JPS5818635A - 摩擦およびひつかきに強いグラビア印刷版を作る感光記録材料およびこれら記録材料によりグラビア印刷版を作る方法 - Google Patents
摩擦およびひつかきに強いグラビア印刷版を作る感光記録材料およびこれら記録材料によりグラビア印刷版を作る方法Info
- Publication number
- JPS5818635A JPS5818635A JP57121353A JP12135382A JPS5818635A JP S5818635 A JPS5818635 A JP S5818635A JP 57121353 A JP57121353 A JP 57121353A JP 12135382 A JP12135382 A JP 12135382A JP S5818635 A JPS5818635 A JP S5818635A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photopolymerizable
- abrasive particles
- printing plate
- actinizable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/151—Matting or other surface reflectivity altering material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3128949.5 | 1981-07-22 | ||
DE19813128949 DE3128949A1 (de) | 1981-07-22 | 1981-07-22 | Lichtempfindliche aufzeichnungsmaterialien zur herstellung von abriebs- und kratzfesten tiefdruckformen sowie verfahren zur herstellung von tiefdruckformen mittels dieser aufzeichnungsmaterialien |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5818635A true JPS5818635A (ja) | 1983-02-03 |
JPH0255770B2 JPH0255770B2 (da) | 1990-11-28 |
Family
ID=6137476
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57121353A Granted JPS5818635A (ja) | 1981-07-22 | 1982-07-14 | 摩擦およびひつかきに強いグラビア印刷版を作る感光記録材料およびこれら記録材料によりグラビア印刷版を作る方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US4548894A (da) |
EP (1) | EP0070511B1 (da) |
JP (1) | JPS5818635A (da) |
CA (1) | CA1177685A (da) |
DE (2) | DE3128949A1 (da) |
DK (1) | DK164933C (da) |
ES (1) | ES514198A0 (da) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0592706U (ja) * | 1992-05-19 | 1993-12-17 | ティーディーケイ株式会社 | 湿度検出装置 |
WO2018123773A1 (ja) | 2016-12-26 | 2018-07-05 | 東レ株式会社 | 感光性樹脂組成物、およびそれを含む感光性樹脂印刷版原版 |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3406404A1 (de) * | 1984-02-22 | 1985-08-22 | Metalon Stolberg GmbH, 5190 Stolberg | Verfahren zur herstellung lichtempfindlicher lackschichten mit rauher oberflaeche auf druckplatten |
JPS62121445A (ja) * | 1985-11-21 | 1987-06-02 | Kuraray Co Ltd | 感光性組成物 |
JPH0610736B2 (ja) * | 1985-12-24 | 1994-02-09 | 三菱製紙株式会社 | ハロゲン化銀写真印画紙 |
DE3736180A1 (de) * | 1987-10-26 | 1989-05-03 | Basf Ag | Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten |
DE3806270A1 (de) * | 1988-02-27 | 1989-09-07 | Basf Ag | Lichtempfindliche aufzeichnungsmaterialien zur herstellung kratzfester tiefdruckformen |
US5698373A (en) * | 1988-09-22 | 1997-12-16 | Toray Industries, Incorporated | Photosensitive relief printing plate and photosensitive intaglio printing plate |
DE3924811A1 (de) * | 1989-07-27 | 1991-01-31 | Hoechst Ag | Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial |
DE4003093A1 (de) * | 1990-02-02 | 1991-08-08 | Basf Ag | Verfahren zur herstellung einer endlosen, lichtempfindlichen polymeren aufzeichnungsschicht fuer die herstellung von endlos-druckformen |
US5130263A (en) * | 1990-04-17 | 1992-07-14 | General Electric Company | Method for photolithographically forming a selfaligned mask using back-side exposure and a non-specular reflecting layer |
DE19536806A1 (de) * | 1995-10-02 | 1997-04-03 | Basf Lacke & Farben | Verfahren zur Herstellung von photopolymeren Tiefdruckplatten |
US7923173B1 (en) * | 2000-10-19 | 2011-04-12 | Illinois Tool Works Inc. | Photo definable polyimide film used as an embossing surface |
