-25

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