ES8305508A1 - Procedimiento para la obtencion de moldes de huecograbado. - Google Patents

Procedimiento para la obtencion de moldes de huecograbado.

Info

Publication number
ES8305508A1
ES8305508A1 ES514198A ES514198A ES8305508A1 ES 8305508 A1 ES8305508 A1 ES 8305508A1 ES 514198 A ES514198 A ES 514198A ES 514198 A ES514198 A ES 514198A ES 8305508 A1 ES8305508 A1 ES 8305508A1
Authority
ES
Spain
Prior art keywords
recording materials
intaglio printing
printing forms
resistant
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES514198A
Other languages
English (en)
Other versions
ES514198A0 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of ES8305508A1 publication Critical patent/ES8305508A1/es
Publication of ES514198A0 publication Critical patent/ES514198A0/es
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/151—Matting or other surface reflectivity altering material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

PROCEDIMIENTO DE OBTENCION DE MOLDES DE HUECOGRABADO. SE PARTE DE UNA CAPA FOTOPOLIMERIZABLE Y/O FOTO-RETICULABLE DE UN MATERIAL DE REGISTRO SENSIBLE A LA LUZ, LA CUAL CONTIENE, AL MENOS EN UNA ZONA SUPERFICIAL A 1-50 ~LM DE LA SUPERFICIE, UN 2 A 50% EN PESO DE PARTICULAS ABRASIVAS FINAS, DURAS Y QUE COMO MAXIMO UN 5% DE ELLAS TIENEN EXPANSIONES LONGITUDINALES SUPERIORES A 10 ~LM, TENIENDO LA SUPERFICIE DE LA CAPA UNA PROFUNDIDAD DE ASPEREZAS INFERIOR A 2 ~LM. SE EXPONE DICHA CAPA, DISPUESTA SOBRE UN SOPORTE DIMENSIONALMENTE ESTABLE, A LA LUZ ACTINICA A TRAVES DE UN RETICULO POSITIVO O DE UN SOMBREADO POSITIVO O A TRAVES DE UN POSITIVO SEMIGRABADO Y UN MODELO DE RETICULO PATRON. SE ELIMINAN POR LAVADO CON UN LIQUIDO REVELADOR LAS PARTES DE LA CAPA NO EXPUESTA A LA LUZ Y SE SECA ESTA, PRESENTANDO EL MATERIAL DE REGISTRO DESPUES DE ESTE PROCESO UNA DUREZA VICKERS, MEDIDA BAJO CARGA, DE AL MENOS 10 N/MM .
ES514198A 1981-07-22 1982-07-21 Procedimiento para la obtencion de moldes de huecograbado. Granted ES514198A0 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19813128949 DE3128949A1 (de) 1981-07-22 1981-07-22 Lichtempfindliche aufzeichnungsmaterialien zur herstellung von abriebs- und kratzfesten tiefdruckformen sowie verfahren zur herstellung von tiefdruckformen mittels dieser aufzeichnungsmaterialien

Publications (2)

Publication Number Publication Date
ES8305508A1 true ES8305508A1 (es) 1983-04-01
ES514198A0 ES514198A0 (es) 1983-04-01

Family

ID=6137476

Family Applications (1)

Application Number Title Priority Date Filing Date
ES514198A Granted ES514198A0 (es) 1981-07-22 1982-07-21 Procedimiento para la obtencion de moldes de huecograbado.

Country Status (7)

Country Link
US (1) US4548894A (es)
EP (1) EP0070511B1 (es)
JP (1) JPS5818635A (es)
CA (1) CA1177685A (es)
DE (2) DE3128949A1 (es)
DK (1) DK164933C (es)
ES (1) ES514198A0 (es)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3406404A1 (de) * 1984-02-22 1985-08-22 Metalon Stolberg GmbH, 5190 Stolberg Verfahren zur herstellung lichtempfindlicher lackschichten mit rauher oberflaeche auf druckplatten
JPS62121445A (ja) * 1985-11-21 1987-06-02 Kuraray Co Ltd 感光性組成物
JPH0610736B2 (ja) * 1985-12-24 1994-02-09 三菱製紙株式会社 ハロゲン化銀写真印画紙
DE3736180A1 (de) * 1987-10-26 1989-05-03 Basf Ag Verfahren zum verschliessen und/oder abdichten von oeffnungen, hohl- oder zwischenraeumen bei auf formzylindern aufgebrachten druckplatten
DE3806270A1 (de) * 1988-02-27 1989-09-07 Basf Ag Lichtempfindliche aufzeichnungsmaterialien zur herstellung kratzfester tiefdruckformen
US5698373A (en) * 1988-09-22 1997-12-16 Toray Industries, Incorporated Photosensitive relief printing plate and photosensitive intaglio printing plate
DE3924811A1 (de) * 1989-07-27 1991-01-31 Hoechst Ag Pfropfpolymerisat mit ungesaettigten seitenketten, dieses enthaltendes lichtempfindliches gemisch sowie daraus hergestelltes aufzeichnungsmaterial
DE4003093A1 (de) * 1990-02-02 1991-08-08 Basf Ag Verfahren zur herstellung einer endlosen, lichtempfindlichen polymeren aufzeichnungsschicht fuer die herstellung von endlos-druckformen
US5130263A (en) * 1990-04-17 1992-07-14 General Electric Company Method for photolithographically forming a selfaligned mask using back-side exposure and a non-specular reflecting layer
JPH0592706U (ja) * 1992-05-19 1993-12-17 ティーディーケイ株式会社 湿度検出装置
DE19536806A1 (de) * 1995-10-02 1997-04-03 Basf Lacke & Farben Verfahren zur Herstellung von photopolymeren Tiefdruckplatten
US7923173B1 (en) * 2000-10-19 2011-04-12 Illinois Tool Works Inc. Photo definable polyimide film used as an embossing surface
US6844374B2 (en) * 2001-10-03 2005-01-18 Lord Corporation Enhanced scratch resistant coatings using inorganic fillers
JP5064952B2 (ja) * 2006-09-29 2012-10-31 富士フイルム株式会社 平版印刷版用現像処理液及び平版印刷版の製版方法
JP6798510B2 (ja) 2016-12-26 2020-12-09 東レ株式会社 感光性樹脂組成物、およびそれを含む感光性樹脂印刷版原版
WO2020150913A1 (zh) * 2019-01-23 2020-07-30 律胜科技股份有限公司 感光性聚酰亚胺树脂组合物及其聚酰亚胺膜

