JPH0370328B2 - - Google Patents

Info

Publication number
JPH0370328B2
JPH0370328B2 JP57093135A JP9313582A JPH0370328B2 JP H0370328 B2 JPH0370328 B2 JP H0370328B2 JP 57093135 A JP57093135 A JP 57093135A JP 9313582 A JP9313582 A JP 9313582A JP H0370328 B2 JPH0370328 B2 JP H0370328B2
Authority
JP
Japan
Prior art keywords
conductive film
transparent conductive
sputtering
light transmittance
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57093135A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58212009A (ja
Inventor
Takaaki Kumochi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9313582A priority Critical patent/JPS58212009A/ja
Publication of JPS58212009A publication Critical patent/JPS58212009A/ja
Publication of JPH0370328B2 publication Critical patent/JPH0370328B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Electric Cables (AREA)
JP9313582A 1982-06-02 1982-06-02 透明導電膜の形成方法 Granted JPS58212009A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9313582A JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9313582A JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Publications (2)

Publication Number Publication Date
JPS58212009A JPS58212009A (ja) 1983-12-09
JPH0370328B2 true JPH0370328B2 (enrdf_load_stackoverflow) 1991-11-07

Family

ID=14074074

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9313582A Granted JPS58212009A (ja) 1982-06-02 1982-06-02 透明導電膜の形成方法

Country Status (1)

Country Link
JP (1) JPS58212009A (enrdf_load_stackoverflow)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5813006B2 (ja) * 1975-07-14 1983-03-11 松下電器産業株式会社 サンカブツハンドウタイハクマクノ セイゾウホウホウ
JPS54130497A (en) * 1978-03-31 1979-10-09 Agency Of Ind Science & Technol Production of indium oxide ( ) film

Also Published As

Publication number Publication date
JPS58212009A (ja) 1983-12-09

Similar Documents

Publication Publication Date Title
US4399015A (en) Method for fabricating an indium tin oxide film for a transparent electrode
US6329044B1 (en) Transparent conductive film and method of making the film
US6685805B2 (en) Method of manufacturing substrate having transparent conductive film, substrate having transparent conductive film manufactured using the method, and touch panel using the substrate
JPH0344465A (ja) Ito透明導電膜用スパッタリングターゲットの製造方法
JPH1088332A (ja) スパッタリングターゲットおよび透明導電膜とその製造方法
JPH0370328B2 (enrdf_load_stackoverflow)
JP2000113732A (ja) 透明導電膜とその製造方法、透明導電膜付き基板およびタッチパネル
JPH0756131A (ja) 透明導電膜の製造方法
JPS6215961B2 (enrdf_load_stackoverflow)
US4146309A (en) Process for producing evaporated gold films
US4605285A (en) Electrochromic device
JPH0723532B2 (ja) 透明導電膜の形成方法
JPS63178414A (ja) 透明導電膜および該透明導電膜製造用材料
JP3197623B2 (ja) 透明導電性薄膜の形成方法
JPH06196023A (ja) 透明導電性フィルムおよびその製造方法
JPH05171437A (ja) 透明導電膜の形成方法
JPH10183333A (ja) 透明導電膜の成膜方法
JPS59163706A (ja) 基板上に透明導電膜を形成する方法
JPH03238714A (ja) 透明導電膜の形成方法
JPH0726196B2 (ja) アルミナ薄膜の形成方法
JPH01272006A (ja) 透明導電膜
JPS60189118A (ja) 導電性透明薄膜の形成方法
JPH0336703A (ja) 薄膜抵抗体及びその製造方法
JPH01272755A (ja) 透明導電膜およびその製造方法
JPH01289016A (ja) 透明導電膜