JPS5020934A - - Google Patents

Info

Publication number
JPS5020934A
JPS5020934A JP5888174A JP5888174A JPS5020934A JP S5020934 A JPS5020934 A JP S5020934A JP 5888174 A JP5888174 A JP 5888174A JP 5888174 A JP5888174 A JP 5888174A JP S5020934 A JPS5020934 A JP S5020934A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5888174A
Other languages
Japanese (ja)
Other versions
JPS5843469B2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5020934A publication Critical patent/JPS5020934A/ja
Publication of JPS5843469B2 publication Critical patent/JPS5843469B2/ja
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • C25D15/02Combined electrolytic and electrophoretic processes with charged materials
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP49058881A 1973-06-01 1974-05-27 金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法 Expired JPS5843469B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19732327881 DE2327881B2 (de) 1973-06-01 1973-06-01 Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge

Publications (2)

Publication Number Publication Date
JPS5020934A true JPS5020934A (enrdf_load_stackoverflow) 1975-03-05
JPS5843469B2 JPS5843469B2 (ja) 1983-09-27

Family

ID=5882747

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49058881A Expired JPS5843469B2 (ja) 1973-06-01 1974-05-27 金属面上に艶消し光沢を有するニッケル電着層又はニッケル−コバルト電着層を形成する方法

Country Status (6)

Country Link
JP (1) JPS5843469B2 (enrdf_load_stackoverflow)
BR (1) BR7404495D0 (enrdf_load_stackoverflow)
CA (1) CA1027893A (enrdf_load_stackoverflow)
DE (1) DE2327881B2 (enrdf_load_stackoverflow)
FR (1) FR2231772B1 (enrdf_load_stackoverflow)
GB (1) GB1408748A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (ja) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd プリント基板用ドリル
JPH0339495A (ja) * 1989-07-04 1991-02-20 C Uyemura & Co Ltd サテンニッケル又はニッケル合金めっき浴及びめっき方法
JP4811880B2 (ja) * 2006-01-06 2011-11-09 エントン インコーポレイテッド 艶消し金属層を堆積するための電解液および工程
JP2013129902A (ja) * 2011-12-22 2013-07-04 Om Sangyo Kk めっき品及びその製造方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3909811A1 (de) * 1989-03-24 1990-09-27 Lpw Chemie Gmbh Verwendung von zumindest einer organischen sulfinsaeure und/oder von zumindest einem alkalisalz einer organischen sulfinsaeure als mittel ...
DE19540011C2 (de) * 1995-10-27 1998-09-10 Lpw Chemie Gmbh Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen
DE10025552C1 (de) * 2000-05-19 2001-08-02 Atotech Deutschland Gmbh Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
JP2003193284A (ja) * 2001-12-28 2003-07-09 Learonal Japan Inc 電気ニッケルめっき液
JP4128005B2 (ja) * 2001-12-28 2008-07-30 日本リーロナール有限会社 電気ニッケルめっき液
DE10222962A1 (de) * 2002-05-23 2003-12-11 Atotech Deutschland Gmbh Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge
MY176034A (en) * 2010-05-26 2020-07-22 Mimos Berhad Method of electrodepositing nickel-cobalt alloy, non-aqueous electroplating bath and cell thereof

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3255096A (en) * 1963-11-01 1966-06-07 Harshaw Chem Corp Electrodeposition of nickel
CH486564A (de) * 1967-03-21 1970-02-28 Hoeltgen Rolf Bad zum galvanischen Abscheiden von Nickel

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62142704A (ja) * 1985-12-18 1987-06-26 Sumitomo Electric Ind Ltd プリント基板用ドリル
JPH0339495A (ja) * 1989-07-04 1991-02-20 C Uyemura & Co Ltd サテンニッケル又はニッケル合金めっき浴及びめっき方法
JP4811880B2 (ja) * 2006-01-06 2011-11-09 エントン インコーポレイテッド 艶消し金属層を堆積するための電解液および工程
JP2013129902A (ja) * 2011-12-22 2013-07-04 Om Sangyo Kk めっき品及びその製造方法

Also Published As

Publication number Publication date
JPS5843469B2 (ja) 1983-09-27
GB1408748A (en) 1975-10-01
BR7404495D0 (pt) 1975-09-23
FR2231772A1 (enrdf_load_stackoverflow) 1974-12-27
DE2327881B2 (de) 1978-06-22
FR2231772B1 (enrdf_load_stackoverflow) 1979-02-16
DE2327881A1 (de) 1975-01-02
DE2327881C3 (enrdf_load_stackoverflow) 1979-02-08
CA1027893A (en) 1978-03-14

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