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2892712A (en) * 1954-04-23 1959-06-30 Du Pont Process for preparing relief images
JPS4741361Y1 (es) * 1969-05-19 1972-12-14
DE2054833A1 (de) * 1970-11-07 1972-05-10 Basf Ag Verfahren zur Herstellung von Druckformen für den Tiefdruck
US3770435A (en) * 1971-12-08 1973-11-06 Basf Ag Production of gravure printing plates based on plastics materials
US3782939A (en) * 1972-02-09 1974-01-01 Mining And Mfg Co Dry positive-acting photoresist
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
JPS5232704A (en) * 1975-09-08 1977-03-12 Nippon Paint Co Ltd Photoosensitive resin intaglio press plate
JPS5422208A (en) * 1977-07-19 1979-02-20 Toppan Printing Co Ltd Method of photogravuring
IE49374B1 (en) * 1979-02-01 1985-09-18 Lilly Co Eli Crystalline 3-hydroxycephalosporin solvates
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
US4345022A (en) * 1979-11-13 1982-08-17 Matrix Unlimited, Inc. Process of recovering unpolymerized photopolymer from printing plates

Also Published As

Publication number Publication date
US4548894A (en) 1985-10-22
EP0070511A1 (de) 1983-01-26
DE3261619D1 (en) 1985-01-31
EP0070511B1 (de) 1984-12-19
DK164933B (da) 1992-09-07
DE3128949A1 (de) 1983-02-10
CA1177685A (en) 1984-11-13
DK327282A (da) 1983-01-23
JPH0255770B2 (es) 1990-11-28
JPS5818635A (ja) 1983-02-03
DK164933C (da) 1993-01-18
ES514198A0 (es) 1983-04-01

Similar Documents

Publication Publication Date Title
ES8305508A1 (es) Procedimiento para la obtencion de moldes de huecograbado.
GB1242193A (en) Photohardenable element with integral pigmented layer
US3615468A (en) Photoprinting process and article
CS215019B2 (en) Method of galvanoplastic production of precise flat objects
GB2012977A (en) Relief printing plates produced from photopolymerisable materials
DK86989A (da) Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer
JPS59172723A (ja) パタ−ン形成方法
CA1087453A (en) Printing plate
MXPA01010531A (es) Pelicula de polimida fotodefinible usada como una superficie de estampar.
JPS5555343A (en) Waterless lithographic printing original plate
TW200510934A (en) Radiation-sensitive resin composition and method for forming pattern using the composition
JPS52134719A (en) Electrophotographic copying
BE901459A (fr) Procede de fabrication d'un pochoir.
ES8105201A1 (es) Procedimiento para la obtencion de una placa de impresion litografica
JPS56150592A (en) Machine plate for use in lithographic printing
US1557354A (en) Process for producing photomechanical printing plates
JPS5596270A (en) Engraving method using sand blast
EP0057734B1 (de) Verfahren zur Herstellung eines Kornrasters
JPS56155939A (en) Resist material for forming fine pattern
JPS5263336A (en) Electrophotographic light sensitive material
GB410117A (en) Improvements in or relating to the production of raised photomechanical printing surfaces
GB744836A (en) Photographic method of making relief printing plate matrices and light sensitive material therefor
CN85108425B (zh) 一种用于凹版移印法的印刷版
Holabird Lithographic Map Reproduction in the Field
GB2099180A (en) Improvements in or relating to printing plates

Legal Events

Date Code Title Description
FD1A Patent lapsed

Effective date: 20011110