JPS5868036A - フオト又は放射線レジスト用感光剤 - Google Patents

フオト又は放射線レジスト用感光剤

Info

Publication number
JPS5868036A
JPS5868036A JP16580881A JP16580881A JPS5868036A JP S5868036 A JPS5868036 A JP S5868036A JP 16580881 A JP16580881 A JP 16580881A JP 16580881 A JP16580881 A JP 16580881A JP S5868036 A JPS5868036 A JP S5868036A
Authority
JP
Japan
Prior art keywords
compound
enhanced
ethanol
radiation
contg
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16580881A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0151171B2 (enrdf_load_stackoverflow
Inventor
Fumio Kataoka
文雄 片岡
Fusaji Shoji
房次 庄子
Isao Obara
小原　功
Kazunari Takemoto
一成 竹元
Ataru Yokono
中 横野
Tokio Isogai
磯貝　時男
Mitsumasa Kojima
児嶋　充雅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16580881A priority Critical patent/JPS5868036A/ja
Publication of JPS5868036A publication Critical patent/JPS5868036A/ja
Publication of JPH0151171B2 publication Critical patent/JPH0151171B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
JP16580881A 1981-10-19 1981-10-19 フオト又は放射線レジスト用感光剤 Granted JPS5868036A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16580881A JPS5868036A (ja) 1981-10-19 1981-10-19 フオト又は放射線レジスト用感光剤

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16580881A JPS5868036A (ja) 1981-10-19 1981-10-19 フオト又は放射線レジスト用感光剤

Publications (2)

Publication Number Publication Date
JPS5868036A true JPS5868036A (ja) 1983-04-22
JPH0151171B2 JPH0151171B2 (enrdf_load_stackoverflow) 1989-11-01

Family

ID=15819383

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16580881A Granted JPS5868036A (ja) 1981-10-19 1981-10-19 フオト又は放射線レジスト用感光剤

Country Status (1)

Country Link
JP (1) JPS5868036A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238827A (ja) * 1984-05-14 1985-11-27 Nippon Telegr & Teleph Corp <Ntt> 感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60238827A (ja) * 1984-05-14 1985-11-27 Nippon Telegr & Teleph Corp <Ntt> 感光性樹脂組成物

Also Published As

Publication number Publication date
JPH0151171B2 (enrdf_load_stackoverflow) 1989-11-01

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