US6844374B2 (en) * | 2001-10-03 | 2005-01-18 | Lord Corporation | Enhanced scratch resistant coatings using inorganic fillers |
JP5064952B2 (ja) * | 2006-09-29 | 2012-10-31 | 富士フイルム株式会社 | 平版印刷版用現像処理液及び平版印刷版の製版方法 |
CN110476123B (zh) * | 2019-01-23 | 2022-02-08 | 律胜科技股份有限公司 | 感光性聚酰亚胺树脂组合物及其聚酰亚胺膜 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2752500A1 (de) * | 1977-07-19 | 1979-02-01 | Toppan Printing Co Ltd | Tiefdruckverfahren |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2892712A (en) * | 1954-04-23 | 1959-06-30 | Du Pont | Process for preparing relief images |
JPS4741361Y1 (da) * | 1969-05-19 | 1972-12-14 | ||
DE2054833A1 (de) * | 1970-11-07 | 1972-05-10 | Basf Ag | Verfahren zur Herstellung von Druckformen für den Tiefdruck |
US3770435A (en) * | 1971-12-08 | 1973-11-06 | Basf Ag | Production of gravure printing plates based on plastics materials |
US3782939A (en) * | 1972-02-09 | 1974-01-01 | Mining And Mfg Co | Dry positive-acting photoresist |
US3891443A (en) * | 1973-02-01 | 1975-06-24 | Polychrome Corp | Mat finish photosensitive relief plates |
JPS5232704A (en) * | 1975-09-08 | 1977-03-12 | Nippon Paint Co Ltd | Photoosensitive resin intaglio press plate |
IE49374B1 (en) * | 1979-02-01 | 1985-09-18 | Lilly Co Eli | Crystalline 3-hydroxycephalosporin solvates |
DE2926236A1 (de) * | 1979-06-29 | 1981-01-15 | Hoechst Ag | Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche |
US4345022A (en) * | 1979-11-13 | 1982-08-17 | Matrix Unlimited, Inc. | Process of recovering unpolymerized photopolymer from printing plates |
-
1981
- 1981-07-22 DE DE19813128949 patent/DE3128949A1/de not_active Withdrawn
-
1982
- 1982-07-14 EP EP82106295A patent/EP0070511B1/de not_active Expired
- 1982-07-14 DE DE8282106295T patent/DE3261619D1/de not_active Expired
- 1982-07-14 JP JP57121353A patent/JPS5818635A/ja active Granted
- 1982-07-21 DK DK327282A patent/DK164933C/da not_active IP Right Cessation
- 1982-07-21 ES ES514198A patent/ES514198A0/es active Granted
- 1982-07-21 CA CA000407745A patent/CA1177685A/en not_active Expired
-
1984
- 1984-10-02 US US06/656,429 patent/US4548894A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2752500A1 (de) * | 1977-07-19 | 1979-02-01 | Toppan Printing Co Ltd | Tiefdruckverfahren |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0592706U (ja) * | 1992-05-19 | 1993-12-17 | ティーディーケイ株式会社 | 湿度検出装置 |
WO2018123773A1 (ja) | 2016-12-26 | 2018-07-05 | 東レ株式会社 | 感光性樹脂組成物、およびそれを含む感光性樹脂印刷版原版 |
KR20190099190A (ko) | 2016-12-26 | 2019-08-26 | 도레이 카부시키가이샤 | 감광성 수지 조성물 및 그것을 포함하는 감광성 수지 인쇄판 원판 |
US11137683B2 (en) | 2016-12-26 | 2021-10-05 | Toray Industries, Inc. | Photosensitive resin composition and photosensitive resin printing plate precursor containing the same |
Also Published As
Publication number | Publication date |
---|---|
DE3261619D1 (en) | 1985-01-31 |
DK164933C (da) | 1993-01-18 |
ES8305508A1 (es) | 1983-04-01 |
DK164933B (da) | 1992-09-07 |
ES514198A0 (es) | 1983-04-01 |
DK327282A (da) | 1983-01-23 |
CA1177685A (en) | 1984-11-13 |
DE3128949A1 (de) | 1983-02-10 |
US4548894A (en) | 1985-10-22 |
JPH0255770B2 (da) | 1990-11-28 |
EP0070511B1 (de) | 1984-12-19 |
EP0070511A1 (de) | 1983-01-26 |
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