JPS58212009A - 透明導電膜の形成方法 - Google Patents

透明導電膜の形成方法

Info

Publication number
JPS58212009A
JPS58212009A JP9313582A JP9313582A JPS58212009A JP S58212009 A JPS58212009 A JP S58212009A JP 9313582 A JP9313582 A JP 9313582A JP 9313582 A JP9313582 A JP 9313582A JP S58212009 A JPS58212009 A JP S58212009A
Authority
JP
Japan
Prior art keywords
transparent conductive
conductive film
sputtering
forming transparent
light transmittance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9313582A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0370328B2 (enrdf_load_stackoverflow
Inventor
雲内　高明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9313582A priority Critical patent/JPS58212009A/ja
Publication of JPS58212009A publication Critical patent/JPS58212009A/ja
Publication of JPH0370328B2 publication Critical patent/JPH0370328B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP9313582A 1982-06-02 1982-06-02 透明導電膜の形成方法 Granted JPS58212009A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9313582A JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9313582A JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58212009A true JPS58212009A (ja) 1983-12-09
JPH0370328B2 JPH0370328B2 (enrdf_load_stackoverflow) 1991-11-07

Family

ID=14074074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9313582A Granted JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58212009A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS529897A (en) * 1975-07-14 1977-01-25 Matsushita Electric Ind Co Ltd Manufacturing method of thin oxide semiconductor film
JPS54130497A (en) * 1978-03-31 1979-10-09 Agency Of Ind Science & Technol Production of indium oxide ( ) film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS529897A (en) * 1975-07-14 1977-01-25 Matsushita Electric Ind Co Ltd Manufacturing method of thin oxide semiconductor film
JPS54130497A (en) * 1978-03-31 1979-10-09 Agency Of Ind Science & Technol Production of indium oxide ( ) film

Also Published As

Publication number Publication date
JPH0370328B2 (enrdf_load_stackoverflow) 1991-11-07

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