DK86989A - Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer - Google Patents

Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer

Info

Publication number
DK86989A
DK86989A DK086989A DK86989A DK86989A DK 86989 A DK86989 A DK 86989A DK 086989 A DK086989 A DK 086989A DK 86989 A DK86989 A DK 86989A DK 86989 A DK86989 A DK 86989A
Authority
DK
Denmark
Prior art keywords
light
abrasive particles
sensitive recording
photopolymerisable
photocrosslinkable
Prior art date
Application number
DK086989A
Other languages
English (en)
Other versions
DK86989D0 (da
Inventor
Eleonore Raabe
Erich Beck
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of DK86989D0 publication Critical patent/DK86989D0/da
Publication of DK86989A publication Critical patent/DK86989A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/162—Protective or antiabrasion layer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
DK086989A 1988-02-27 1989-02-24 Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer DK86989A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3806270A DE3806270A1 (de) 1988-02-27 1988-02-27 Lichtempfindliche aufzeichnungsmaterialien zur herstellung kratzfester tiefdruckformen

Publications (2)

Publication Number Publication Date
DK86989D0 DK86989D0 (da) 1989-02-24
DK86989A true DK86989A (da) 1989-08-28

Family

ID=6348343

Family Applications (1)

Application Number Title Priority Date Filing Date
DK086989A DK86989A (da) 1988-02-27 1989-02-24 Lysfoelsomme optegnelsesmaterialer til fremstilling af kradseaegte dybtrykformer

Country Status (7)

Country Link
US (1) US4994348A (da)
EP (1) EP0331007B1 (da)
JP (1) JPH026957A (da)
AT (1) ATE80233T1 (da)
AU (1) AU609256B2 (da)
DE (2) DE3806270A1 (da)
DK (1) DK86989A (da)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4239686A (en) * 1978-11-21 1980-12-16 Asahi Kasei Kogyo Kabushiki Kaisha Process for producing phthalimido derivatives

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153260A (en) * 1989-11-30 1992-10-06 Sumitomo Chemical Company, Limited Resin compositions for light control sheets, and light control sheets prepared from said compositions
JPH03228060A (ja) * 1990-02-01 1991-10-09 Nippon Paint Co Ltd 感光性樹脂組成物
DE4322437C1 (de) * 1993-07-06 1995-03-30 Basf Lacke & Farben Pulverlack, Verfahren zur Außenbeschichtung von Metallrohren sowie Verwendung des Pulverlacks zur einschichtigen Außenbeschichtung von Metallrohren
US8178287B2 (en) * 2006-09-08 2012-05-15 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist composition and method of forming a resist pattern
JP5502352B2 (ja) 2009-03-23 2014-05-28 株式会社マキタ 電動工具
JP5405864B2 (ja) 2009-03-23 2014-02-05 株式会社マキタ 打撃工具
JP6946619B2 (ja) * 2016-02-25 2021-10-06 東レ株式会社 感光性樹脂組成物、および感光性樹脂印刷版原版
JP6719310B2 (ja) * 2016-07-14 2020-07-08 四国化成工業株式会社 （メタ）アクリレート化合物、その合成方法および該（メタ）アクリレート化合物の利用
WO2018123773A1 (ja) 2016-12-26 2018-07-05 東レ株式会社 感光性樹脂組成物、およびそれを含む感光性樹脂印刷版原版
JP7171404B2 (ja) * 2017-12-22 2022-11-15 住友化学株式会社 樹脂、レジスト組成物及びレジストパターンの製造方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770602A (en) * 1968-11-25 1973-11-06 Ppg Industries Inc Radiation crosslinkable polymers prepared by reacting a polyepoxy compound with an acrylic anhydride of a monocarboxylic acid
DE2054833A1 (de) * 1970-11-07 1972-05-10 Basf Ag Verfahren zur Herstellung von Druckformen für den Tiefdruck
US3782939A (en) * 1972-02-09 1974-01-01 Mining And Mfg Co Dry positive-acting photoresist
US3891443A (en) * 1973-02-01 1975-06-24 Polychrome Corp Mat finish photosensitive relief plates
JPS5422208A (en) * 1977-07-19 1979-02-20 Toppan Printing Co Ltd Method of photogravuring
US4221892A (en) * 1978-11-30 1980-09-09 The Dow Chemical Company Photocurable partially esterified polyepoxides
DE2926236A1 (de) * 1979-06-29 1981-01-15 Hoechst Ag Lichtempfindliches, positiv arbeitendes kopiermaterial mit rauher oberflaeche
DE3260250D1 (en) * 1981-07-20 1984-07-19 Hoechst Ag Process for improving the technical application properties of disazo pigments
DE3128949A1 (de) * 1981-07-22 1983-02-10 Basf Ag, 6700 Ludwigshafen Lichtempfindliche aufzeichnungsmaterialien zur herstellung von abriebs- und kratzfesten tiefdruckformen sowie verfahren zur herstellung von tiefdruckformen mittels dieser aufzeichnungsmaterialien
US4703338A (en) * 1983-10-14 1987-10-27 Daicel Chemical Industries, Ltd. Resin composition to seal electronic device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4239686A (en) * 1978-11-21 1980-12-16 Asahi Kasei Kogyo Kabushiki Kaisha Process for producing phthalimido derivatives

Also Published As

Publication number Publication date
DK86989D0 (da) 1989-02-24
DE3806270A1 (de) 1989-09-07
EP0331007A2 (de) 1989-09-06
DE58902169D1 (de) 1992-10-08
AU609256B2 (en) 1991-04-26
EP0331007A3 (en) 1989-11-29
JPH026957A (ja) 1990-01-11
ATE80233T1 (de) 1992-09-15
EP0331007B1 (de) 1992-09-02
AU3070689A (en) 1989-08-31
US4994348A (en) 1991-02-19

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment