JPS5821740A - 投影露光用フオトマスク - Google Patents

投影露光用フオトマスク

Info

Publication number
JPS5821740A
JPS5821740A JP56121146A JP12114681A JPS5821740A JP S5821740 A JPS5821740 A JP S5821740A JP 56121146 A JP56121146 A JP 56121146A JP 12114681 A JP12114681 A JP 12114681A JP S5821740 A JPS5821740 A JP S5821740A
Authority
JP
Japan
Prior art keywords
photomask
wafer
exposure
transfer
automatic positioning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56121146A
Other languages
English (en)
Japanese (ja)
Other versions
JPS627538B2 (US20100012521A1-20100121-C00001.png
Inventor
Tadahiro Hashimoto
橋本　忠宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56121146A priority Critical patent/JPS5821740A/ja
Publication of JPS5821740A publication Critical patent/JPS5821740A/ja
Publication of JPS627538B2 publication Critical patent/JPS627538B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56121146A 1981-07-31 1981-07-31 投影露光用フオトマスク Granted JPS5821740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56121146A JPS5821740A (ja) 1981-07-31 1981-07-31 投影露光用フオトマスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56121146A JPS5821740A (ja) 1981-07-31 1981-07-31 投影露光用フオトマスク

Publications (2)

Publication Number Publication Date
JPS5821740A true JPS5821740A (ja) 1983-02-08
JPS627538B2 JPS627538B2 (US20100012521A1-20100121-C00001.png) 1987-02-18

Family

ID=14803988

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56121146A Granted JPS5821740A (ja) 1981-07-31 1981-07-31 投影露光用フオトマスク

Country Status (1)

Country Link
JP (1) JPS5821740A (US20100012521A1-20100121-C00001.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149130A (ja) * 1984-01-17 1985-08-06 Hitachi Ltd パターン検出方法およびそれに用いる反射防止膜用材料
JPS636659A (ja) * 1986-06-27 1988-01-12 Hitachi Ltd 本人確認方式

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63184929U (US20100012521A1-20100121-C00001.png) * 1987-05-21 1988-11-28
JPH0535116Y2 (US20100012521A1-20100121-C00001.png) * 1988-11-11 1993-09-06

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109350A (en) * 1980-02-01 1981-08-29 Hitachi Ltd Photomask

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109350A (en) * 1980-02-01 1981-08-29 Hitachi Ltd Photomask

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60149130A (ja) * 1984-01-17 1985-08-06 Hitachi Ltd パターン検出方法およびそれに用いる反射防止膜用材料
JPS636659A (ja) * 1986-06-27 1988-01-12 Hitachi Ltd 本人確認方式

Also Published As

Publication number Publication date
JPS627538B2 (US20100012521A1-20100121-C00001.png) 1987-02-18

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