JPS5843469B2 - 金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法 - Google Patents

金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法

Info

Publication number
JPS5843469B2
JPS5843469B2 JP49058881A JP5888174A JPS5843469B2 JP S5843469 B2 JPS5843469 B2 JP S5843469B2 JP 49058881 A JP49058881 A JP 49058881A JP 5888174 A JP5888174 A JP 5888174A JP S5843469 B2 JPS5843469 B2 JP S5843469B2
Authority
JP
Japan
Prior art keywords
nickel
metal surface
sulfates
substance
residue
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49058881A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5020934A (enrdf_load_stackoverflow
Inventor
クラウゼ ホルスト
ケール マルチン
ブルツゲル ロベルト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RANGUBAIN FUANHAUZERU UERUKE AG
Original Assignee
RANGUBAIN FUANHAUZERU UERUKE AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RANGUBAIN FUANHAUZERU UERUKE AG filed Critical RANGUBAIN FUANHAUZERU UERUKE AG
Publication of JPS5020934A publication Critical patent/JPS5020934A/ja
Publication of JPS5843469B2 publication Critical patent/JPS5843469B2/ja
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP49058881A 1973-06-01 1974-05-27 金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法 Expired JPS5843469B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732327881 DE2327881B2 (de) 1973-06-01 1973-06-01 Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge

Publications (2)

Publication Number Publication Date
JPS5020934A JPS5020934A (enrdf_load_stackoverflow) 1975-03-05
JPS5843469B2 true JPS5843469B2 (ja) 1983-09-27

Family

ID=5882747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49058881A Expired JPS5843469B2 (ja) 1973-06-01 1974-05-27 金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法

Country Status (6)

Country Link
JP (1) JPS5843469B2 (enrdf_load_stackoverflow)
BR (1) BR7404495D0 (enrdf_load_stackoverflow)
CA (1) CA1027893A (enrdf_load_stackoverflow)
DE (1) DE2327881B2 (enrdf_load_stackoverflow)
FR (1) FR2231772B1 (enrdf_load_stackoverflow)
GB (1) GB1408748A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (ja) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd プリント基板用ドリル
DE3909811A1 (de) * 1989-03-24 1990-09-27 Lpw Chemie Gmbh Verwendung von zumindest einer organischen sulfinsaeure und/oder von zumindest einem alkalisalz einer organischen sulfinsaeure als mittel ...
JP2626065B2 (ja) * 1989-07-04 1997-07-02 上村工業株式会社 サテンニッケル又はニッケル合金めっき浴及びめっき方法
DE19540011C2 (de) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen
DE10025552C1 (de) * 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
JP2003193284A (ja) * 2001-12-28 2003-07-09 Learonal Japan Inc 電気ニッケルめっき液
JP4128005B2 (ja) * 2001-12-28 2008-07-30 日本リーロナール有限会社 電気ニッケルめっき液
DE10222962A1 (de) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
ES2361500T3 (es) * 2006-01-06 2011-06-17 Enthone, Incorporated Electrolíto y procedimiento para la precipitación de una capa metálica mate.
MY176034A (en) * 2010-05-26 2020-07-22 Mimos Berhad Method of electrodepositing nickel-cobalt alloy, non-aqueous electroplating bath and cell thereof
JP2013129902A (ja) * 2011-12-22 2013-07-04 Om Sangyo Kk めっき品及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3255096A (en) * 1963-11-01 1966-06-07 Harshaw Chem Corp Electrodeposition of nickel
CH486564A (de) * 1967-03-21 1970-02-28 Hoeltgen Rolf Bad zum galvanischen Abscheiden von Nickel

Also Published As

Publication number Publication date
GB1408748A (en) 1975-10-01
BR7404495D0 (pt) 1975-09-23
FR2231772A1 (enrdf_load_stackoverflow) 1974-12-27
DE2327881B2 (de) 1978-06-22
FR2231772B1 (enrdf_load_stackoverflow) 1979-02-16
DE2327881A1 (de) 1975-01-02
DE2327881C3 (enrdf_load_stackoverflow) 1979-02-08
JPS5020934A (enrdf_load_stackoverflow) 1975-03-05
CA1027893A (en) 1978-03-14

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